公开(公告)号：WO2011147628A1

公开(公告)日：2011-12-01

申请号：PCT/EP2011/055360

申请日：2011-04-06

Applicant: ASML NETHERLANDS B.V. ,  TIMOSHKOV, Vadim ,  YAKUNIN, Andrei ,  OSORIO OLIVEROS, Edgar ,  VAN SCHOOT, Jan Bernard Plechelmus ,  KEMPEN, Antonius Theodorus Wilhelmus

Inventor： TIMOSHKOV, Vadim ,  YAKUNIN, Andrei ,  OSORIO OLIVEROS, Edgar ,  VAN SCHOOT, Jan Bernard Plechelmus ,  KEMPEN, Antonius Theodorus Wilhelmus

IPC: G03F7/20 ,  C23C14/14 ,  G21K1/06

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  C23C14/48 ,  C23C14/586 ,  G21K1/062

Abstract: There is provided a multilayer mirror (80) comprising a layer of a first material (84) and a layer of silicon (82). The layer of the first material and the layer of silicon form a stack of layers. An exposed region of the layer of silicon comprises a modification that is arranged to improve the robustness of the exposed region of silicon.

Abstract translation: 提供了包括第一材料（84）和硅层（82）的层的多层反射镜（80）。 第一材料层和硅层形成一叠层。 硅层的暴露区域包括被设置为改善暴露的硅区域的鲁棒性的修改。