公开(公告)号：WO2011115197A9

公开(公告)日：2012-01-12

申请号：PCT/JP2011056352

申请日：2011-03-17

Applicant: NAT INST OF ADVANCED IND SCIEN ,  KIM JAEHO ,  ISHIHARA MASATOU ,  KOGA YOSHINORI ,  TSUGAWA KAZUO ,  HASEGAWA MASATAKA ,  IIJIMA SUMIO ,  YAMADA TAKATOSHI

Inventor： KIM JAEHO ,  ISHIHARA MASATOU ,  KOGA YOSHINORI ,  TSUGAWA KAZUO ,  HASEGAWA MASATAKA ,  IIJIMA SUMIO ,  YAMADA TAKATOSHI

IPC: C23C16/26 ,  C23C16/511 ,  C23C16/54 ,  H01B13/00

CPC classification number: C23C16/511 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/188 ,  C23C16/26 ,  C23C16/545 ,  H01B1/04

Abstract: The disclosed method for the formation of a transparent conductive carbon film solves the problems of high temperature processing and long processing times, which are issues in graphene film deposition by thermal CVD, and uses a crystalline carbon film formed at lower temperatures and in less time using a graphene film. The disclosed method is characterised in that: the substrate temperature is set to 500°C or less; the pressure is set to 50 Pa or less; and a transparent conductive carbon film is deposited on the substrate surface of a copper or aluminium thin film by a microwave surface-wave plasma CVD process under a gas atmosphere in which an oxidation inhibitor for inhibiting the oxidation of the substrate surface is added to a mixed gas comprising a carbon-containing gas and an inert gas as an additive gas.

Abstract translation: 所公开的形成透明导电碳膜的方法解决了通过热CVD在石墨烯膜沉积中存在的高温处理和长处理时间的问题，并且使用在较低温度和更短时间内形成的结晶碳膜，使用 石墨烯膜。 所公开的方法的特征在于：将基板温度设定为500℃以下; 压力设定为50Pa以下; 并且通过微波表面波等离子体CVD工艺在氧化气氛中在铜或铝薄膜的基板表面上沉积透明导电性碳膜，其中将用于抑制基板表面的氧化的氧化抑制剂加入到混合 包含含碳气体和作为添加气体的惰性气体的气体。

公开(公告)号：JPH1143861A

公开(公告)日：1999-02-16

申请号：JP19436997

申请日：1997-07-18

Applicant: AGENCY IND SCIENCE TECHN ,  SANDO IRON WORKS CO ,  OUCHI AKIHIKO ,  KOGA YOSHINORI

Inventor： SANTO YOSHITERU ,  OOUCHI AKIHIKO ,  KOGA YOSHINORI ,  TAMURA SADAO ,  ISHIDOSHIRO HIROSHI

IPC: D06L3/02 ,  D06L4/30 ,  D06L4/50 ,  D06L3/04 ,  D06L3/10

Abstract: PROBLEM TO BE SOLVED: To carry out bleaching of fabrics by applying a chemical solution using an oxidizing agent or a reducing agent, and ultraviolet lasers to desized and scoured fabrics. SOLUTION: This method for continuous bleaching of fabrics is to pad a chemical solution 3 such as an oxidizing agent, a reducing agent, etc., to a fabric 1 such as a desized and scoured knit and woven fabric, succeedingly, irradiate ultraviolet rays to the fabric 1 by a laser 6 to decompose impurities, coloring matters, etc., included in the fabric 1 and enhance activity of the chemical agents applied to the fabric 1, then, solubilize and dissolve the impurities, coloring matters, etc., in hot and cold water and remove them.

公开(公告)号：JPH1143862A

公开(公告)日：1999-02-16

申请号：JP19437097

申请日：1997-07-18

Applicant: AGENCY IND SCIENCE TECHN ,  SANDO IRON WORKS CO ,  OUCHI AKIHIKO ,  KOGA YOSHINORI

Inventor： SANTO YOSHITERU ,  OOUCHI AKIHIKO ,  KOGA YOSHINORI ,  TAMURA SADAO ,  ISHIDOSHIRO HIROSHI

IPC: D06L3/02 ,  D06L4/30 ,  D06L4/50 ,  D06L3/04 ,  D06L3/10

Abstract: PROBLEM TO BE SOLVED: To carry out bleaching of fabrics by applying a chemical solution using an oxidizing agent or a reducing agent and ultraviolet rays from a UV lamp to a desized and scoured fabric. SOLUTION: This method for continuous bleaching of a fabric is to pad a chemical solution 3 such as an oxidizing agent, a reducing agent, etc., to a fabric 1 such as a desized and scoured knit and woven fabric, then, irradiate ultraviolet rays emitted from a UV lamp to the fabric 1 to decompose impurities, coloring matters, etc., included in the fabric 1 and enhance activity of the chemical agents applied to the fabric 1, then, solubilize and dissolve the impurities and coloring matters in hot and cold water and remove them.

公开(公告)号：JPH1143315A

公开(公告)日：1999-02-16

申请号：JP21597897

申请日：1997-07-25

Applicant: AGENCY IND SCIENCE TECHN ,  MATSUNAGA TAKEHIRO ,  OOHANA TSUGUYORI ,  NAKAMURA TAKAKO ,  IIDA MITSUAKI ,  KOGA YOSHINORI ,  FUJIWARA SHUZO

Inventor： MATSUNAGA TAKEHIRO ,  OOHANA TSUGUYORI ,  NAKAMURA TAKAKO ,  IIDA MITSUAKI ,  KOGA YOSHINORI ,  FUJIWARA SHUZO

IPC: C07D251/54 ,  B01J19/00 ,  C01B21/00 ,  C01B21/06 ,  C07D239/50

Abstract: PROBLEM TO BE SOLVED: To obtain a clean energy by forming a nitrogen polymer by degrading- nitrogen-containing group by applying an energy to a nitrogen-containing compound. SOLUTION: This nitrogen polymer of the formula, Nn [(n) is 4-15] such as N5 and N10 is obtained by irradiating an energy source such as discharge, heat or light, preferably high power pulse ultraviolet rays to an azide compound and a diazo compound containing a nitrogen-containing group such as azide group and diazo group capable of releasing a nitrogen component having high reactivity by degradation to degrade the nitrogen-containing group, and to release the highly reactive nitrogen component such as nitrogen radical, azide cation and azide anion. The nitrogen-containing compound used as the raw material for producing the nitrogen polymer is the one in a solid state at a normal temperature, preferably having >=80 deg.C melting point, and the proportion of the nitrogen in the molecule is >=50 atomic %. The nitrogen-containing compound having >=50 atomic % nitrogen content is exemplified by an azide compound of formula I (nitrogen content is 80 atomic %), formula II (nitrogen content is 78 atomic %) or the formula, AgN3 (nitrogen content is 75 atomic %) and preferably the azide compound comprising two elements of N and C.