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公开(公告)号：JPWO2002058129A1
公开(公告)日：2004-05-27
申请号：JP2002558320
申请日：2002-01-18
IPC: H01L21/316 , C23C16/40 , C23C16/448 , H01L21/02 , H01L21/31 , H01L21/8246 , H01L27/105 , H01L27/115
CPC classification number: H01L27/11502 , C23C16/40 , C23C16/4486 , H01L21/31691 , H01L27/11507 , H01L28/55
Abstract: 本発明の目的は、良好な残留分極特性が得られる最適な組成範囲を有すると共に信頼性の高いビスマス系層状結晶構造を有する強誘電体薄膜を提供することにある。本発明の強誘電体薄膜は、カーボンとストロンチウム(Sr)とビスマス(Bi)とタンタル(Ta)およびニオブ(Nb)のうちの少なくともタンタルと酸素(O)とを含む層状結晶構造であり、組成式を、SrBiyTa2O9±dもしくはSrxBiy(Ta,Nb)2O9±d(但し、0.90≦x
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公开(公告)号：JP2004031372A
公开(公告)日：2004-01-29
申请号：JP2002174853
申请日：2002-06-14
Applicant: Watanabe Shoko:Kk , 株式会社渡邊商行
Inventor： USUI HOZUMI , YAMOTO HISAYOSHI , UEDA KOSAKU
IPC: F04B43/08 , C23C16/448 , F04B43/10 , H01L21/31 , H01L21/8246 , H01L27/105
Abstract: PROBLEM TO BE SOLVED: To provide a solution feeder and a feeding method capable of feeding a solution which has no possibilities of dissolving a gas in it or deteriorating it, and deposition equipment and a deposition method making the reproducibility of deposition properties (especially, a deposition rate) satisfactory.
SOLUTION: A solution feeder 6 stores a solution housing 5 having flexibility and a connecting port 4 in the space 7 of a vessel 3 having a fluid induction port 1 and a solution outlet 2 with the connecting port 4 connected to the solution outlet 2.
COPYRIGHT: (C)2004,JPO-
公开(公告)号：JP3470055B2
公开(公告)日：2003-11-25
申请号：JP1497099
申请日：1999-01-22
IPC: H01L21/31 , C23C16/40 , C23C16/448 , H01L21/8242 , H01L27/108
CPC classification number: C23C16/4486 , C23C16/409
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公开(公告)号：JP2003273030A
公开(公告)日：2003-09-26
申请号：JP2002075258
申请日：2002-03-18
Applicant: Watanabe Shoko:Kk , 株式会社渡邊商行
Inventor： YAMOTO HISAYOSHI , FUKAGAWA MITSURU
IPC: C23C16/40 , C23C16/44 , C23C16/448 , H01L21/205 , H01L21/31
CPC classification number: C23C16/4402 , C23C16/409 , C23C16/4407 , C23C16/4481 , C23C16/4486
Abstract: PROBLEM TO BE SOLVED: To provide a method of causing CVD thin film to be deposited by which a vaporizer can be used for a long period, without causing clogging, etc., and in addition, a raw material can be supplied stably to a reaction section.
SOLUTION: In this method, a prescribed CVD thin film is formed by making a CVD raw material solution and a gas flow to a CVD chamber for an appropriate period of time through the vaporizer. In this method, only a solvent capable of dissolving deposits adhering to the vaporizer is made to flow to the vaporizer, by switching the gas from the outlet of the vaporizer to gas the evacuation side, after the prescribed period of time has elapsed.
COPYRIGHT: (C)2003,JPOAbstract translation: 要解决的问题：提供一种使得可以长期使用蒸发器的CVD薄膜沉积的方法，而不会引起堵塞等，并且还可以稳定地供应原料 到反应段。 解决方案：在该方法中，通过使CVD原料溶液和通过蒸发器将气体流动到CVD室中适当的时间来形成规定的CVD薄膜。 在这种方法中，通过在经过规定时间之后，仅通过将气体从蒸发器的出口切换到排气侧的气体，才能使附着在汽化器上的溶解沉积物的溶剂流到蒸发器。 版权所有（C）2003，JPO
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公开(公告)号：JP2003012331A
公开(公告)日：2003-01-15
申请号：JP2001195407
申请日：2001-06-27
Applicant: Asahi Denka Kogyo Kk , Watanabe Shoko:Kk , 旭電化工業株式会社 , 株式会社渡邊商行
Inventor： KUSUHARA MASAKI , WATABE HIROYUKI , UEHARA HIROSHI , SANPEI KEIKO , KURITA ARIYASU , TADA SHUICHI , OMI JINICHI , TAKAHASHI MAKIO , MORITA HIROSHI
CPC classification number: C03B19/1065 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/23 , C03C1/026 , C03C3/06 , C03C2201/02
Abstract: PROBLEM TO BE SOLVED: To provide a synthetic quartz glass particle with high purity which has high viscosity the same as natural quartz and has high purity the same as usual synthetic quartz and with low cost.
SOLUTION: The synthetic quartz glass particle with high purity is derived from an alkali metal silicate, and total metallic impurity amount in it is 1 μg/g or less. It has particularly an oxygen lack fault.
COPYRIGHT: (C)2003,JPOAbstract translation: 要解决的问题：提供具有与天然石英相同的高粘度的高纯度的合成石英玻璃颗粒，并且具有与通常的合成石英相同的低纯度的高纯度。 解决方案：纯度高的合成石英玻璃颗粒来源于碱金属硅酸盐，其总金属杂质量为1μg/ g以下。 特别是缺氧缺氧。
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Patent Agency Ranking6.发明专利Method for producing high purity silica particles and high purity silica particles and method for producing high purity quartz glass particles using them 审中-公开用于生产高纯度二氧化硅颗粒和高纯度二氧化硅颗粒的方法和使用它们生产高纯度白色玻璃颗粒的方法
公开(公告)号：JP2003012321A
公开(公告)日：2003-01-15
申请号：JP2001195406
申请日：2001-06-27
Applicant: Asahi Denka Kogyo Kk , Watanabe Shoko:Kk , 旭電化工業株式会社 , 株式会社渡邊商行
Inventor： KUSUHARA MASAKI , WATABE HIROYUKI , UEHARA HIROSHI , SANPEI KEIKO , TADA SHUICHI , OMI JINICHI , TAKAHASHI MAKIO , MORITA HIROSHI
IPC: C03B8/02 , C01B33/158 , C03B19/10 , C03C1/00 , C03C3/06
CPC classification number: C03C1/006 , C03B19/1065 , C03C2203/50 , C03C2203/52
Abstract: PROBLEM TO BE SOLVED: To provide a method for producing high purity silica particles obtained by using an inexpensive alkali metal silicate solution as a raw material and which have large diameter, the fine purity silica particles and a method for producing high purity quartz glass particles by using them.
SOLUTION: The method for producing high purity silica particles is comprised of the first process to dry a hydrated silica gel derived from the alkali metal silicate and the second process to wash the dried silica gel not containing free water or the partially dried hydrated silica gel containing decreased free water after crushing or without crushing. The treatment by the first process and the second process is practiced once or more.
COPYRIGHT: (C)2003,JPOAbstract translation: 要解决的问题：提供一种通过使用便宜的碱金属硅酸盐溶液作为原料并且具有大直径而获得的高纯度二氧化硅颗粒的方法，该纯度二氧化硅颗粒和通过以下方法制备高纯度石英玻璃颗粒的方法： 使用它们。 解决方案：生产高纯度二氧化硅颗粒的方法包括干燥由碱金属硅酸盐衍生的水合硅胶的第一种方法和第二种洗涤不含游离水的干燥硅胶或含部分干燥的含水硅胶的方法 粉碎后不得破坏游离水或不破碎。 第一过程和第二过程的处理一次或多次。
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公开(公告)号：JP2004103260A
公开(公告)日：2004-04-02
申请号：JP2002259340
申请日：2002-09-04
Applicant: Takashi Sugino , Watanabe Shoko:Kk , 杉野 隆 , 株式会社渡邊商行
Inventor： SUGINO TAKASHI , KUSUHARA MASAKI , UMEDA MASARU
IPC: H01J61/067
Abstract: PROBLEM TO BE SOLVED: To provide a discharge tube with high brightness operating at low voltage having improved characteristics, which is provided as the key device for a liquid crystal display, a plasma display, a lighting device or the like.
SOLUTION: A film with boron and nitrogen as main ingredients is formed on the surface of the discharge tube. Further, a nitride or a carbide such as titanium nitride, titanium carbide, silicon carbide or the like are inserted between the film and an electrode metal to aim at stabilization of the film and produce an electrode of a high reliability.
COPYRIGHT: (C)2004,JPOAbstract translation: 要解决的问题：提供作为液晶显示器的关键装置，等离子体显示器，照明装置等提供的具有改进的特性的，具有高亮度操作的低电压放电管。 解决方案：在放电管的表面上形成以硼和氮为主要成分的薄膜。 此外，在膜和电极金属之间插入诸如氮化钛，碳化钛，碳化硅等的氮化物或碳化物以使膜的稳定化，并产生高可靠性的电极。 版权所有（C）2004，JPO
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公开(公告)号：JPWO2002058141A1
公开(公告)日：2004-05-27
申请号：JP2002558330
申请日：2002-01-18
IPC: H01L21/205 , B01B1/00 , B01D3/34 , B01F3/04 , B01F5/06 , C23C16/40 , C23C16/448 , C23C16/455 , H01L21/02 , H01L21/316 , H01L21/8246 , H01L27/115
CPC classification number: H01L27/11502 , B01B1/005 , B01D3/346 , B01F3/04021 , B01F5/0646 , B01F5/0653 , B01F5/0656 , B01F5/0671 , B01F5/0676 , C23C16/40 , C23C16/409 , C23C16/4486 , H01L21/31691 , H01L27/11507 , H01L28/55 , Y10S261/65
Abstract: 目詰まりなどを起こすことがなく長期使用が可能であり、かつ、反応部への安定的な原料供給が可能な気化器を提供すること。分散部本体1の内部に形成されたガス通路2と、ガス通路2に加圧されたキャリアガス3を導入するガス導入口4と、ガス通路2を通過するキャリアガスに原料溶液5を供給するための手段6と、分散された原料溶液5を含むキャリアガスを気化部22に送るためのガス出口7と、ガス通路2内を流れるを冷却する手段18と、を有する分散部8と、装置の反応部と分散部8のガス出口7に接続された気化管20と、気化管20を加熱するヒータ21と、を有し、原料溶液が分散されたキャリアガスを加熱・気化させる気化部22と、を有し、ガス出口7の外側に細孔101を有する輻射防止部102を設けてある。
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公开(公告)号：JP2004119017A
公开(公告)日：2004-04-15
申请号：JP2002276386
申请日：2002-09-20
Applicant: Takashi Sugino , Watanabe Shoko:Kk , 杉野 隆 , 株式会社渡邊商行
Inventor： SUGINO TAKASHI , KUSUHARA MASAKI , UMEDA MASARU
IPC: G01N23/227 , C01B21/082 , C23C16/30 , C23C16/36 , C23C16/38 , H01J1/30 , H01J1/304 , H01J11/22 , H01J11/34 , H01J23/06 , H01J29/04 , H01J31/12 , H01J37/073 , H01J61/067 , H01J63/06 , H01L21/28 , H01L29/26 , H01L29/417 , H01J11/02
CPC classification number: C23C16/36 , C23C16/30 , H01J1/30 , H01J61/0675
Abstract: PROBLEM TO BE SOLVED: To provide a film which has good water resistance and in which cracks and separation of membrane are suppressed without deteriorating excellent property of the conventional BN thin membrane.
SOLUTION: This electrode and solid state element have a boron-carbon-nitrogen membrane or a boron-carbon-nitrogen-oxygen membrane having a carbon composition ratio of 0.15 or more.
COPYRIGHT: (C)2004,JPO-
公开(公告)号：JP2004103259A
公开(公告)日：2004-04-02
申请号：JP2002259339
申请日：2002-09-04
Applicant: Takashi Sugino , Watanabe Shoko:Kk , 杉野 隆 , 株式会社渡邊商行
Inventor： SUGINO TAKASHI , KUSUHARA MASAKI , UMEDA MASARU
Abstract: PROBLEM TO BE SOLVED: To provide an electrode capable of emitting electron with high brightness at low voltage, and an electron emission element with high performance which are key devices for a flat panel display, imaging apparatus, electron beam device, microwave travelling wave tube, lighting device, organic luminescent device, and electrochemical device. SOLUTION: A film is deposited on a fiber or a fiber piece, an electrode capable of emitting electron at low voltage by increasing field centralization factors, and a high-performance electron beam application device is produced by realizing the electron emission element. A compound of Group III atoms and nitrogen atom such as boron nitride, aluminum nitride, and boron aluminum nitride are used for the film. By adding other atoms in the film, generation of space charge and improvement of physical property of the film are realized. Further, stainless steel, a carbon nanotube or the like is used as the fiber or the fiber piece. COPYRIGHT: (C)2004,JPO
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