公开(公告)号：US5859117A

公开(公告)日：1999-01-12

申请号：US931263

申请日：1997-09-16

Applicant: Udo Goerl ,  Andrea Hunsche ,  Robert Kuhlmann ,  Mustafa Siray ,  Heinz Esch

Inventor： Udo Goerl ,  Andrea Hunsche ,  Robert Kuhlmann ,  Mustafa Siray ,  Heinz Esch

IPC: C01B33/187 ,  C01B33/193 ,  C08K3/00 ,  C08K3/36 ,  C08K9/00 ,  C08K9/06 ,  C08L21/00 ,  C09C1/30

CPC classification number: C09C1/3081 ,  C01B33/193 ,  C08K3/36 ,  C08K9/06 ,  C09C1/30 ,  C01P2004/50 ,  C01P2004/51 ,  C01P2004/61 ,  C01P2006/12 ,  C01P2006/14 ,  C01P2006/16 ,  C01P2006/17 ,  C01P2006/19 ,  C01P2006/21 ,  C01P2006/82 ,  C01P2006/90 ,  C08K2201/002 ,  C08K2201/006

Abstract: Precipitated silicas, characterized in that they have a CTAB surface area (in accordance with ASTM D 3765-92) of 200 to 400 m.sup.2 /g, a DBP index (in accordance with ASTM D 2414) between 230 and 380 ml/100 g as powder and 180-250 g/100 g as granulate, a silanol group density (V.sub.2 -NaOH consumption) of 20 to 30 ml and the following macropore size distribution which is typical of the surface area range involved, determined by means of Hg porosimetry (DIN 66 133) for specific pore size intervals (incremental mode of application):______________________________________ CTAB surface CTAB surface CTAB surface area range: area range: area range: 200-250 m.sup.2 /g 250-300 m.sup.2 /g 300-400 m.sup.2 /gPore size interval �nm! Hg consumption in ml/g of silica______________________________________10-20 0.27-0.49 0.35-0.50 0.32-0.4220-30 0.22-0.32 0.15-0.30 0.17-0.2230-40 0.15-0.21 0.12-0.17 0.12-0.1540-50 0.11-0.16 0.09-0.12 0.08-0.1150-60 0.08-0.12 0.06-0.10 0.06-0.09______________________________________

Abstract translation: 沉淀二氧化硅，其特征在于它们具有200至400m 2 / g的CTAB表面积（根据ASTM D 3765-92），230至380ml / 100g之间的DBP指数（根据ASTM D 2414）为 粉末和180-250g / 100g作为颗粒，硅烷醇组密度（V2-NaOH消耗）为20至30ml，并且通过Hg孔隙率法（通过Hg孔隙率法测定）是典型的涉及的表面积范围的大孔分布 DIN 66 133）适用于特定孔径间隔（增量模式）： - CTAB表面CTAB表面CTAB表面 - 面积范围：面积范围：面积范围： - 200-250 m2 / g 250-300 m2 / g 300-400 m2 / g - 孔径间隔[nm]汞消耗量（ml / g） - 10-20 0.27-0.49 0.35-0.50 0.32-0.42 - 20-30 0.22-0.32 0.15-0.30 0.17-0.22 - 30-40 0.15-0.21 0.12-0.17 0.12-0.15 - 40-50 0.11-0.16 0.09-0.12 0.08-0.11 - 50-60 0.08-0.12 0.06-0.10 0.06-0.09 -

公开(公告)号：US5705137A

公开(公告)日：1998-01-06

申请号：US655035

申请日：1996-05-29

Applicant: Udo Goerl ,  Andrea Hunsche ,  Robert Kuhlmann ,  Mustafa Siray ,  Heinz Esch

Inventor： Udo Goerl ,  Andrea Hunsche ,  Robert Kuhlmann ,  Mustafa Siray ,  Heinz Esch

IPC: C01B33/187 ,  C01B33/193 ,  C08K3/00 ,  C08K3/36 ,  C08K9/00 ,  C08K9/06 ,  C08L21/00 ,  C09C1/30 ,  C01B33/12

CPC classification number: C09C1/3081 ,  C01B33/193 ,  C08K3/36 ,  C08K9/06 ,  C09C1/30 ,  C01P2004/50 ,  C01P2004/51 ,  C01P2004/61 ,  C01P2006/12 ,  C01P2006/14 ,  C01P2006/16 ,  C01P2006/17 ,  C01P2006/19 ,  C01P2006/21 ,  C01P2006/82 ,  C01P2006/90 ,  C08K2201/002 ,  C08K2201/006

Abstract: Precipitated silicas, characterized in that they have a CTAB surface area (in accordance with ASTM D 3765-92) of 200 to 400 m.sup.2 /g, a DBP index (in accordance with ASTM D 2414) between 230 and 380 ml/100 g as powder and 180-250 g/100 g as granulate, a silanol group density (V.sub.2 -NaOH consumption) of 20 to 30 ml and the following macropore size distribution which is typical of the surface area range involved, determined by means of Hg porosimetry (DIN 66 133) for specific pore size intervals (incremental mode of application): ______________________________________ CTAB surface CTAB surface CTAB surface area range: area range: area range: 200-250 250-300 300-400 Pore size m.sup.2 /g m.sup.2 /g m.sup.2 /g interval �nm! Hg consumption in ml/g of silica ______________________________________ 10-20 0.27-0.49 0.35-0.50 0.32-0.42 20-30 0.22-0.32 0.15-0.30 0.17-0.22 30-40 0.15-0.21 0.12-0.17 0.12-0.15 40-50 0.11-0.16 0.09-0.12 0.08-0.11 50-60 0.08-0.12 0.06-0.10 0.06-0.09 ______________________________________

Abstract translation: 沉淀二氧化硅，其特征在于它们具有200至400m 2 / g的CTAB表面积（根据ASTM D 3765-92），230至380ml / 100g之间的DBP指数（根据ASTM D 2414）为 粉末和180-250g / 100g作为颗粒，硅烷醇组密度（V2-NaOH消耗）为20至30ml，并且通过Hg孔隙率法（通过Hg孔隙率法测定）是典型的涉及的表面积范围的大孔分布 DIN 66 133）适用于特定孔径间隔（增量模式）： - CTAB表面CTAB表面CTAB表面 - 面积范围：面积范围：面积范围： - 200-250 250-300 300-400 - 孔径m2 / g m2 / g m2 / g - 间隔[nm]汞消耗量，单位为ml / g二氧化硅 - 10-20 0.27-0.49 0.35-0.50 0.32-0.42 - 20-30 0.22-0.32 0.15-0.30 0.17-0.22 - 30-40 0.15- 0.21 0.12-0.17 0.12-0.15 - 40-50 0.11-0.16 0.09-0.12 0.08-0.11 - 50-60 0.08-0.12 0.06-0.10 0.06-0.09 -