公开(公告)号：EP2124104B1

公开(公告)日：2016-07-13

申请号：EP09161039.4

申请日：2009-05-25

Applicant: Esko-Graphics Imaging GmbH

Inventor： Sievers, Wolfgang

IPC: G03F7/20

CPC classification number: G03F7/2051 ,  G03F7/2008 ,  G03F7/201 ,  G03F7/2012 ,  G03F7/2057 ,  G03F7/24

公开(公告)号：EP0990239A1

公开(公告)日：2000-04-05

申请号：EP98930469.6

申请日：1998-06-19

Applicant: Creatv Microtech, Inc.

Inventor： TANG, Cha-Mei

IPC: G21K1/00

CPC classification number: G03F7/0007 ,  G03F7/201 ,  G21K1/025

Abstract: Disclosed are methods for making large area antiscatter grids consisting of focussed and unfocussed holes in sheets of metal. The grid consists of thin metal walls (30) surrounding hollow openings (31). The projections of all walls converge to a focal spot in the focussed grid, and are parallel in an unfocussed grid. A grid having a large area is made by interlocking together smaller grid pieces. A tall device is made by stacking layers of focussed grids. The openings of the grid can be filled with phosphor or other scintillating material (33) to make an integrated grid/scintillator structure.

公开(公告)号：EP0967524A3

公开(公告)日：2000-01-05

申请号：EP99203179.9

申请日：1991-11-15

Applicant: Nikon Corporation

Inventor： Shiraishi, Naomasa

IPC: G03F7/20 ,  G02B27/00

CPC classification number: G03F9/7088 ,  G03F7/201 ,  G03F7/70066 ,  G03F7/70108 ,  G03F7/70141 ,  G03F7/70158 ,  G03F7/70208 ,  G03F7/70316 ,  G03F7/70333 ,  G03F7/70358

Abstract: A projection exposure apparatus consists of: an illumination optical system, including a light source (1), for irradiating a mask (27); a projection optical system (29) for projecting a hyperfine pattern image on a substrate (31); an optical integrator (7) for illuminating the mask in a homogeneous illuminance distribution; and a luminous flux distributing member (12) for distributing the luminous fluxes from the integrator into two luminous fluxes (L4,L5) in two different directions for focusing intensity distributions over the Fourier transform surface or the surface in the vicinity thereof on two portions part from the optical axis of the illumination optical system. An exposure method of exposing the mask patterns (28) onto an exposed member (30) comprises: a step of starting the exposure when setting a movable optical member in a first position; a step of switching the movable optical member from the first position to a second position; a step of shielding the illumination light during the switching process; and a step of finishing the irradiation of the mask with the luminous fluxes when an exposure quantity reaches a preset value.

公开(公告)号：EP0967524A2

公开(公告)日：1999-12-29

申请号：EP99203179.9

申请日：1991-11-15

Applicant: Nikon Corporation

Inventor： Shiraishi, Naomasa

IPC: G03F7/20 ,  G02B27/00

CPC classification number: G03F9/7088 ,  G03F7/201 ,  G03F7/70066 ,  G03F7/70108 ,  G03F7/70141 ,  G03F7/70158 ,  G03F7/70208 ,  G03F7/70316 ,  G03F7/70333 ,  G03F7/70358

Abstract: A projection exposure apparatus consists of: an illumination optical system, including a light source, for irradiating a mask; a projection optical system for projecting a hyperfine pattern image on a substrate; an optical integrator for illuminating the mask in a homogeneous illuminance distribution; and a luminous flux distributing member for distributing the luminous fluxes from the integrator into two luminous fluxes in two different directions for focusing intensity distributions over the Fourier transform surface or the surface in the vicinity thereof on two portions part from the optical axis of the illumination optical system.
An exposure method of exposing the mask patterns onto an exposed member comprises: a step of starting the exposure when setting a movable optical member in a first position; a step of switching the movable optical member from the first position to a second position; a step of shielding the illumination light during the switching process; and a step of finishing the irradiation of the mask with the luminous fluxes when an exposure quantity reaches a preset value.

Abstract translation: 投影曝光装置包括：照明光学系统，包括用于照射掩模（27）的光源（1）; 投影光学系统（29），用于将超精细图案图像投影在基板（31）上; 用于在均匀的照度分布中照亮所述掩模的光学积分器（7）; 以及光束分配构件（12），用于将两个部分上的傅里叶变换表面或其附近的聚焦强度分布在两个不同方向上分布成从积分器的光通量到两个光束（L4，L5） 从照明光学系统的光轴。 将掩模图案（28）暴露在暴露部件（30）上的曝光方法包括：将可动光学部件设置在第一位置时开始曝光的步骤; 将可动光学构件从第一位置切换到第二位置的步骤; 在切换过程中屏蔽照明光的步骤; 以及当曝光量达到预设值时完成具有光通量的掩模的照射的步骤。

公开(公告)号：EP0909987A1

公开(公告)日：1999-04-21

申请号：EP98124749.7

申请日：1991-09-25

Applicant: CANON KABUSHIKI KAISHA

Inventor： Komatsu, Toshiyuki ,  Sato, Yasue ,  Kawate, Shin-Ichi

IPC: G03F7/004

CPC classification number: H01L21/02071 ,  C23C16/047 ,  G03F1/68 ,  G03F7/00 ,  G03F7/0035 ,  G03F7/0042 ,  G03F7/2002 ,  G03F7/201 ,  G03F7/2022 ,  G03F7/2043 ,  G03F7/2053 ,  G03F7/265 ,  G03F7/36 ,  G03F7/38 ,  G03F7/7005 ,  G03F7/70841 ,  G03F7/70866 ,  G03F7/70875 ,  G03F7/70991 ,  H01L21/033 ,  H01L21/0332 ,  H01L21/0337 ,  H01L21/28556 ,  H01L21/28562 ,  H01L21/3086 ,  H01L21/31116 ,  H01L21/31144 ,  H01L21/31662 ,  H01L21/31683 ,  H01L21/32 ,  H01L21/321 ,  H01L21/32139

Abstract: The present invention provides a processing method which comprises the steps of subjecting in a modifying gas atmosphere the surface of a substrate (60) to selective irradiation with light that has an energy greater than a binding energy of a compound constituting said surface of the substrate and is capable of reducing said compound, to form on said surface of the substrate a surface-modified layer having a pattern structure constituted of a reduced product; and etching the surface-unmodified layer using said surface-modified layer as a protective film. Furthermore, the present invention provides a processing apparatus which comprises a surface photo-processing zone comprising a first reaction vessel (606), a light guiding means (610) and an evacuating means (603b); and an etching zone comprising a second reaction vessel (613), a reactive gas feeding means (605c) and an energy supplying means (614).

Abstract translation: 本发明提供了一种处理方法，该方法包括以下步骤：在改性气氛中对衬底（60）的表面进行选择性照射，所述光的能量大于构成所述衬底表面的化合物的结合能， 能够还原所述化合物，以在所述基底的所述表面上形成具有由还原产物构成的图案结构的表面改性层; 以及使用所述表面改性层作为保护膜来蚀刻表面未改性层。 此外，本发明提供了一种处理装置，其包括：包括第一反应容器（606），光导装置（610）和抽空装置（603b）的表面光处理区; 以及包括第二反应容器（613），反应气体供给装置（605c）和能量供给装置（614）的蚀刻区域。

公开(公告)号：EP0560310B1

公开(公告)日：1998-06-10

申请号：EP93103807.9

申请日：1993-03-10

Applicant: HOLTRONIC TECHNOLOGIES LTD.

Inventor： Clube, Francis Stace Murray

IPC: G03H1/26 ,  G03F7/20 ,  G03H1/00

CPC classification number: G03F7/70425 ,  G03F7/201 ,  G03F7/70475 ,  G03H1/00 ,  G03H1/26

公开(公告)号：WO2017005271A1

公开(公告)日：2017-01-12

申请号：PCT/DK2016/050239

申请日：2016-07-07

Applicant: GLUNZ & JENSEN A/S

Inventor： SPIES, Joachim

IPC: H01F38/10 ,  G03F7/20 ,  H05B41/298

CPC classification number: G03F7/2004 ,  B41C1/00 ,  G03F7/201 ,  H05B41/38 ,  H05B41/3922

Abstract: There is provided method for controlling radiation emitting from one or more tubular lamps in an exposure apparatus for exposing a photosensitive element to the radiation. The method involves adjusting an adjustable ballast connected to the one or more lamps thereby adjusting the power received by the one or more lamps, wherein adjusting the ballast of the one or more lamps is based on the actual temperature and radiation of the one or more lamps.

Abstract translation: 提供了一种用于控制曝光设备中的一个或多个管状灯的辐射的方法，用于将光敏元件暴露于辐射。 该方法包括调节连接到一个或多个灯的可调节镇流器，从而调节由一个或多个灯所接收的功率，其中调整一个或多个灯的镇流器是基于一个或多个灯的实际温度和辐射 。

公开(公告)号：WO2016113427A1

公开(公告)日：2016-07-21

申请号：PCT/EP2016/050900

申请日：2016-01-18

Applicant: HANSSON, Jonas ,  YASUGA, Hiroki ,  VAN DER WIJNGAART, Wouter ,  HARALDSSON, Tommy

Inventor： HANSSON, Jonas ,  YASUGA, Hiroki ,  VAN DER WIJNGAART, Wouter ,  HARALDSSON, Tommy

IPC: G03F7/00 ,  G03F7/027 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0037 ,  G03F7/00 ,  G03F7/027 ,  G03F7/038 ,  G03F7/201 ,  G03F7/2022

Abstract: A synthetic paper is manufactured with a method comprising the steps of: a) providing at least two types of photo-polymerizable monomers, b) exposing the volume to a three-dimensional light pattern to induce a polymerization reaction, and c) removing uncured monomer to create an open microstructure. The volume comprises at least one monomer comprising at least two thiol groups and at least one monomer comprising at least two carbon-carbon double bonds, where the ratio (r 1 ) between the number of thiol groups and the number of carbon-carbon double bonds fulfils one of: 0.5 ≤ r1 ≤ 0.9 and 1.1 ≤ r1 ≤ 2. One advantage is that off stoichiometry creates an edge effect giving better defined boundaries between exposed and unexposed parts in the volume and giving a possibility to create thinner micro pillars. Another advantage is that it is easy to bind molecules to the surface to obtain desired surface properties.

Abstract translation: 制造合成纸的方法包括以下步骤：a）提供至少两种类型的可光聚合单体，b）将体积暴露于三维光图案以引发聚合反应，和c）除去未固化的单体 以创建开放的微结构。 该体积包含至少一种包含至少两个硫醇基团的单体和至少一种包含至少两个碳 - 碳双键的单体，其中硫醇基团数与碳 - 碳双键数之间的比率（r1）满足 一个：0.5≤r1≤0.9和1.1≤r1≤2。一个优点是关闭化学计量产生边缘效应，在体积中的暴露部分和未曝光部分之间提供更好的界定边界，并且产生更薄的微柱的可能性。 另一个优点是容易将分子结合到表面以获得所需的表面性质。

公开(公告)号：WO2014172406A1

公开(公告)日：2014-10-23

申请号：PCT/US2014/034271

申请日：2014-04-16

Applicant: E. I. DU PONT DE NEMOURS AND COMPANY

Inventor： LUETKE, Helmut

IPC: G03F7/20

CPC classification number: G03F7/201 ,  B41C1/00 ,  G03F7/20 ,  G03F7/2002 ,  G03F7/2008 ,  G03F7/2014 ,  G03F7/2041 ,  G03F7/2051 ,  G03F7/70558 ,  G03F7/70858 ,  G03F7/70875

Abstract: The invention pertains to an exposure apparatus, a method for controlling a photosensitive element to radiation using the exposure apparatus, and a method for exposing a photosensitive element to radiation. The exposure apparatus includes a base assembly having an exposure bed that supports the photosensitive element, and a lamp housing assembly having two or more lamps. The lamp housing assembly includes an adjustable ballast connected to at least one of the lamps to adjust power received by the one lamp, a sensor for measuring irradiance impinging the exposure bed; and a controller that adjusts the adjustable ballast based on comparison of the measured irradiance to the target irradiance, thereby adjusting the irradiance emitting from the lamp to the target irradiance.

Abstract translation: 本发明涉及曝光装置，使用曝光装置控制感光元件进行辐射的方法，以及用于将光敏元件暴露于辐射的方法。 曝光装置包括具有支撑感光元件的曝光床的基座组件和具有两个或更多个灯的灯壳体组件。 灯壳组件包括连接到至少一个灯的可调节镇流器，以调节由一个灯接收的功率，用于测量照射曝光床的辐照度的传感器; 以及基于测量的辐照度与目标辐照度的比较来调节可调节镇流器的控制器，由此调节从灯发出的辐照度到目标辐照度。

公开(公告)号：WO2014035566A1

公开(公告)日：2014-03-06

申请号：PCT/US2013/051240

申请日：2013-07-19

Applicant: MACDERMID PRINTING SOLUTIONS, LLC

Inventor： BALDWIN, Kyle, P.

IPC: G03F7/20

CPC classification number: G03F7/201

Abstract: A method of tailoring the shape of a plurality of relief printing dots created in a photosensitive printing blank during a platemaking process is provided. The photocurable layer is exposed to actinic radiation using an array of UV LED light assemblies and the use of the array of UV LED light assemblies produces relief printing dots having at least one geometric characteristic selected from the group consisting of a desired planarity of a top surface of the relief printing dots, a desired shoulder angle of the relief printing dots and a desired edge sharpness of the relief printing dots.

Abstract translation: 提供了一种在制版过程中定制在感光印刷坯料中产生的多个凸版印刷点的形状的方法。 使用UV LED灯组件的阵列将光固化层暴露于光化辐射，并且使用UV LED灯组件阵列产生具有至少一种几何特征的凸版印刷点，所述几何特征选自由顶表面的期望平面度 的凸版印刷点，凸版印刷点的期望的肩角和凸版印刷点的期望的边缘锐度。