Abstract:
An optical spectroscopy tool is provided. In one embodiment a highly efficient means by which moderate resolution spectroscopy may be performed in the vacuum ultraviolet (VUV) is described. In one embodiment the techniques can be used as a high throughput spectrometer to spatially disperse wavelengths in and around the VUV in such a manner as to generate a substantially flat field focal plane, suitable for use in combination with an array detector. Some embodiments utilize prism based spectrometers. Some embodiments utilize detector elements that may be movable and/or located within the spectrometer. In some embodiments, collimated light may be provided as an input to the spectrometer.
Abstract:
An optical spectroscopy tool is provided. In one embodiment a highly efficient means by which moderate resolution spectroscopy may be performed in the vacuum ultraviolet (VUV) is described. In one embodiment the techniques can be used as a high throughput spectrometer to spatially disperse wavelengths in and around the VUV in such a manner as to generate a substantially flat field focal plane, suitable for use in combination with an array detector. Some embodiments utilize prism based spectrometers. Some embodiments utilize detector elements that may be movable and/or located within the spectrometer. In some embodiments, collimated light may be provided as an input to the spectrometer.
Abstract:
A reflectometer calibration technique is provided that may include the use of two calibration samples in the calibration process. Further, the technique allows for calibration even in the presence of variations between the actual and assumed properties of at least one or more of the calibration samples. In addition, the technique utilizes a ratio of the measurements from the first and second calibration samples to determine the actual properties of at least one of the calibration samples. The ratio may be a ratio of the intensity reflected from the first and second calibration samples. The samples may exhibit relatively different reflective properties at the desired wavelengths. In such a technique the reflectance data of each sample may then be considered relatively decoupled from the other and actual properties of one or more of the calibration samples may be calculated. The determined actual properties may then be utilized to assist calibration of the reflectometer.
Abstract:
A technique is provided for generating and subsequently monitoring the controlled environment(s) within an optical metrology instrument in such a manner as to minimize absorbing species within the light path of the metrology instrument and to minimize the build-up of contaminants on the surfaces of optical elements that may result in performance degradation. Both evacuation and backfill techniques may be utilized together along with a monitoring technique to determine if the environmental is suitable for measurements or if the environment should be regenerated. The optical metrology instrument may be an instrument which operates at wavelengths that include vacuum ultra-violet (VUV) wavelengths.
Abstract in simplified Chinese:本发明提供一种反射计校准技术,该技术可包括在校准过程中利用两个校准样本。另外,即使在该等校准样本中之至少一或多者的实际特性与假设特性之间存在变化的情况下,该技术仍允许校准。另外,该技术使用来自第一校准样本之量测与来自第二校准样本之量测的一比率来确定该等校准样本中之至少一者的实际特性。该比率可为自该第一校准样本及该第二校准样本反射之强度的一比率。样本可在所要波长处展示出相对不同的反射特性。在此技术中,接着,可认为每一样本之反射率数据已自另一者相对去耦合,且可计算该等校准样本中之一或多者的实际特性。接着,可使用经确定之实际特性来辅助校准反射计。
Abstract in simplified Chinese:本发明提供一种光谱分析工具。在一实施例中,描述一种可在真空紫外(VUV)中运行中分辨率光谱分析所利用的高效构件。在一实施例中,该等技术可用作一适合与一数组侦测器结合使用之高通量光谱仪,该高通量光谱仪用以使VUV中及周围之波长以产生一大体上平场焦平面之方式空间色散。一些实施例利用基于棱镜之光谱仪。一些实施例利用可移动及/或可位于该光谱仪内之侦测组件。在一些实施例中,可提供准直光作为至该光谱仪之一输入。
Abstract in simplified Chinese:本发明提供一种以最小化一光学度量衡设备之光学路径内之吸收物质及最小化光学组件表面上可能导致性能降级之污染物积垢的方式来在该度量衡设备内产生受控环境且随后对其进行监视的技术。可与一监视技术一起利用抽空技术与回填技术来判定该环境是否适合量测或该环境是否应被重新产生。该光学度量衡设备可为一在包括真空紫外线(VUV)波长之波长处操作之设备。
Abstract:
A reflectometer calibration technique is provided that may include the use of two calibration samples in the calibration process. Further, the technique allows for calibration even in the presence of variations between the actual and assumed properties of at least one or more of the calibration samples. In addition, the technique utilizes a ratio of the measurements from the first and second calibration samples to determine the actual properties of at least one of the calibration samples. The ratio may be a ratio of the intensity reflected from the first and second calibration samples. The samples may exhibit relatively different reflective properties at the desired wavelengths. In such a technique the reflectance data of each sample may then be considered relatively decoupled from the other and actual properties of one or more of the calibration samples may be calculated. The determined actual properties may then be utilized to assist calibration.
Abstract:
A spectroscopy system (500) is provided which operates in the vacuum ultra-violet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided for use in metrology applications. To ensure accurate and repeatable measurement, the environment of the optical paths (506, 508) is controlled to limit absorption effects of gases that may be present in the optical path. To account for absorption effects that may still occur, the length of the optical path is minimized. To further account for absorption effects, the reflectance data may be referenced to a relative standard.
Abstract:
A spectroscopy system (500) is provided which operates in the vacuum ultra-violet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided for use in metrology applications. To ensure accurate and repeatable measurement, the environment of the optical paths (506, 508) is controlled to limit absorption effects of gases that may be present in the optical path. To account for absorption effects that may still occur, the length of the optical path is minimized. To further account for absorption effects, the reflectance data may be referenced to a relative standard.