METHODS AND APPARATUS FOR HIGH-THROUGHPUT FORMATION OF NANO-SCALE ARRAYS
    1.
    发明申请
    METHODS AND APPARATUS FOR HIGH-THROUGHPUT FORMATION OF NANO-SCALE ARRAYS 审中-公开
    用于高通量形成纳米尺度阵列的方法和装置

    公开(公告)号:WO2011017487A2

    公开(公告)日:2011-02-10

    申请号:PCT/US2010/044493

    申请日:2010-08-05

    CPC classification number: B41M3/006 B81C1/00031 B81C2201/0184 B81C2201/0187

    Abstract: An apparatus for forming an array of deposits on a substrate is disclosed. The apparatus may include a stencil capable of releasable attached to the substrate and having an array of openings and at least one alignment mark. The apparatus may further include a high throughput deposition printer aligned with the stencil to form an array of deposits on the substrate. The array of deposits may be aligned with the array of openings through the at least one alignment mark and an optional alignment device. Methods of manufacturing the stencil and using it to generate multiplexed or combinatorial arrays are also disclosed.

    Abstract translation: 公开了一种用于在衬底上形成沉积物阵列的装置。 该设备可以包括能够可释放地连接到基底并具有开口阵列和至少一个对准标记的模版。 该设备还可以包括与模板对准的高通量沉积打印机,以在衬底上形成沉积物阵列。 沉积物阵列可以通过至少一个对准标记和可选的对准装置与开口阵列对齐。 还公开了制造模板并将其用于生成多路复用或组合阵列的方法。

    METHODS AND APPARATUS FOR HIGH-THROUGHPUT FORMATION OF NANO-SCALE ARRAYS
    2.
    发明申请
    METHODS AND APPARATUS FOR HIGH-THROUGHPUT FORMATION OF NANO-SCALE ARRAYS 审中-公开
    用于纳米级阵列的高通量形成的方法和设备

    公开(公告)号:WO2011017487A3

    公开(公告)日:2011-05-26

    申请号:PCT/US2010044493

    申请日:2010-08-05

    CPC classification number: B41M3/006 B81C1/00031 B81C2201/0184 B81C2201/0187

    Abstract: An apparatus for forming an array of deposits on a substrate is disclosed. The apparatus may include a stencil capable of releasable attached to the substrate and having an array of openings and at least one alignment mark. The apparatus may further include a high throughput deposition printer aligned with the stencil to form an array of deposits on the substrate. The array of deposits may be aligned with the array of openings through the at least one alignment mark and an optional alignment device. Methods of manufacturing the stencil and using it to generate multiplexed or combinatorial arrays are also disclosed.

    Abstract translation: 公开了一种用于在衬底上形成沉积物阵列的设备。 该设备可以包括能够可释放地附着到基板并且具有开口阵列和至少一个对准标记的模版。 该设备可以进一步包括与模版对准的高吞吐量沉积印刷机,以在衬底上形成沉积物阵列。 沉积物阵列可以与通过至少一个对准标记和任选的对准装置的开口阵列对准。 还公开了制造模板并使用它来生成多路复用或组合阵列的方法。

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