PATTERNING DEVICES USING FLUORINATED COMPOUNDS
    1.
    发明申请
    PATTERNING DEVICES USING FLUORINATED COMPOUNDS 审中-公开
    使用氟化合物的图案装置

    公开(公告)号:WO2009126916A2

    公开(公告)日:2009-10-15

    申请号:PCT/US2009/040255

    申请日:2009-04-10

    Abstract: A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a fluorinated material on the layer of material to provide an intermediate structure, and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.

    Abstract translation: 用于制造空间图案化结构的方法包括在空间图案化结构的子结构的至少一部分上形成材料层,在材料层上形成氟化材料的阻挡层以提供中间结构,并暴露 将所述中间结构结合到所述第二材料或辐射中的至少一种以引起所述中间结构的至少一部分的化学变化或结构变化中的至少一种。 阻挡层在曝光期间基本上保护材料层免受化学和结构变化的影响。 按照这种方法生产子结构。

    PATTERNING DEVICES USING FLUORINATED COMPOUNDS
    5.
    发明申请
    PATTERNING DEVICES USING FLUORINATED COMPOUNDS 审中-公开
    使用氟化合物的图案装置

    公开(公告)号:WO2009126916A3

    公开(公告)日:2010-02-04

    申请号:PCT/US2009040255

    申请日:2009-04-10

    Abstract: A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a fluorinated material on the layer of material to provide an intermediate structure, and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.

    Abstract translation: 用于制造空间图案化结构的方法包括在空间图案化结构的子结构的至少一部分上形成材料层,在材料层上形成氟化材料的阻挡层以提供中间结构,并暴露 将所述中间结构结合到所述第二材料或辐射中的至少一种以引起所述中间结构的至少一部分的化学变化或结构变化中的至少一种。 阻挡层在曝光期间基本上保护材料层免受化学和结构变化的影响。 按照这种方法生产子结构。

    ACTIVE SEMICONDUCTOR DEVICES
    6.
    发明申请
    ACTIVE SEMICONDUCTOR DEVICES 审中-公开
    主动半导体器件

    公开(公告)号:WO2007039539A3

    公开(公告)日:2007-06-07

    申请号:PCT/EP2006066826

    申请日:2006-09-28

    CPC classification number: H01L51/052 H01L51/0529 Y10T428/31931

    Abstract: Apparatus including a support body; an organic semiconductor composition body on the support body,- and a first body including a hydrogenated vinylaromatic-diene block copolymer on the organic semiconductor composition body. Apparatus including a support body,- a first body including a hydrogenated vinylaromatic-diene block copolymer on the support body; and an organic semiconductor composition body on the first body. Techniques for making an apparatus.

    Abstract translation: 装置包括支撑体; 在所述支撑体上的有机半导体组合物体,以及在所述有机半导体组合物主体上具有氢化乙烯基芳族二烯嵌段共聚物的第一体。 包括支撑体的装置, - 在支撑体上包括氢化的乙烯基芳族二烯嵌段共聚物的第一体; 和有机半导体组合物体。 制造装置的技术。

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