MULTIPLE DATA SOURCES PEDESTRIAN NAVIGATION SYSTEM
    1.
    发明申请
    MULTIPLE DATA SOURCES PEDESTRIAN NAVIGATION SYSTEM 审中-公开
    多数据来源PEDESTRIAN导航系统

    公开(公告)号:US20130238237A1

    公开(公告)日:2013-09-12

    申请号:US13878756

    申请日:2011-10-09

    CPC classification number: G01C21/12 G01C21/165 G01C25/005 G01S19/49

    Abstract: A method of pedestrian navigation, based on an external positioning system and a Dead Reckoning (DR) system is provided herein. The method may employ the following steps: obtaining external positioning readings from an external positioning source and DR position readings from a pedestrian-carried platform; estimating an external positioning error, based at least partially on the external positioning and the DR position readings; and applying an estimation function to the external position readings, the DR position readings, and the external positioning errors, to yield a corrected estimated position.

    Abstract translation: 本文提供了一种基于外部定位系统和航位推算(DR)系统的行人导航方法。 该方法可以采用以下步骤:从外部定位源获得外部定位读数,并从行人携带平台获取DR位置读数; 至少部分地基于外部定位和DR位置读数来估计外部定位误差; 以及对外部位置读数,DR位置读数和外部定位误差应用估计函数,以产生校正的估计位置。

    System and method for inspecting patterned devices having microscopic conductors
    2.
    发明申请
    System and method for inspecting patterned devices having microscopic conductors 有权
    用于检查具有微观导体的图案化装置的系统和方法

    公开(公告)号:US20070171404A1

    公开(公告)日:2007-07-26

    申请号:US11339835

    申请日:2006-01-26

    CPC classification number: G01N21/956

    Abstract: An inspection system operative to inspect patterned devices having microscopic conductors, the system comprising a camera viewing a location of a candidate defect on a patterned substrate and acquiring thereat at least one image of the location, the camera defining an optical axis, the at least one image being illuminated by at least one illumination offset from the optical axis, the illumination being supplied along at least first and second axes of illumination that are mutually non-parallel in a plane corresponding to a plane of the patterned substrate, wherein a response to the illumination supplied along the first axis is differentiable from a response to the illumination supplied along the second axis and a defect classifier operative to receive the at least one image and to distinguish therewithin a candidate defect caused by a cut or a candidate defect caused by excess material, from one another and/or from other types of candidate defects.

    Abstract translation: 一种可操作以检查具有微观导体的图案化装置的检查系统,该系统包括观察图案化衬底上的候选缺陷的位置并在其上获取该位置的至少一个图像,相机限定光轴的至少一个 图像被从光轴偏移的至少一个照明物照射,所述照明沿至少第一和第二照明轴提供,所述至少第一和第二照明轴在与所述图案化衬底的平面相对应的平面中相互不平行,其中响应于 沿着第一轴提供的照明与沿着第二轴提供的照明的响应是不同的,以及缺陷分类器,用于接收至少一个图像,并且在由多余材料引起的切割或候选缺陷引起的候选缺陷之间进行区分 ,彼此和/或其他类型的候选缺陷。

    Determination of thin film topography
    3.
    发明授权
    Determination of thin film topography 有权
    薄膜形貌的测定

    公开(公告)号:US07177030B2

    公开(公告)日:2007-02-13

    申请号:US10829880

    申请日:2004-04-22

    CPC classification number: G01B9/02 G01B11/0675

    Abstract: A method and device for determining the topography of a thin film having a front surface and a back surface. The method comprises: irradiating the film with an incident coherent or partially coherent light beam so as to get two reflected beams, the first reflected beam being reflected from the front surface of the film, and the second beam being reflected from the back surface of the film; creating an interferometric image from a united beam comprising the two reflected beams and a reference beam, the reference beam originating from the incident beam, and made to be substantially parallel to the two reflected beams. The reference beam acquires a phase shift. The interferometric image is created the interference between a combined beam comprising the reference beam and the second reflected beam, and the first reflected beam, thus acquiring information on the topography of the film, that cannot be acquired using the two reflected beams alone.

    Abstract translation: 一种用于确定具有前表面和后表面的薄膜的形貌的方法和装置。 该方法包括:用入射的相干或部分相干的光束照射该膜以得到两个反射光束,该第一反射光束从该膜的前表面反射,并且该第二光束从该反射光束的背面反射 电影; 从包括两个反射光束和参考光束的联合光束产生干涉图像,参考光束源自入射光束,并且被制成基本上平行于两个反射光束。 参考光束获取相移。 干涉图像产生包括参考光束和第二反射光束的组合光束与第一反射光束之间的干涉,从而获得关于胶片的形貌的信息,其不能仅使用两个反射光束获得。

    Determination of thin film topograhpy
    4.
    发明申请
    Determination of thin film topograhpy 有权
    薄膜形貌的测定

    公开(公告)号:US20050237537A1

    公开(公告)日:2005-10-27

    申请号:US10829880

    申请日:2004-04-22

    CPC classification number: G01B9/02 G01B11/0675

    Abstract: A method and apparatus for determining the topography of a thin film having a front surface and a back surface. The method comprises: irradiating the film with an incident coherent or partially coherent beam so as to get two reflected beams, the first reflected from the front surface, and the second from the back surface; and using a third reference beam originating from the incident beam, and substantially parallel to the two reflected beams, wherein the third reference beam acquires a controlled phase shift. The three said beams are used to create an interferometric image of the film, whereby the interference of the three beams allows acquisition of information on the topography of the film that cannot be acquired using the two reflected beams alone.

    Abstract translation: 一种用于确定具有前表面和后表面的薄膜的形貌的方法和装置。 该方法包括:用入射的相干或部分相干的光束照射该膜,以便获得两个反射光束,第一反射光束从前表面反射,第二反射光束从后表面反射; 以及使用源自入射光束并基本上平行于两个反射光束的第三参考光束,其中第三参考光束获得受控的相移。 三个所述光束用于产生胶片的干涉图像,由此三个光束的干涉允许采集仅使用两个反射光束不能获得的胶片的形貌上的信息。

    Photoconductive based electrical testing of transistor arrays
    5.
    发明授权
    Photoconductive based electrical testing of transistor arrays 有权
    晶体管阵列的基于导电的电气测试

    公开(公告)号:US07795887B2

    公开(公告)日:2010-09-14

    申请号:US12089421

    申请日:2006-10-15

    CPC classification number: G09G3/006 G01R31/311 G09G3/3648 G09G2300/08

    Abstract: An apparatus is provided for testing microelectronic components on a substrate, including a scanner operative to scan a light beam over a plurality of thin film transistors disposed on a substrate, one transistor at a time, so as to induce a photoconductive response in the plurality of transistors, one transistor at a time; current sensing circuitry operative, synchronously with said scanner, to measure an output induced by the photoconductive response associated with a transistor and to generate photoconductive response output values, the photoconductive response output values representing a photoconductive response induced by the light beam, for one transistor at a time from among the plurality of transistors; and diagnostic apparatus operative to analyze the electronic response output values and to characterize each of the transistors in accordance therewith.

    Abstract translation: 提供了一种用于测试衬底上的微电子部件的装置,包括扫描器,用于扫描设置在衬底上的多个薄膜晶体管上的光束,一次一个晶体管,以便在多个晶体管中引起光电导响应 晶体管,一次一个晶体管; 电流感测电路与所述扫描器同步地操作,以测量由与晶体管相关联的光电导响应引起的输出,并产生光电导响应输出值,光电导响应输出值表示由光束引起的光导响应,对于一个晶体管 来自多个晶体管的时间; 以及诊断装置,用于分析电子响应输出值并根据其来表征每个晶体管。

    System and method for inspecting patterned devices having microscopic conductors
    6.
    发明授权
    System and method for inspecting patterned devices having microscopic conductors 有权
    用于检查具有微观导体的图案化装置的系统和方法

    公开(公告)号:US07391510B2

    公开(公告)日:2008-06-24

    申请号:US11339835

    申请日:2006-01-26

    CPC classification number: G01N21/956

    Abstract: An inspection system operative to inspect patterned devices having microscopic conductors, the system comprising a camera viewing a location of a candidate defect on a patterned substrate and acquiring thereat at least one image of the location, the camera defining an optical axis, the at least one image being illuminated by at least one illumination offset from the optical axis, the illumination being supplied along at least first and second axes of illumination that are mutually non-parallel in a plane corresponding to a plane of the patterned substrate, wherein a response to the illumination supplied along the first axis is differentiable from a response to the illumination supplied along the second axis and a defect classifier operative to receive the at least one image and to distinguish therewithin a candidate defect caused by a cut or a candidate defect caused by excess material, from one another and/or from other types of candidate defects.

    Abstract translation: 一种可操作以检查具有微观导体的图案化装置的检查系统,该系统包括观察图案化衬底上的候选缺陷的位置并在其上获取该位置的至少一个图像,相机限定光轴的至少一个 图像被从光轴偏移的至少一个照明物照射,所述照明沿至少第一和第二照明轴提供,所述至少第一和第二照明轴在与所述图案化衬底的平面相对应的平面中相互不平行,其中响应于 沿着第一轴提供的照明与沿着第二轴提供的照明的响应是不同的,以及缺陷分类器,用于接收至少一个图像,并且在由多余材料引起的切割或候选缺陷引起的候选缺陷之间进行区分 ,彼此和/或其他类型的候选缺陷。

    Device, systems and methods for scene image acquisition

    公开(公告)号:IL279275A

    公开(公告)日:2022-07-01

    申请号:IL27927520

    申请日:2020-12-06

    Abstract: Embodiments pertain to an imaging system configured to reduce or prevent the effect of unwanted specular reflections reflected by specular surfaces located in a scene. The system comprises at least one image acquisition device for acquiring a scene image comprising a specular surface providing specular light reflections. The at least one image acquisition device comprises at least one first image sensor and imaging optics having an optical axis for guiding light received from the scene along the optical axis onto the at least one first image sensor. The system further comprises at least one polarization filter operably positioned between the at least one first image sensor and an object. The system is configured to determine a polarization filter orientation such that an amount of specular light reflections incident onto the at least one first image sensor is reduced or eliminated.

    Method and system for grading gemstones

    公开(公告)号:IL266809A

    公开(公告)日:2020-08-31

    申请号:IL26680919

    申请日:2019-05-22

    Inventor: ILYA LEIZERSON

    Abstract: Gemstone grading method including illuminating the gemstone by light having a plurality of spectral components, each modulated according to a spectrally specific modulation (e.g., of intensity, frequency, phase), collecting the light following interaction with the gemstone, extracting from the collected light a set of intensity values for a respective set of modulation parameter values to provide a transmittance spectrum, and an output indicative of the transmittance spectrum (e.g., color, clarity, fluorescence grade). A complementary system includes a plurality of monochromatic light sources and respective modulators for simultaneously illuminating a gemstone with a modulation spectrally specific for each light source, a detection system for collecting the light following interaction whose signals are fed via a communication system to a data processor configured to extract a set of intensity values for a respective set of modulation parameter values to provide a transmittance spectrum and an output indicative thereof.

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