Abstract:
PROBLEM TO BE SOLVED: To provide a cantilever for a scanning probe microscope capable of performing stable scanning even with respect to a linear sample of which the area is narrower than that of the leading end part of a probe. SOLUTION: The cantilever 10 for the scanning probe microscope is constituted by forming a probe part 12 to one end of a lever part 11 and integrally forming a support 13 to the other end of the lever part 11. The probe part 12 is a linear projection having a length L protruded in the thickness direction (Z-direction) of the lever part 11 and extended in the length direction (X-direction) of the lever part 11. The leading end of the probe part 12 is a ridgeline 12a. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a mold for a micro part low in production cost, having high accuracy and capable of withstanding repeated use or highly accurate processing such as extrusion molding or the like because of its high surface hardness, and a method for manufacturing the same. SOLUTION: The master mold 6 of the mold for the micro part is prepared by processing the surface of an Si substrate and a hard film comprising a TiN film 5 is subsequently formed on the surface of the master mold 6. Then, the master mold 6 is transferred, for example, to a Ti-4.5Al-3V-2Fe-2Mo alloy having super-plasticity. COPYRIGHT: (C)2003,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide a mold for micro-parts having high precision and a low manufacturing cost, and a manufacturing method therefor. SOLUTION: This manufacturing method comprises preparing an original mold 5 of the mold for micro-parts, by machining the surface of a Si substrate by a lithography method, a dry etching method, or the like, and transferring the original mold 5 to a titanium alloy 7 having superplasticity. COPYRIGHT: (C)2003,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide a ultraminiature capacitor microphone having a desired resonance frequency. SOLUTION: A capacitor microphone 1 comprises a base plate 31, a back plate 13, a diaphragm 32, and a beam section 12a. The diaphragm 32 and the beam section 12a are formed integrally. The diaphgramn 32 is disposed facing the back plate 13 with a gap A formed therebetween. An Al film 51 is formed on the front surface of the beam section 12a as a movable side electrode, and an Al film 52 is formed on the front surface of the back plate 13 as a fixed side electrode. The Al film 51 and the Al film 52 are flushed with each other. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a mold for a microcomponent, which reduces manufacturing costs and has high accuracy and wherein a hardness of a surface layer is high, and a manufacturing method therefor. SOLUTION: This mold 10 for the microcomponent is composed of plated metal in which a hard coating 11 is formed at least as the surface layer. The hard coating 11 has a skewed distribution composition. The hard coating 11 is composed of a titanium film including titanium nitride, and the concentration of the titanium nitride is gradually decreased inward from the surface layer of the coating 11. In this manufacturing method for the mold 10, a surface of a silicon substrate 20 is worked; an original mold for the mold 10 is prepared; the coating 11 is formed on the surface of the original mold; an electroless-plating metallic layer 13 and/or an electrolytic-plating metallic layer 14 are/is formed on the surface of the coating 11 by electroless plating and/or electrolytic plating; the metallic layer 13 and/or the metallic layer 14 and the coating 11 are brought into close contact with one another; and the original mold for the mold 10 is transferred to the metallic layer 13 and/or the metallic layer 14. COPYRIGHT: (C)2004,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide a method for manufacturing a number of cantilevers for scanning probe microscopes, without dimensional variations from a single sheet of semiconductor substrate. SOLUTION: The cantilever 10 for scanning-type probe microscopes is manufactured by an SOI wafer 100, while a probe 12 and a support 13 are integrated at one end and the other end of the lever 11, respectively. In the manufacturing process, the longitudinal direction of the lever 11 is selected to be in the thickness direction of the SOI wafer 100, the longitudinal direction of the probe 12 is selected to be in parallel with the surface of the SOI wafer 100, and the SOI wafer 100 is removed selectively. The cantilever 10 for scanning-type probe microscopes can be manufactured substantially in similar process, even if an Si single-crystal wafer is used, instead of the SOI wafer 100. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a low-priced columnar structure and an electrophoresis device. SOLUTION: The columnar structure 1 has a structure in which a plastic substrate 2 and many columnar projections 3 are integrated, and is replicated by a forming method using a mold. The electrophoresis device has a minute flow path formed by bonding the columnar structure 1 and a transparent substrate together. A sample is allowed to path through the minute flow path and to be separated by electrophoresis. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method of a columnar structure capable of acquiring a desired micro-aperture, and an electrophoretic device capable of accurately separating DNA or the like. SOLUTION: Many pillars 3 are formed on a silicon substrate 2 by ICP-RIE, and the pillars 3 are thermally oxidized, and a polycrystal silicon film is stuck on the thermally-oxidized pillars 3. The polycrystal silicon film is thermally oxidized, and a polycrystal silicon film 12 is stuck onto the thermally-oxidized polycrystal silicon film. This electrophoretic device has a micro-passage constituted of the columnar structure manufactured by the measuring method and a glass substrate. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
According to one embodiment, a microprobe includes a supporting base, an insulating layer, and an electrode layer arrayed in a first direction in this order. A principal surface of the microprobe is formed in a second direction different from the first direction. A step is formed on at least the electrode layer on the principal surface, and the electrode layer is partitioned into a first area and a second area by the step.
Abstract:
According to one embodiment, a MEMS memory microprobe includes a probe tip, a lever, and a base. The probe tip is arranged to oppose a recording medium and is brought into contact with the recording medium to perform recording or reproduction of information when a current or voltage is applied between them. In the probe tip, a plurality of electrodes used in the recording or reproduction and a plurality of support portions which form the probe tip together with the electrodes are alternately arranged, and the electrodes and the support portions form a single plane which opposes the recording medium.