公开(公告)号：WO2009060294A2

公开(公告)日：2009-05-14

申请号：PCT/IB2008/002977

申请日：2008-11-03

Applicant: ASML NETHERLANDS B.V. ,  TNO ,  DE LAAT, Wilhelmus, Johannes, Maria ,  GUI, Cheng-Qun ,  GIESEN, Peter, Theodorus, Maria ,  VAN DER HEIJDEN, Marcus, Theodoor, Wilhelmus ,  MEINDERS, Erwin, Rinaldo ,  PETER, Maria

Inventor： DE LAAT, Wilhelmus, Johannes, Maria ,  GUI, Cheng-Qun ,  GIESEN, Peter, Theodorus, Maria ,  VAN DER HEIJDEN, Marcus, Theodoor, Wilhelmus ,  MEINDERS, Erwin, Rinaldo ,  PETER, Maria

IPC: G01B11/30

CPC classification number: G01B11/306 ,  G01N2021/95676 ,  G03F7/703 ,  G03F7/70783 ,  G03F7/7085

Abstract: A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including: directing a beam of radiation at the surface of the flexible substrate; and detecting changes in the intensity distribution of the beam of radiation after the beam of radiation has been reflected from the surface of the substrate to obtain information indicative of the topography of the surface of the flexible substrate.

Abstract translation: 一种获得指示柔性基板的表面的形貌的信息的方法，所述方法包括：在所述柔性基板的表面处引导辐射束; 并且在辐射束已经从基底表面反射之后检测辐射束的强度分布的变化，以获得指示柔性基底表面的形貌的信息。

公开(公告)号：WO2010032224A3

公开(公告)日：2011-06-23

申请号：PCT/IB2009054135

申请日：2009-09-21

Applicant: ASML NETHERLANDS BV ,  DE JAGER PIETER WILLEM HERMAN ,  BANINE VADIM YEVGENYEVICH ,  BENSCHOP JOZEF PETRUS HENRICUS ,  GUI CHENG-QUN ,  ONVLEE JOHANNES ,  VAN ZWET ERWIN JOHN

Inventor： DE JAGER PIETER WILLEM HERMAN ,  BANINE VADIM YEVGENYEVICH ,  BENSCHOP JOZEF PETRUS HENRICUS ,  GUI CHENG-QUN ,  ONVLEE JOHANNES ,  VAN ZWET ERWIN JOHN

IPC: G03F7/20

CPC classification number: G03F7/70183 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704

Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.

Abstract translation: 在一个实施例中，公开了一种光刻设备，其包括调制器，其被配置为将基板的曝光区域暴露于根据期望图案调制的多个光束;以及投影系统，该投影系统被配置为将经调制的光束投影到基板上。 调制器可以相对于曝光区域可移动，和/或投影系统可以具有用于接收多个光束的透镜阵列，透镜阵列可相对于曝光区域移动。

公开(公告)号：WO2010032224A2

公开(公告)日：2010-03-25

申请号：PCT/IB2009/054135

申请日：2009-09-21

Applicant: ASML NETHERLANDS B.V. ,  DE JAGER, Pieter Willem Herman ,  BANINE, Vadim Yevgenyevich ,  BENSCHOP, Jozef Petrus Henricus ,  GUI, Cheng-Qun ,  ONVLEE, Johannes ,  VAN ZWET, Erwin John

Inventor： DE JAGER, Pieter Willem Herman ,  BANINE, Vadim Yevgenyevich ,  BENSCHOP, Jozef Petrus Henricus ,  GUI, Cheng-Qun ,  ONVLEE, Johannes ,  VAN ZWET, Erwin John

IPC: G03F7/20

CPC classification number: G03F7/70183 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704

Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.

Abstract translation: 在一个实施例中，公开了一种光刻设备，其包括调制器，其被配置为将基板的曝光区域暴露于根据期望图案调制的多个光束;以及投影系统，该投影系统配置成将经调制的光束投影到基板上。 调制器可以相对于曝光区域可移动，和/或投影系统可以具有用于接收多个光束的透镜阵列，透镜阵列可相对于曝光区域移动。

公开(公告)号：WO2009060294A3

公开(公告)日：2009-08-13

申请号：PCT/IB2008002977

申请日：2008-11-03

Applicant: ASML NETHERLANDS BV ,  TNO ,  DE LAAT WILHELMUS JOHANNES MARIA ,  GUI CHENG-QUN ,  GIESEN PETER THEODORUS MARIA ,  VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS ,  MEINDERS ERWIN RINALDO ,  PETER MARIA

Inventor： DE LAAT WILHELMUS JOHANNES MARIA ,  GUI CHENG-QUN ,  GIESEN PETER THEODORUS MARIA ,  VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS ,  MEINDERS ERWIN RINALDO ,  PETER MARIA

IPC: G01B11/30

CPC classification number: G01B11/306 ,  G01N2021/95676 ,  G03F7/703 ,  G03F7/70783 ,  G03F7/7085

Abstract: A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including: directing a beam of radiation at the surface of the flexible substrate; and detecting changes in the intensity distribution of the beam of radiation after the beam of radiation has been reflected from the surface of the substrate to obtain information indicative of the topography of the surface of the flexible substrate.

Abstract translation: 一种获得指示柔性基板的表面的形貌的信息的方法，所述方法包括：在柔性基板的表面处引导辐射束; 并且检测在辐射束之后的辐射束的强度分布的变化已经从衬底的表面反射以获得指示柔性衬底的表面的形貌的信息。