公开(公告)号：WO1995010608A1

公开(公告)日：1995-04-20

申请号：PCT/EP1993002853

申请日：1993-10-15

Applicant: FOUNDATION FOR RESEARCH AND TECHNOLOGY - HELLAS (FO.R.T.H.) ,  DKFZ DEUTSCHES KREBSFORSCHUNGSZENTRUM STIFTUNG DES ÖFFENTLICHEN RECHTS ,  TABLER, Martin ,  SCZAKIEL, Georg ,  HOMANN, Matthias

Inventor： FOUNDATION FOR RESEARCH AND TECHNOLOGY - HELLAS (FO.R.T.H.) ,  DKFZ DEUTSCHES KREBSFORSCHUNGSZENTRUM STIFTUNG DES ÖFFENTLICHEN RECHTS

IPC: C12N15/11

CPC classification number: C12N15/113 ,  A61K38/00 ,  C12N2310/111 ,  C12N2310/121

Abstract: Nucleotide sequences are described which can be used for target RNA-specific construction of asymmetric hammerhead ribozymes having high catalytic activity. Further, methods for the production of these asymmetric ribozymes and DNA sequences encoding them as well as compositions containing such ribozymes or DNA sequences are described.

Abstract translation: 描述了可用于具有高催化活性的不对称锤头核酶的靶RNA特异性构建的核苷酸序列。 此外，描述了制备这些不对称核酶和编码它们的DNA序列的方法以及含有这种核酶或DNA序列的组合物。

公开(公告)号：EP0983366A2

公开(公告)日：2000-03-08

申请号：EP98928300.7

申请日：1998-05-20

Applicant: FOUNDATION FOR RESEARCH AND TECHNOLOGY HELLAS (FO.R.T.H.) INSTITUTE OF MOLECULAR BIOLOGY & BIOTECHNOLOGY

Inventor： THIREOS, George, ,  KAFETZOPOULOS, Dimitris,

IPC: C12N15/54 ,  C12N9/10 ,  G01N33/00

CPC classification number: A01N61/00 ,  C12N9/1051 ,  C12Q1/48 ,  C12Y204/01016

Abstract: The present invention relates to nucleic acids comprising a nucleotide sequence encoding at least a portion of an enzyme which catalyzes the synthesis of chitin in arthropods, a screening to assay and identify new, and method for developing chitin synthesis inhibitors.

公开(公告)号：EP1325954A1

公开(公告)日：2003-07-09

申请号：EP03005489.4

申请日：1998-05-20

Applicant: FOUNDATION FOR RESEARCH AND TECHNOLOGY HELLAS (FO.R.T.H.) INSTITUTE OF MOLECULAR BIOLOGY & BIOTECHNOLOGY

Inventor： Thireos, George, Foundation for Res.&Tech.- Hellas ,  Kafetzopoulos, Dimitris F.for Res.&Tech.- Hellas

IPC: C12N9/10 ,  C12N15/00

CPC classification number: A01N61/00 ,  C12N9/1051 ,  C12Q1/48 ,  C12Y204/01016

Abstract: The present invention relates to nucleic acids comprising a nucleotide sequence encoding at least a portion of an enzyme which catalyzes the synthesis of chitin in arthropods, inhibitors directed to said enzyme, and a method for developing said inhibitors.

Abstract translation: 本发明涉及核酸，其包含编码催化合成节肢动物中几丁质的酶的至少一部分的核苷酸序列，针对所述酶的抑制剂和用于开发所述抑制剂的方法。

公开(公告)号：EP0785998B1

公开(公告)日：1998-07-29

申请号：EP94930172.5

申请日：1994-10-14

Applicant: FOUNDATION FOR RESEARCH AND TECHNOLOGY HELLAS (FO.R.T.H.) INSTITUTE OF MOLECULAR BIOLOGY & BIOTECHNOLOGY ,  DKFZ DEUTSCHES KREBSFORSCHUNGSZENTRUM STIFTUNG DES ÖFFENTLICHEN RECHTS

Inventor： TABLER, Martin ,  SCZAKIEL, Georg ,  HOMANN, Matthias

IPC: C12N15/11 ,  C12N9/00 ,  A61K31/70

CPC classification number: C12N15/113 ,  A61K38/00 ,  C12N2310/111 ,  C12N2310/121

公开(公告)号：EP0983366B1

公开(公告)日：2003-05-02

申请号：EP98928300.7

申请日：1998-05-20

Applicant: FOUNDATION FOR RESEARCH AND TECHNOLOGY HELLAS (FO.R.T.H.) INSTITUTE OF MOLECULAR BIOLOGY & BIOTECHNOLOGY

Inventor： THIREOS, George, ,  KAFETZOPOULOS, Dimitris,

IPC: C12N15/54 ,  C12N9/10 ,  G01N33/00

CPC classification number: A01N61/00 ,  C12N9/1051 ,  C12Q1/48 ,  C12Y204/01016

Abstract: The present invention relates to nucleic acids comprising a nucleotide sequence encoding at least a portion of an enzyme which catalyzes the synthesis of chitin in arthropods, a screening to assay and identify new, and method for developing chitin synthesis inhibitors.

公开(公告)号：EP0785998A1

公开(公告)日：1997-07-30

申请号：EP94930172.0

申请日：1994-10-14

Applicant: FOUNDATION FOR RESEARCH AND TECHNOLOGY HELLAS (FO.R.T.H.) INSTITUTE OF MOLECULAR BIOLOGY & BIOTECHNOLOGY ,  DKFZ DEUTSCHES KREBSFORSCHUNGSZENTRUM STIFTUNG DES ÖFFENTLICHEN RECHTS

Inventor： TABLER, Martin ,  SCZAKIEL, Georg ,  HOMANN, Matthias

IPC: C12N15 ,  A61K38

CPC classification number: C12N15/113 ,  A61K38/00 ,  C12N2310/111 ,  C12N2310/121

Abstract: Nucleotide sequences are described which can be used for target RNA-specific construction of asymmetric hammerhead ribozymes having high catalytic activity. Further, methods for the production of these asymmetric ribozymes and DNA sequences encoding them as well as compositions containing such ribozymes or DNA sequences are described.

公开(公告)号：EP1340556A2

公开(公告)日：2003-09-03

申请号：EP03386004.0

申请日：2003-03-03

Applicant: Foundation for Research and Technology-Hellas (FO.R.T.H.), Institute of Electronic Structure and Laser ,  Zafiropulos, Vassilis

Inventor： Zafiropulos, Vassilis ,  Pouli, Paraskevi ,  Eglezis, Apostolis ,  Petrakis, Aristides

IPC: B08B7/00 ,  B23K26/14

CPC classification number: G21F9/005 ,  A61B18/20 ,  B08B7/0042 ,  B23K26/0604 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/067 ,  C04B41/0036 ,  C04B41/009 ,  C04B41/80 ,  E04G23/002 ,  C04B41/53 ,  C04B33/00 ,  C04B14/28 ,  C04B14/285

Abstract: The present invention relates to a method and a device for removal of any kind of superficial encrustation from surfaces, by the synchronous use of the fundamental and one of the harmonic frequencies of a short-pulse laser system (in the order of 1- 40 ns). This is embodied by temporal and spatial overlapping of the two beams in various ratios of energy density values between them. The present invention relates to a problem of major concern, related to the cleaning of stone-sculpted surfaces of historic and/or artistic value without any alteration to the underlying authentic surfaces. The invention can be employed in other materials such as façades, metallic surfaces, glass, paper, wood etc. as well as in other applications of industrial or medical interest, such as the removal of radioactive residues from any type of surfaces or the removal of deposits from any kind of animal tissues. The success of this method is based on the combined action of two discrete mechanisms for the removal of surface deposits, embodied by the use of laser pulses of two different wavelengths simultaneously. The suggested device is based on the spatial and temporal overlapping of the fundamental frequency with one of its harmonics, as well as the possibility to adjust the energy of each one of the two radiations individually.

Abstract translation: 本发明涉及一种方法和用于去除任何种类的从表面浅表结壳的装置，通过所述同步使用的基本的和短脉冲激光系统的谐波频率中的一个（在1- 40纳秒量级 ）。 这是通过在它们之间的能量密度值的各种比例的两个光束的时间和空间重叠的构造。 本发明涉及重大关切的问题，涉及到的历史和/或艺术价值的石头雕刻的表面清洁，没有任何改动底层的真实面。 如幕墙，金属表面，玻璃，纸，木材等，以及在工业或医疗感兴趣的其他应用程序，：如从任何类型的表面的除去放射性残基或去除：本发明可在其他材料中使用 从任何一种动物组织存款。 这种方法的成功是基于两个分立机制用于移除表面沉积物的，通过使用同时两种不同波长的激光脉冲的具体的组合作用。 所建议的装置是基于所述基本频率的空间和时间重叠与其谐波中的一个，以及调整独立两个辐射中的每一个的能量的可能性。

公开(公告)号：EP1130647A2

公开(公告)日：2001-09-05

申请号：EP01600004.4

申请日：2001-02-28

Applicant: Halkias, George ,  Tsoukalas, Dimitrios ,  Georgakilas, Alexandros ,  Foundation for Research and Technology-Hellas (FO.R.T.H.), Institute of Electronic Structure and Laser ,  National Center for Scientific Research "Demokritos"/Institute of Microelectronics (NCSR "Demokritos"/Inst. of Microelec.)

Inventor： Georgakilas, Alexandros ,  Halkias, George ,  Tsoukalas, Dimitris

IPC: H01L25/16

CPC classification number: H01L31/0304 ,  H01L21/8258 ,  H01L31/0368 ,  H01L31/1852 ,  Y02E10/544

Abstract: An integrated fabrication procedure of optoelectronic (OE) system, comprising light-emitting diodes (Lasers or LEDs) as well as photodetectors fabricated with III-V compound semiconductor epitaxial layers deposited on a crystalline wafer bonded on a Silicon wafer on which the CMOS/BiCMOS integrated circuits have been fabricated, characterized in that the bonding of the wafer containing the III-V epitaxial layers with the Silicon wafer is achieved either with an adhesive epoxy or with a Wafer Bonding procedure through the employment of an intermediate layer of SOG, SiO 2 or Si 3 N 4 (or a combination of them); the intermediate layers are deposited at low temperature (below 450°C) and the bonding is accomplished at even lower temperature (below 250°C). The invention is characterized in that the integration of the microelectronic with the optoelectronic components is achieved in a three-dimensional arrangement using a wafer scale fabrication procedure.

Abstract translation: 光电（OE）系统的集成制造程序，其包括发光二极管（激光或LED），以及与沉积键合的硅晶片上的结晶晶片上的III-V族化合物半导体外延层制造的光电检测器在其上CMOS / BiCMOS工艺 集成电路已经被制造，dadurch gekennzeichnet，DASS死晶片包含在III-V外延层与所述硅晶片的接合，实现无论是用在粘合剂环氧树脂或通过就业SOG，SiO 2构成的中间层的晶片键合过程 或Si 3 N 4（或它们的组合）; 所述中间层在低温下沉积（低于450℃）和接合在甚至更低的温度下完成（低于250℃）。 在没有与所述光电元件的微电子的积分使用晶片级制造过程中的三维布置实现本发明的特征。

公开(公告)号：EP1130647A3

公开(公告)日：2007-08-22

申请号：EP01600004.4

申请日：2001-02-28

Applicant: Halkias, George ,  Tsoukalas, Dimitrios ,  Georgakilas, Alexandros ,  Foundation for Research and Technology-Hellas (FO.R.T.H.), Institute of Electronic Structure and Laser ,  National Center for Scientific Research "Demokritos"/Institute of Microelectronics (NCSR "Demokritos"/Inst. of Microelec.)

Inventor： Georgakilas, Alexandros ,  Halkias, George ,  Tsoukalas, Dimitris

IPC: H01L21/8258 ,  H01L21/20 ,  H01L33/00 ,  H01L25/16

CPC classification number: H01L31/0304 ,  H01L21/8258 ,  H01L31/0368 ,  H01L31/1852 ,  Y02E10/544

Abstract: An integrated fabrication procedure of optoelectronic (OE) system, comprising light-emitting diodes (Lasers or LEDs) as well as photodetectors fabricated with III-V compound semiconductor epitaxial layers deposited on a crystalline wafer bonded on a Silicon wafer on which the CMOS/BiCMOS integrated circuits have been fabricated, characterized in that the bonding of the wafer containing the III-V epitaxial layers with the Silicon wafer is achieved either with an adhesive epoxy or with a Wafer Bonding procedure through the employment of an intermediate layer of SOG, SiO 2 or Si 3 N 4 (or a combination of them); the intermediate layers are deposited at low temperature (below 450°C) and the bonding is accomplished at even lower temperature (below 250°C). The invention is characterized in that the integration of the microelectronic with the optoelectronic components is achieved in a three-dimensional arrangement using a wafer scale fabrication procedure.

公开(公告)号：EP1340556A3

公开(公告)日：2003-12-17

申请号：EP03386004.0

申请日：2003-03-03

Applicant: Foundation for Research and Technology-Hellas (FO.R.T.H.), Institute of Electronic Structure and Laser ,  Zafiropulos, Vassilis

Inventor： Zafiropulos, Vassilis ,  Pouli, Paraskevi ,  Eglezis, Apostolis ,  Petrakis, Aristides

IPC: B08B7/00 ,  B23K26/14

CPC classification number: G21F9/005 ,  A61B18/20 ,  B08B7/0042 ,  B23K26/0604 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/067 ,  C04B41/0036 ,  C04B41/009 ,  C04B41/80 ,  E04G23/002 ,  C04B41/53 ,  C04B33/00 ,  C04B14/28 ,  C04B14/285

Abstract: The present invention relates to a method and a device for removal of any kind of superficial encrustation from surfaces, by the synchronous use of the fundamental and one of the harmonic frequencies of a short-pulse laser system (in the order of 1- 40 ns). This is embodied by temporal and spatial overlapping of the two beams in various ratios of energy density values between them. The present invention relates to a problem of major concern, related to the cleaning of stone-sculpted surfaces of historic and/or artistic value without any alteration to the underlying authentic surfaces. The invention can be employed in other materials such as façades, metallic surfaces, glass, paper, wood etc. as well as in other applications of industrial or medical interest, such as the removal of radioactive residues from any type of surfaces or the removal of deposits from any kind of animal tissues. The success of this method is based on the combined action of two discrete mechanisms for the removal of surface deposits, embodied by the use of laser pulses of two different wavelengths simultaneously. The suggested device is based on the spatial and temporal overlapping of the fundamental frequency with one of its harmonics, as well as the possibility to adjust the energy of each one of the two radiations individually.