公开(公告)号：US20080029197A1

公开(公告)日：2008-02-07

申请号：US11772435

申请日：2007-07-02

Applicant: Hiroshi Haji ,  Kiyoshi Arita ,  Isamu Morisako

Inventor： Hiroshi Haji ,  Kiyoshi Arita ,  Isamu Morisako

IPC: B31B1/60

CPC classification number: C01B3/00

Abstract: In a surface treating apparatus using atomic hydrogen for causing atomic hydrogen to come in contact with a treating object 5 such as a substrate accommodated in a treating chamber 3, thereby carrying out a surface treatment, an atomic hydrogen generator 11 having the function of generating the atomic hydrogen by causing a hydrogen gas to come in contact with a tungsten heater incorporated into a heater cassette 12 in a generating chamber 21a, and the treating chamber 3 can communicate with each other through an opening portion 2c for introduction, and the opening portion 2c for introduction is constituted to be freely opened and closed by means of a shutter member 7. Consequently, it is possible to maintain the generating chamber 21a into a pressure reducing state irrespective of the state of the treating chamber 3, thereby eliminating a waiting time for raising a temperature of the tungsten heater and cooling the tungsten heater. Accordingly, it is possible to enhance a treatment efficiency in an atomic hydrogen treatment.

Abstract translation: 在使用原子氢使原子氢与容纳在处理室3中的基板等处理对象物5接触的表面处理装置中，进行表面处理的原子氢发生器11具有产生 原子氢通过使氢气与结合到发生室21a中的加热器盒12中的钨加热器接触，并且处理室3可以通过用于引入的开口部分2c相互连通，并且开口 用于引入的部分2c构成为通过活门构件7自由地打开和关闭。 因此，无论处理室3的状态如何，都可以将发生室21a保持在减压状态，从而消除了提高钨加热器的温度并冷却钨加热器的等待时间。 因此，能够提高原子氢处理的处理效率。

公开(公告)号：US5033407A

公开(公告)日：1991-07-23

申请号：US477255

申请日：1990-02-07

Applicant: Shigeru Mizuno ,  Isamu Morisako

Inventor： Shigeru Mizuno ,  Isamu Morisako

IPC: C23C16/46 ,  C23C16/44 ,  C23C16/48 ,  H01L21/205

CPC classification number: C23C16/481

Abstract: A low pressure vapor phase growth apparatus is disclosed. The apparatus comprises a window made of a light-transmissive material, a gas feeder for feeding a reactive gas, an exhauster for pumping gases out after a chemical reaction, a lamp for effecting radiant heating of a substrate with a radiation emitted therefrom and transmitted through said light-transmissive window, and a cooling mechanism for forcibly cooling said light-transmissive window. The substrate and the light-transmissive window are maintained in no mutual contact with a gap therebetween having a width of at most the mean free path of a gas existing in the gap. The reactive gas fed through the gas feeder undergoes the chemical reaction on the obverse surface of the substrate to form a thin film thereon.

公开(公告)号：US5676856A

公开(公告)日：1997-10-14

申请号：US427218

申请日：1995-04-24

Applicant: Hiroshi Haji ,  Isamu Morisako

Inventor： Hiroshi Haji ,  Isamu Morisako

IPC: B23K11/30 ,  B23K20/00

CPC classification number: H01L24/85 ,  B23K11/3063 ,  B23K20/004 ,  H01L24/78 ,  B23K2201/42 ,  H01L2224/05554 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/48465 ,  H01L2224/78268 ,  H01L2224/78301 ,  H01L2224/78302 ,  H01L2224/8501 ,  H01L2224/85045 ,  H01L2924/00014 ,  H01L2924/01006 ,  H01L2924/01007 ,  H01L2924/01019 ,  H01L2924/01023 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01082 ,  H01L2924/15787 ,  H01L2924/19043

Abstract: A voltage is applied between a first cleaning electrode that in contact with an electrode on a workpiece such as a printed circuit board or a chip, and a second cleaning electrode located in the vicinity of the electrode on the workpiece, from a voltage application circuit so as to produce an electric discharge on the electrode on the workpiece, whereby contamination sticking to the electrode on the workpiece is locally removed by heat generated from the electric discharge.

Abstract translation: 在电压施加电路之间施加电压，该第一清洁电极与位于工件上的电极附近的诸如印刷电路板或芯片的工件上的电极和第二清洁电极接触， 为了在工件上的电极上产生放电，由于从放电产生的热量局部地除去粘附在工件上的电极的污染物。

公开(公告)号：US6033586A

公开(公告)日：2000-03-07

申请号：US890828

申请日：1997-07-10

Applicant: Isamu Morisako

Inventor： Isamu Morisako

IPC: H05H1/46 ,  C23C14/40 ,  C23F4/00 ,  H01J37/32 ,  H01L21/203 ,  H01L21/302 ,  H01L21/304 ,  H01L21/3065 ,  H05H1/00

CPC classification number: H01J37/32082 ,  H01J37/32165

Abstract: Front and reverse surfaces of a workpiece are treated with plasma simultaneously while the workpiece is arranged between electrodes in such a manner that one of the electrode is opposite to the front surface, and another of the electrodes is opposite to the back surface, and a voltage supplied to each of the electrodes is changed frequently.

Abstract translation: 工件的正面和反面同时处理，同时工件以电极之一布置在电极之间，使得电极中的一个与前表面相反，另一个电极与背面相反，并且电压 提供给每个电极的频率频繁地变化。

公开(公告)号：US5433371A

公开(公告)日：1995-07-18

申请号：US135337

申请日：1993-10-13

Applicant: Isamu Morisako

Inventor： Isamu Morisako

IPC: H01L21/60 ,  B23K20/00 ,  B23K35/38 ,  B23K31/02

CPC classification number: H01L24/85 ,  B23K20/004 ,  B23K35/38 ,  H01L24/78 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/78268 ,  H01L2224/78301 ,  H01L2224/786 ,  H01L2224/85009 ,  H01L2224/8501 ,  H01L2224/85045 ,  H01L2224/85075 ,  H01L2224/851 ,  H01L2224/85205 ,  H01L24/45 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01007 ,  H01L2924/01013 ,  H01L2924/01018 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/3025

Abstract: A wire bonding apparatus has a sealed casing having an opening which can be opened and closed, a device for gas-tightly dividing the casing into first and second chambers, a sealing device that is movable for communicating the two chambers with each other, a device for supplying an inert gas into the first chamber, a device for supplying oxygen gas or ozone gas into the second chamber, a device for connecting an electrode of the substrate to an electrode of the semiconductor chip via the wire in the first chamber, a device for generating glow discharge in the second chamber, and a device for transporting the substrate between the first and second chambers. Wire bonding is immediately performed after impurities are removed from the electrodes by electrical discharge.

Abstract translation: 引线接合装置具有密封壳体，其具有能够打开和关闭的开口，用于将壳体气密地分隔成第一和第二腔室的装置，可移动以使两个腔室彼此连通的密封装置， 用于向第一室供应惰性气体，用于将氧气或臭氧气体供应到第二室中的装置，用于经由第一室中的导线将衬底的电极连接到半导体芯片的电极的装置， 用于在第二室中产生辉光放电，以及用于在第一和第二室之间输送衬底的装置。 在通过放电从电极去除杂质后，立即进行引线接合。

公开(公告)号：US4700069A

公开(公告)日：1987-10-13

申请号：US739984

申请日：1985-05-31

Applicant: Yoichi Ino ,  Isamu Morisako

Inventor： Yoichi Ino ,  Isamu Morisako

IPC: G01N27/62 ,  H01J49/42 ,  B01D59/44

CPC classification number: H01J49/4215 ,  H01J49/4255

Abstract: In a mass spectrometer, a quadrupole electrode comprises four electrodes arranged at a predetermined interval about a device axis along which the mass spectrometer successively comprises an ionized gas source, the quadrupole electrode, and a detector for detecting the gas particles separated in reference to mass-to-charge ratio. At least one of the electrodes comprises a plurality of electrode elements which are divided along the device axis. Each of the electrode elements has a longitudinal axis. The electrode elements are mechanically connected by a mechanically connecting member so that the longitudinal axis are coincident with one another and parallel to the device axis. The electrode elements are electrically connected by an electrically connecting member.

Abstract translation: 在质谱仪中，四极电极包括围绕器件轴线以预定间隔布置的四个电极，质子仪沿着该轴线依次包括电离气体源，四极电极和用于检测分离的气体颗粒的检测器， 充电比。 电极中的至少一个包括沿器件轴分割的多个电极元件。 每个电极元件具有纵向轴线。 电极元件通过机械连接构件机械连接，使得纵向轴线彼此重合并平行于装置轴线。 电极元件通过电连接构件电连接。