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公开(公告)号：WO2011064154A3
公开(公告)日：2011-09-22
申请号：PCT/EP2010067874
申请日：2010-11-22
Applicant: BASF SE , ROEGER-GOEPFERT CORNELIA , RAETHER ROMAN BENEDIKT , MAYER DIETER , EMNET CHARLOTTE , ARNOLD MARCO
Inventor： ROEGER-GOEPFERT CORNELIA , RAETHER ROMAN BENEDIKT , MAYER DIETER , EMNET CHARLOTTE , ARNOLD MARCO
CPC classification number: C08G73/028 , C08L79/02 , C25D3/38 , H01L21/2885 , H01L21/76877 , H01L2924/0002 , H05K3/423 , H01L2924/00
Abstract: A composition comprising a source of metal ions and at least one additive comprising at least one polyaminoamide represented by formula (I) or derivatives of a polyaminoamide of formula (I) obtainable by complete or partial protonation, N-quarternisation or acylation.
Abstract translation: 包含金属离子源和至少一种添加剂的组合物，所述添加剂包含至少一种由式（I）表示的聚氨基酰胺或式（I）的聚氨基酰胺的衍生物，其可通过完全或部分质子化，N-季铵化或酰化获得。
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公开(公告)号：WO2012085811A1
公开(公告)日：2012-06-28
申请号：PCT/IB2011/055766
申请日：2011-12-19
Applicant: BASF SE , RÖGER-GÖPFERT, Cornelia , RAETHER, Roman, Benedikt , HÖRHAMMER, Harald , Arnold, Marco , Emnet, Charlotte , Mayer, Dieter , BASF (CHINA) COMPANY LIMITED
Inventor： RÖGER-GÖPFERT, Cornelia , RAETHER, Roman, Benedikt , HÖRHAMMER, Harald , Arnold, Marco , Emnet, Charlotte , Mayer, Dieter
Abstract: Disclosed is a composition comprising a source of metal ions, one or more suppressing agents and at least one additive comprising a linear or branched, polymeric biguanide compound comprising the structural unit of formula L1 or the corresponding salt thereof, wherein R 1 is independently selected from H or an organic radical having 1-20 carbon atoms; R 2 is an divalent organic radical having 1-20 carbon atoms, optionally comprising 20 polymeric biguanide side branches; and n is an integer of 2 or more.
Abstract translation: 公开了一种组合物，其包含金属离子源，一种或多种抑制剂和至少一种包含直链或支链的聚合双胍化合物的添加剂，其包含式L1结构单元或其相应的盐，其中R 1独立地选自H 或具有1-20个碳原子的有机基团; R2是具有1-20个碳原子的二价有机基团，任选地包含20个聚合双胍侧枝; n为2以上的整数。
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3.发明申请COMPOSITION FOR METAL PLATING COMPRISING SUPPRESSING AGENT FOR VOID FREE SUBMICRON FEATURE FILLING 审中-公开金属镀层组合物，用于无电离子特征填充的包含抑制剂的金属镀层
公开(公告)号：WO2011012475A1
公开(公告)日：2011-02-03
申请号：PCT/EP2010/060375
申请日：2010-07-19
Applicant: BASF SE , RÖGER-GÖPFERT, Cornelia , RAETHER, Roman Benedikt , MAYER, Dieter , HAAG, Alexandra , EMNET, Charlotte
Inventor： RÖGER-GÖPFERT, Cornelia , RAETHER, Roman Benedikt , MAYER, Dieter , HAAG, Alexandra , EMNET, Charlotte
IPC: C25D3/38 , H01L21/288 , H01L21/768 , C25D3/02 , C25D3/40
CPC classification number: C25D3/38 , C25D3/02 , C25D3/40 , H01L21/2885 , H01L21/76877
Abstract: A composition comprising at least one source of metal ions and at least one additive obtainable by reacting a polyhydric alcohol comprising at least 5 hydroxyl functional groups with at least a first alkylene oxide and a second alkylene oxide from a mixture of the first alkylene oxide and the second alkylene oxide or a third alkylene oxide, a second alkylene oxide, and a first alkylene oxide in aforesaid sequence, the third alkylene oxide having a longer alkyl chain than the second alkylene oxide and the second alkylene oxide having a longer alkyl chain than the first alkylene oxide.
Abstract translation: 一种组合物，其包含至少一种金属离子源和至少一种添加剂，其可通过使含有至少5个羟基官能团的多元醇与至少一种第一烯化氧和第二环氧烷烃从第一种烯化氧和 第二烯化氧或第三烯化氧，第二烯化氧和第一烯化氧，所述第三环氧烷具有比所述第二环氧烷更长的烷基链，并且所述第二烯化氧具有比所述第一烯化氧更长的烷基链 环氧烷。
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公开(公告)号：WO2011151785A1
公开(公告)日：2011-12-08
申请号：PCT/IB2011/052385
申请日：2011-05-31
Applicant: BASF SE , SIEMER, Michael , RÖGER-GÖPFERT, Cornelia , MEIER, Nicole , RAETHER, Roman, Benedikt , ARNOLD, Marco , EMNET, Charlotte , MAYER, Dieter , FLÜGEL, Alexander , BASF (CHINA) COMPANY LIMITED
Inventor： SIEMER, Michael , RÖGER-GÖPFERT, Cornelia , MEIER, Nicole , RAETHER, Roman, Benedikt , ARNOLD, Marco , EMNET, Charlotte , MAYER, Dieter , FLÜGEL, Alexander
CPC classification number: C25D3/38 , C08G73/0616 , C08L79/04 , C23C18/31 , C25D3/02 , C25D3/32 , C25D3/58 , C25D5/02
Abstract: A composition comprising a source of metal ions and at least one leveling agent comprising a linear or branched, polymeric imidazolium compound comprising the structural unit of formula L1 (L1) wherein R 1 , R 2 , R 3 are each independently selected from an H atom and an organic radical having from 1 to 20 carbon atoms, R4 is a divalent, trivalent or mutlivalent organic radical which does not comprise a hydroxyl group in the a or β position relative to the nitrogen atom of the imidazole rings. is an integer.
Abstract translation: 一种包含金属离子源的组合物和至少一种包含线性或支化的聚合咪唑鎓化合物的流平剂，其包含式L1（L1）的结构单元，其中R 1，R 2，R 3各自独立地选自H原子和有机 具有1至20个碳原子的基团，R 4是相对于咪唑环的氮原子在a或β位置不包含羟基的二价，三价或多价的有机基团。 是一个整数。
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5.发明申请COMPOSITION FOR METAL PLATING COMPRISING SUPPRESSING AGENT FOR VOID FREE SUBMICRON FEATURE FILLING 审中-公开金属镀层组合物，用于无电离子特征填充的包含抑制剂的金属镀层
公开(公告)号：WO2010115756A1
公开(公告)日：2010-10-14
申请号：PCT/EP2010/054108
申请日：2010-03-29
Applicant: BASF SE , RÖGER, Cornelia , RAETHER, Roman Benedikt , EMNET, Charlotte , HAAG, Alexandra , MAYER, Dieter
Inventor： RÖGER, Cornelia , RAETHER, Roman Benedikt , EMNET, Charlotte , HAAG, Alexandra , MAYER, Dieter
CPC classification number: C23C18/31 , C23C18/32 , C25D3/38 , C25D3/58 , C25D7/123 , H01L21/2885 , H01L21/76877 , H05K3/423
Abstract: A composition comprising a source of metal ions and at least one suppressing agent obtainable by reacting a) an amine compound comprising active amino functional groups with b) a mixture of ethylene oxide and at least one compound selected from C3 and C4 alkylene oxides, said suppressing agent having a molecular weight M w of 6000 g/mol or more.
Abstract translation: 一种包含金属离子源的组合物和至少一种抑制剂，其可通过使a）包含活性氨基官能团的胺化合物与b）环氧乙烷和至少一种选自C 3和C 4环氧烷烃的化合物的混合物反应，所述抑制剂 试剂的分子量Mw为6000g / mol以上。
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Patent Agency Ranking
公开(公告)号：WO2011064154A2
公开(公告)日：2011-06-03
申请号：PCT/EP2010/067874
申请日：2010-11-22
Applicant: BASF SE , RÖGER-GÖPFERT, Cornelia , RAETHER, Roman Benedikt , MAYER, Dieter , EMNET, Charlotte , ARNOLD, Marco
Inventor： RÖGER-GÖPFERT, Cornelia , RAETHER, Roman Benedikt , MAYER, Dieter , EMNET, Charlotte , ARNOLD, Marco
CPC classification number: C08G73/028 , C08L79/02 , C25D3/38 , H01L21/2885 , H01L21/76877 , H01L2924/0002 , H05K3/423 , H01L2924/00
Abstract: A composition comprising a source of metal ions and at least one additive comprising at least one polyaminoamide represented by formula (I) or derivatives of a polyaminoamide of formula (I) obtainable by complete or partial protonation, N-quarternisation or acylation.
Abstract translation: 包含金属离子源和至少一种添加剂的组合物，其包含至少一种由式（I）表示的聚氨基酰胺或通过完全或部分质子化，N-季铵化或酰化可得到的式（I）的聚氨基酰胺的衍生物。
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7.发明申请COMPOSITION FOR METAL PLATING COMPRISING SUPPRESSING AGENT FOR VOID FREE SUBMICRON FEATURE FILLING 审中-公开金属镀层组合物，用于无电离子特征填充的包含抑制剂的金属镀层
公开(公告)号：WO2011012462A2
公开(公告)日：2011-02-03
申请号：PCT/EP2010/060276
申请日：2010-07-16
Applicant: BASF SE , RÖGER-GÖPFERT, Cornelia , RAETHER, Roman Benedikt , HAAG, Alexandra , MAYER, Dieter , EMNET, Charlotte
Inventor： RÖGER-GÖPFERT, Cornelia , RAETHER, Roman Benedikt , HAAG, Alexandra , MAYER, Dieter , EMNET, Charlotte
IPC: C25D3/02
CPC classification number: C25D3/38 , C25D7/123 , H01L21/2885 , H01L21/76877 , H05K3/42
Abstract: According to the present invention a composition is provided comprising at least one source of metal ions and at least one additive obtainable by reacting a) a polyhydric alcohol condensate compound derived from at least one polyalcohol of formula (I) X(OH) n (I) by condensation with b) at least one alkylene oxide to form a polyhydric alcohol condensate comprising polyoxyalkylene side chains, wherein n is an integer from 3 to 6 and X is an n-valent linear or branched aliphatic or cycloaliphatic radical having from 2 to 10 carbon atoms, which may be substituted or unsubstituted.
Abstract translation: 根据本发明，提供了包含至少一种金属离子源和至少一种添加剂的组合物，所述添加剂可通过使a）至少一种式（I）的多元醇（I）X（OH）n（I）的多元醇缩合物化合物 ）与b）至少一种烯化氧以形成包含聚氧化烯侧链的多元醇缩合物，其中n是3至6的整数，X是具有2至10个的n价直链或支链脂族或脂环族基团 碳原子，其可以是取代或未取代的。
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8.发明申请COMPOSITION FOR METAL PLATING COMPRISING SUPPRESSING AGENT FOR VOID FREE SUBMICRON FEATURE FILLING 审中-公开金属镀层组合物，用于无电离子特征填充的包含抑制剂的金属镀层
公开(公告)号：WO2010115717A1
公开(公告)日：2010-10-14
申请号：PCT/EP2010/053881
申请日：2010-03-25
Applicant: BASF SE , RÖGER, Cornelia , RAETHER, Roman Benedikt , EMNET, Charlotte , HAAG, Alexandra , MAYER, Dieter
Inventor： RÖGER, Cornelia , RAETHER, Roman Benedikt , EMNET, Charlotte , HAAG, Alexandra , MAYER, Dieter
CPC classification number: C23C18/31 , C23C18/32 , C25D3/38 , C25D3/58 , C25D7/123 , H01L21/2885 , H01L21/76877 , H05K3/423
Abstract: A composition for filling submicrometer sized features having an aperture size of 30 nanometers or less comprising a source of copper ions, and at least one suppressing agent selected from compounds of formula (I) wherein - the R1 radicals are each independently selected from a copolymer of ethylene oxide and at least one further C3 to C4 alkylene oxide, said copolymer being a random copolymer. - the R2 radicals are each independently selected from R1 or alkyl. - X and Y are spacer groups independently, and X for each repeating unit independently, selected from C1 to C6 alkylen and Z-(O-Z)m wherein the Z radicals are each independently selected from C2 to C6 alkylen, - n is an integer equal to or greater than 0. - m is an integer equal to or greater than 1.
Abstract translation: 用于填充具有30纳米或更小孔径的亚微米尺寸特征的组合物，其包含铜离子源，以及至少一种选自式（I）化合物的抑制剂，其中-R 1基团各自独立地选自 环氧乙烷和至少一种其它C 3 -C 4环氧烷烃，所述共聚物是无规共聚物。 - R 2基团各自独立地选自R 1或烷基。 -X和Y独立地为间隔基，每个重复单元的X独立地选自C 1 -C 6亚烷基和Z-（OZ）m，其中Z基团各自独立地选自C 2 -C 6亚烷基，-n是等于 大于等于或大于1的整数。
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公开(公告)号：WO2010069810A1
公开(公告)日：2010-06-24
申请号：PCT/EP2009/066581
申请日：2009-12-08
Applicant: BASF SE , RÖGER, Cornelia , RAETHER, Roman, Benedikt , EBERT, Sophia , EMNET, Charlotte , HAAG, Alexandra , MAYER, Dieter
Inventor： RÖGER, Cornelia , RAETHER, Roman, Benedikt , EBERT, Sophia , EMNET, Charlotte , HAAG, Alexandra , MAYER, Dieter
CPC classification number: C08G73/024 , C08L79/02 , C25D3/02 , C25D3/38 , H01L21/2885 , H01L21/76877 , H05K3/423
Abstract: A composition comprising a source of metal ions and at least one leveling agent obtainable by condensing at least one trialkanolamine of the general formula N(R 1 -OH) 3 (Ia) and/or at least one dialkanolamine of the general formula R 2 -N(R 1 -OH) 2 (Ib) to give a polyalkanolamine(ll), wherein the R 1 radicals are each independently selected from a divalent, linear or branched aliphatic hydrocarbon radical having from 2 to 6 carbon atoms, and the R 2 radicals are each selected from hydrogen and linear or branched aliphatic, cycloaliphatic and aromatic hydrocarbon radicals having from 1 to 30 carbon atoms, or derivatives obtainable by alkoxylation, substitution or alkoxylation and substitution of said polyalkanolamine(ll).
Abstract translation: 包含金属离子源和至少一种流平剂的组合物，其可通过将至少一种通式为N（R 1 -OH）3（Ia）的三烷醇胺和/或至少一种通式R 2 -N的二链烷醇胺 R1-OH）2（Ib），得到聚链烷醇胺（II），其中R 1基团各自独立地选自具有2至6个碳原子的二价，直链或支链脂族烃基，R2基团各自选自 氢和具有1至30个碳原子的直链或支链脂族，脂环族和芳族烃基，或通过所述聚链烷醇胺（II）的烷氧基化，取代或烷氧基化和取代得到的衍生物。
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10.发明申请COMPOSITION FOR METAL ELECTROPLATING COMPRISING AN ADDITIVE FOR BOTTOM-UP FILLING OF THOUGH SILICON VIAS AND INTERCONNECT FEATURES 审中-公开用于金属电镀的组合物，包括用于底部填充硅橡胶和互连特征的添加剂
公开(公告)号：WO2012164509A1
公开(公告)日：2012-12-06
申请号：PCT/IB2012/052727
申请日：2012-05-31
Applicant: BASF SE , RÖGER-GÖPFERT, Cornelia , ARNOLD, Marco , FLÜGEL, Alexander , EMNET, Charlotte , RAETHER, Roman, Benedikt , MAYER, Dieter , BASF (CHINA) COMPANY LIMITED
Inventor： RÖGER-GÖPFERT, Cornelia , ARNOLD, Marco , FLÜGEL, Alexander , EMNET, Charlotte , RAETHER, Roman, Benedikt , MAYER, Dieter
CPC classification number: C25D3/38 , C08G73/028 , C08L79/02 , C23C18/38 , C25D7/123 , H01L21/2885 , H01L21/76898
Abstract: A composition comprising a source of metal ions and at least one polyaminoamide, said polyaminoamide comprising amide and amine functional groups in the polymeric backbone and aromatic moieties attached to or located within said polymeric backbone.
Abstract translation: 包含金属离子源和至少一种聚氨基酰胺的组合物，所述聚氨基酰胺在聚合物主链中包含酰胺和胺官能团，以及连接到或位于所述聚合物主链内的芳族部分。
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