公开(公告)号：WO2008140926A3

公开(公告)日：2009-05-28

申请号：PCT/US2008061812

申请日：2008-04-28

Applicant: QUALCOMM MEMS TECHNOLOGIES INC ,  SAMPSELL JEFFREY BRIAN ,  GALLY BRIAN JAMES ,  FLOYD PHILIP DON

Inventor： SAMPSELL JEFFREY BRIAN ,  GALLY BRIAN JAMES ,  FLOYD PHILIP DON

IPC: G02B26/00

CPC classification number: G02B26/0841 ,  B81B3/007 ,  B81B2201/042 ,  B81B2207/07 ,  B81B2207/092 ,  G02B5/284 ,  G02B26/001 ,  H01L31/04 ,  Y10T29/49126

Abstract: Methods of fabricating a microelectromechanical systems (MEMS) device with reduced masking and MEMS devices formed by the same are disclosed. In one embodiment, a MEMS device (900) is fabricated by laminating a front substrate (910) and a carrier (950), each of which has components preformed thereon. The front substrate (910) is provided with stationary electrodes formed thereover. A carrier (950) including movable electrodes (1360) formed thereover is attached to the front substrate (910). The carrier (3500) of some embodiments is released after transferring the movable electrodes (3510) to the front substrate (3570). In other embodiments, the carrier (3450) stays over the front substrate (3410), and serves as a backplate for the MEMS device (3400). Features are formed by deposition and patterning, by embossing, or by patterning and etching. In some embodiments in which the MEMS device (5200) serves as an interferometric modulator, the front substrate (5010) is also provided with black masks (5220) to prevent or mitigate bright areas in the actuated state of the MEMS device. Static interferometric modulators (5400) can also be formed by shaping or preformation and lamination. The methods not only reduce the manufacturing costs, but also provide a higher yield. The resulting MEMS devices can trap smaller volumes between laminated substrates and are less susceptible to pressure variations and moisture leakage.

Abstract translation: 公开了制造具有减小的掩蔽的微机电系统（MEMS）装置和由其形成的MEMS装置的方法。 在一个实施例中，MEMS器件（900）通过层压前基板（910）和载体（950）而制造，每个基板具有在其上预成型的部件。 前基板（910）上设有固定电极。 包括在其上形成的可动电极（1360）的载体（950）附接到前基板（910）。 一些实施例的载体（3500）在将可移动电极（3510）转移到前基板（3570）之后被释放。 在其它实施例中，载体（3450）停留在前基板（3410）上，并且用作MEMS装置（3400）的背板。 特征通过沉积和图案化，通过压花或通过图案化和蚀刻形成。 在其中MEMS器件（5200）用作干涉式调制器的一些实施例中，前基板（5010）还具有黑色掩模（5220），以防止或减轻MEMS器件的致动状态下的亮区。 静态干涉式调制器（5400）也可以通过成形或预形成和层压形成。 该方法不仅降低了制造成本，而且提供了更高的产量。 所得到的MEMS器件可以在层压基板之间捕获更小的体积，并且不易受压力变化和水分泄漏的影响。

公开(公告)号：WO2009006162A2

公开(公告)日：2009-01-08

申请号：PCT/US2008068205

申请日：2008-06-25

Applicant: QUALCOMM MEMS TECHNOLOGIES INC ,  HEALD DAVID L ,  ZHONG FAN ,  FLOYD PHILIP DON

Inventor： HEALD DAVID L ,  ZHONG FAN ,  FLOYD PHILIP DON

IPC: G02B26/08

CPC classification number: G02B26/001 ,  B81B3/0072 ,  B81B2201/047

Abstract: Disclosed is a microelectromechanical system (MEMS) device and method of manufacturing the same. In one aspect, MEMS such as an interferometric modulator include one or more elongated interior posts and support rails supporting a deformable reflective layer, where the elongated interior posts are entirely within an interferometric cavity and aligned parallel with the support rails. In another aspect, the interferometric modulator includes one or more elongated etch release holes formed in the deformable reflective layer and aligned parallel with channels formed in the deformable reflective layer defining parallel strips of the deformable reflective layer.

Abstract translation: 公开了一种微机电系统（MEMS）装置及其制造方法。 在一个方面，诸如干涉式调制器的MEMS包括一个或多个细长的内部柱和支撑可变形的反射层的支撑轨道，其中细长的内部柱完全在干涉式空腔内并与支撑轨平行排列。 在另一方面，干涉式调制器包括形成在可变形反射层中的一个或多个细长蚀刻释放孔，并且与形成在可变形反射层中形成的沟道平行排列，所述可变形反射层限定可变形反射层的平行条带。

公开(公告)号：WO2013063495A1

公开(公告)日：2013-05-02

申请号：PCT/US2012/062262

申请日：2012-10-26

Applicant: QUALCOMM INCORPORATED ,  MEADOR, James Chester ,  GRIFFITHS, Jonathan Charles ,  SETHI, Gaurav ,  BURNS, David William ,  FLOYD, Philip Don

Inventor： MEADOR, James Chester ,  GRIFFITHS, Jonathan Charles ,  SETHI, Gaurav ,  BURNS, David William ,  FLOYD, Philip Don

IPC: H04L29/08 ,  H04L12/28 ,  H04W4/02 ,  H04W4/00 ,  H04W4/04

CPC classification number: H04L67/125 ,  H04L12/2807 ,  H04L2012/2841 ,  H04W4/043

Abstract: Techniques disclosed herein provide for utilizing network nodes in a building automation system (BAS) that provide a low cost, highly-accurate positioning system. During a commissioning process, nodes can be used to automatically determine a location of other nodes within the building, and the other nodes can be automatically associated with certain sensors and/or controls, based on their locations and attributes. Additional information may be exchanged between the other nodes and other elements of the BAS during the commissioning process. Ranging techniques can be used to locate and/or track nodes, allowing assets and people to be accurately located within the building.

Abstract translation: 本文公开的技术提供了在建筑物自动化系统（BAS）中利用提供低成本，高精度定位系统的网络节点。 在调试过程中，可以使用节点来自动确定建筑物内其他节点的位置，其他节点可以根据其位置和属性自动与某些传感器和/或控件相关联。 在调试过程中，可以在其他节点和BAS的其他元件之间交换附加信息。 测距技术可用于定位和/或跟踪节点，允许资产和人员准确地位于建筑物内。

公开(公告)号：WO2008140926A2

公开(公告)日：2008-11-20

申请号：PCT/US2008/061812

申请日：2008-04-28

Applicant: QUALCOMM MEMS TECHNOLOGIES, INC. ,  SAMPSELL, Jeffrey, Brian ,  GALLY, Brian, James ,  FLOYD, Philip, Don

Inventor： SAMPSELL, Jeffrey, Brian ,  GALLY, Brian, James ,  FLOYD, Philip, Don

IPC: G02B26/00

CPC classification number: G02B26/0841 ,  B81B3/007 ,  B81B2201/042 ,  B81B2207/07 ,  B81B2207/092 ,  G02B5/284 ,  G02B26/001 ,  H01L31/04 ,  Y10T29/49126

Abstract: Methods of fabricating a microelectromechanical systems (MEMS) device with reduced masking and MEMS devices formed by the same are disclosed. In one embodiment, a MEMS device (900) is fabricated by laminating a front substrate (910) and a carrier (950), each of which has components preformed thereon. The front substrate (910) is provided with stationary electrodes formed thereover. A carrier (950) including movable electrodes (1360) formed thereover is attached to the front substrate (910). The carrier (3500) of some embodiments is released after transferring the movable electrodes (3510) to the front substrate (3570). In other embodiments, the carrier (3450) stays over the front substrate (3410), and serves as a backplate for the MEMS device (3400). Features are formed by deposition and patterning, by embossing, or by patterning and etching. In some embodiments in which the MEMS device (5200) serves as an interferometric modulator, the front substrate (5010) is also provided with black masks (5220) to prevent or mitigate bright areas in the actuated state of the MEMS device. Static interferometric modulators (5400) can also be formed by shaping or preformation and lamination. The methods not only reduce the manufacturing costs, but also provide a higher yield. The resulting MEMS devices can trap smaller volumes between laminated substrates and are less susceptible to pressure variations and moisture leakage.

Abstract translation: 公开了制造具有减小的掩蔽的微机电系统（MEMS）装置和由其形成的MEMS装置的方法。 在一个实施例中，MEMS器件（900）通过层压前基板（910）和载体（950）而制造，每个基板具有在其上预成型的部件。 前基板（910）上设有固定电极。 包括在其上形成的可动电极（1360）的载体（950）附接到前基板（910）。 一些实施例的载体（3500）在将可移动电极（3510）转移到前基板（3570）之后被释放。 在其它实施例中，载体（3450）停留在前基板（3410）上，并且用作MEMS装置（3400）的背板。 特征通过沉积和图案化，通过压花或通过图案化和蚀刻形成。 在其中MEMS器件（5200）用作干涉式调制器的一些实施例中，前基板（5010）还具有黑色掩模（5220），以防止或减轻MEMS器件的致动状态下的亮区。 静态干涉式调制器（5400）也可以通过成形或预形成和层压形成。 该方法不仅降低了制造成本，而且提供了更高的产量。 所得到的MEMS器件可以在层压基板之间捕获更小的体积，并且不易受压力变化和水分泄漏的影响。

公开(公告)号：WO2009006162A3

公开(公告)日：2009-01-08

申请号：PCT/US2008/068205

申请日：2008-06-25

Applicant: QUALCOMM MEMS TECHNOLOGIES, INC. ,  HEALD, David, L. ,  ZHONG, Fan ,  FLOYD, Philip, Don

Inventor： HEALD, David, L. ,  ZHONG, Fan ,  FLOYD, Philip, Don

IPC: B81B3/00

Abstract: Disclosed is a microelectromechanical system (MEMS) device and method of manufacturing the same. In one aspect, MEMS such as an interferometric modulator include one or more elongated interior posts and support rails supporting a deformable reflective layer, where the elongated interior posts are entirely within an interferometric cavity and aligned parallel with the support rails. In another aspect, the interferometric modulator includes one or more elongated etch release holes formed in the deformable reflective layer and aligned parallel with channels formed in the deformable reflective layer defining parallel strips of the deformable reflective layer.