Abstract:
A method of pedestrian navigation, based on an external positioning system and a Dead Reckoning (DR) system is provided herein. The method may employ the following steps: obtaining external positioning readings from an external positioning source and DR position readings from a pedestrian-carried platform; estimating an external positioning error, based at least partially on the external positioning and the DR position readings; and applying an estimation function to the external position readings, the DR position readings, and the external positioning errors, to yield a corrected estimated position.
Abstract:
An inspection system operative to inspect patterned devices having microscopic conductors, the system comprising a camera viewing a location of a candidate defect on a patterned substrate and acquiring thereat at least one image of the location, the camera defining an optical axis, the at least one image being illuminated by at least one illumination offset from the optical axis, the illumination being supplied along at least first and second axes of illumination that are mutually non-parallel in a plane corresponding to a plane of the patterned substrate, wherein a response to the illumination supplied along the first axis is differentiable from a response to the illumination supplied along the second axis and a defect classifier operative to receive the at least one image and to distinguish therewithin a candidate defect caused by a cut or a candidate defect caused by excess material, from one another and/or from other types of candidate defects.
Abstract:
A method and device for determining the topography of a thin film having a front surface and a back surface. The method comprises: irradiating the film with an incident coherent or partially coherent light beam so as to get two reflected beams, the first reflected beam being reflected from the front surface of the film, and the second beam being reflected from the back surface of the film; creating an interferometric image from a united beam comprising the two reflected beams and a reference beam, the reference beam originating from the incident beam, and made to be substantially parallel to the two reflected beams. The reference beam acquires a phase shift. The interferometric image is created the interference between a combined beam comprising the reference beam and the second reflected beam, and the first reflected beam, thus acquiring information on the topography of the film, that cannot be acquired using the two reflected beams alone.
Abstract:
A method and apparatus for determining the topography of a thin film having a front surface and a back surface. The method comprises: irradiating the film with an incident coherent or partially coherent beam so as to get two reflected beams, the first reflected from the front surface, and the second from the back surface; and using a third reference beam originating from the incident beam, and substantially parallel to the two reflected beams, wherein the third reference beam acquires a controlled phase shift. The three said beams are used to create an interferometric image of the film, whereby the interference of the three beams allows acquisition of information on the topography of the film that cannot be acquired using the two reflected beams alone.
Abstract:
An apparatus is provided for testing microelectronic components on a substrate, including a scanner operative to scan a light beam over a plurality of thin film transistors disposed on a substrate, one transistor at a time, so as to induce a photoconductive response in the plurality of transistors, one transistor at a time; current sensing circuitry operative, synchronously with said scanner, to measure an output induced by the photoconductive response associated with a transistor and to generate photoconductive response output values, the photoconductive response output values representing a photoconductive response induced by the light beam, for one transistor at a time from among the plurality of transistors; and diagnostic apparatus operative to analyze the electronic response output values and to characterize each of the transistors in accordance therewith.
Abstract:
An inspection system operative to inspect patterned devices having microscopic conductors, the system comprising a camera viewing a location of a candidate defect on a patterned substrate and acquiring thereat at least one image of the location, the camera defining an optical axis, the at least one image being illuminated by at least one illumination offset from the optical axis, the illumination being supplied along at least first and second axes of illumination that are mutually non-parallel in a plane corresponding to a plane of the patterned substrate, wherein a response to the illumination supplied along the first axis is differentiable from a response to the illumination supplied along the second axis and a defect classifier operative to receive the at least one image and to distinguish therewithin a candidate defect caused by a cut or a candidate defect caused by excess material, from one another and/or from other types of candidate defects.
Abstract:
A system and method for detecting movement of an object outside a line-of-sight of a camera is disclosed. The camera acquires images of a target that is impacted by light that is scattered from the object and by ambient light, and of a reference that is impacted by the ambient light. A processing circuitry can be configured to detect the movement of the object by calculating, for each of a plurality of acquired images, a compensated light intensity value (LIV), being a target LIV that is based on pixels in the respective acquired image that represent the target, as modified, based on a reference LIV that is based on pixels in the respective acquired image that represent the reference, to reduce an effect, on the target LIV, of changes in the ambient light during a time period between acquiring a given image and the acquiring of the respective acquired image.
Abstract:
Embodiments pertain to an imaging system configured to reduce or prevent the effect of unwanted specular reflections reflected by specular surfaces located in a scene. The system comprises at least one image acquisition device for acquiring a scene image comprising a specular surface providing specular light reflections. The at least one image acquisition device comprises at least one first image sensor and imaging optics having an optical axis for guiding light received from the scene along the optical axis onto the at least one first image sensor. The system further comprises at least one polarization filter operably positioned between the at least one first image sensor and an object. The system is configured to determine a polarization filter orientation such that an amount of specular light reflections incident onto the at least one first image sensor is reduced or eliminated.
Abstract:
Gemstone grading method including illuminating the gemstone by light having a plurality of spectral components, each modulated according to a spectrally specific modulation (e.g., of intensity, frequency, phase), collecting the light following interaction with the gemstone, extracting from the collected light a set of intensity values for a respective set of modulation parameter values to provide a transmittance spectrum, and an output indicative of the transmittance spectrum (e.g., color, clarity, fluorescence grade). A complementary system includes a plurality of monochromatic light sources and respective modulators for simultaneously illuminating a gemstone with a modulation spectrally specific for each light source, a detection system for collecting the light following interaction whose signals are fed via a communication system to a data processor configured to extract a set of intensity values for a respective set of modulation parameter values to provide a transmittance spectrum and an output indicative thereof.