Abstract:
Techniques and systems for using optical interferometers to obtain full-field optical measurements of surfaces, such as surfaces of flat panels, patterned surfaces of wafers and substrates. Applications of various shearing interferometers for measuring surfaces are described.
Abstract:
Techniques and systems for processing optical transmission of a plate (401) in an optical shearing interferometer (450A, 450B) to measure the plate. Both optical reflection and optical transmission of the plate may be processed by optical shearing interferometers (451A, 452A 451B, 452B) to obtain measurements of the plate, including surface information of at least one reflective surface, the wedge slopes, and variation in the refractive index of the plate, net optical distortions through plate assembly.
Abstract:
Techniques and systems for processing optical transmission of a plate in an optical shearing interferometer to measure the plate. Both optical reflection and optical transmission of the plate may be processed by optical shearing interferometers to obtain measurements of the plate, including surface information of at least one reflective surface, the wedge slopes, and variation in the refractive index of the plate, net optical distortions through plate assembly.
Abstract:
Techniques and systems for using optical interferometers to obtain full-field optical measurements of surfaces, such as surfaces of flat panels, patterned surfaces of wafers and substrates. Applications of various shearing interferometers for measuring surfaces are described.
Abstract:
Techniques and systems for using optical interferometers to obtain full-field optical measurements of surfaces, such as surfaces of flat panels, patterned surfaces of wafers and substrates. Applications of various shearing interferometers for measuring surfaces are described.