Abstract:
A laser electron-beam tube comprises an electron-beam source housed in a vacuum chamber and a laser target. The laser target consists of partially transparent reflecting layers and highly reflecting layers, all accommodated on a substratum; interspersed with these are at least two layers of an active semiconductor material and layers of a passive semiconductor material alternating therewith, with corresponding narrower or wider exclusion zones. The semiconductor materials are crystals whose lattice periods differ in the free state by more than 0.1%. The layers are under elastic tension and have a thickness below the critical thickness.
Abstract:
In a process for growing a monocrystal from a multi-constituent solid solution, said monocrystal is grown from at least two parent substances which are accommodated separately. These substances are heated to a temperature above the growth temperature of the monocrystal. The respective vapours produced by the heating are fed in separate streams to the growth region of the monocrystal. The partial pressure of at least one of the vapours is altered in inverse proportion to the concentration of that particular substance in the growing monocrystal. A suitable device comprises a chamber (1) divided into compartments for the raw materials (16, 17). At least one of these compartments is provided with a system (15, 18, 19) for regulating the partial pressure of the raw material vapour.
Abstract:
A process for growing a monocrystal involves heating the parent semiconductor substance to a temperature higher than the growth temperature. A temperature field with a particular configuration of isothermal surfaces is created around the seed crystal (7). One of these surfaces is at the growth temperature of the monocrystal and extends along the boundary between the vapour and solid phases. The profile of the monocrystal surface as it is formed depends on the configuration of the isothermal surfaces of the temperature field. The process of growing the monocrystal involves displacing the seed crystal (7) and growing monocrystal in the direction opposite to the direction of growth of the monocrystal. A device for carrying out this process comprises a body (1) made of a refractory material and mounted within the heating unit (2). The said body accommodates a chamber (4) for the raw semiconductor material and the seed crystal (7) holder (8), a device (10) for creating a temperature field above the seed crystal (7) being arranged between the two.
Abstract:
A laser electron-beam tube comprises an electron-beam source housed in a vacuum chamber and a laser target. The laser target consists of partially transparent reflecting layers and highly reflecting layers, all accommodated on a substratum; interspersed with these are at least two layers of an active semiconductor material and layers of a passive semiconductor material alternating therewith, with corresponding narrower or wider exclusion zones. The semiconductor materials are crystals whose lattice periods differ in the free state by more than 0.1 %. The layers are under elastic tension and have a thickness bellow the critical thickness.
Abstract:
A laser electron-beam tube comprises an electron-beam source housed in a vacuum chamber and a laser target. The laser target consists of partially transparent reflecting layers and highly reflecting layers, all accommodated on a substratum; interspersed with these are at least two layers of an active semiconductor material and layers of a passive semiconductor material alternating therewith, with corresponding narrower or wider exclusion zones. The semiconductor materials are crystals whose lattice periods differ in the free state by more than 0.1 %. The layers are under elastic tension and have a thickness bellow the critical thickness.
Abstract:
A laser electron-beam tube comprises an electron-beam source housed in a vacuum chamber and a laser target. The laser target consists of partially transparent reflecting layers and highly reflecting layers, all accommodated on a substratum; interspersed with these are at least two layers of an active semiconductor material and layers of a passive semiconductor material alternating therewith, with corresponding narrower or wider exclusion zones. The semiconductor materials are crystals whose lattice periods differ in the free state by more than 0.1 %. The layers are under elastic tension and have a thickness bellow the critical thickness.
Abstract:
A laser screen of a cathode-ray tube has a semiconductor member (2) made of a semiconductor material selected from the group consisting of an A II B VI compound or a solid solution of an A II B VI compound and a pair of mirror layers (1,3) formed on the opposite sides of said semiconductor member. The material of the semiconductor member is doped with a donor impurity in the form of an element of the VII Group of the Periodic Table. A content of the donor impurity ranges from 3·10¹⁷ to 5·10¹⁸ cm⁻³, and the resistivity of the semiconductor member is maximum 10⁻¹Ω/cm.
Abstract:
A laser electron-beam tube comprises an electron-beam source housed in a vacuum chamber and a laser target. The laser target consists of partially transparent reflecting layers and highly reflecting layers, all accommodated on a substratum; interspersed with these are at least two layers of an active semiconductor material and layers of a passive semiconductor material alternating therewith, with corresponding narrower or wider exclusion zones. The semiconductor materials are crystals whose lattice periods differ in the free state by more than 0.1%. The layers are under elastic tension and have a thickness below the critical thickness.
Abstract:
A laser electron-beam tube comprises an electron-beam source housed in a vacuum chamber and a laser target. The laser target consists of partially transparent reflecting layers and highly reflecting layers, all accommodated on a substratum; interspersed with these are at least two layers of an active semiconductor material and layers of a passive semiconductor material alternating therewith, with corresponding narrower or wider exclusion zones. The semiconductor materials are crystals whose lattice periods differ in the free state by more than 0.1 %. The layers are under elastic tension and have a thickness bellow the critical thickness.