公开(公告)号：US08038856B2

公开(公告)日：2011-10-18

申请号：US12786219

申请日：2010-05-24

Applicant: Arthur Keigler ,  John Harrell ,  Zhenqiu Liu ,  Qunwei Wu

Inventor： Arthur Keigler ,  John Harrell ,  Zhenqiu Liu ,  Qunwei Wu

IPC: C25B9/02 ,  F16J15/02

CPC classification number: C25D17/001 ,  C25D5/003 ,  C25D7/123 ,  C25D17/005 ,  C25D17/06 ,  C25D21/10 ,  C25D21/12 ,  H01L21/67023 ,  H01L21/67126

Abstract: A method of fluid sealing a workpiece is provided. The method includes placing a workpiece on a ring, engaging at least one engagement feature of the ring with at least one retaining feature defined by the member and flexing the member to provide a force to the at least one engagement feature to cause the ring to form a barrier to fluid entry with the workpiece.

Abstract translation: 提供了流体密封工件的方法。 该方法包括将工件放置在环上，将环的至少一个接合特征与由构件限定的至少一个保持特征接合并使构件弯曲以向至少一个接合特征施加力以使环形成 流体进入工件的障碍。

公开(公告)号：US07722747B2

公开(公告)日：2010-05-25

申请号：US10971729

申请日：2004-10-22

Applicant: Arthur Keigler ,  John Harrell ,  Zhenqiu Liu ,  Qunwei Wu

Inventor： Arthur Keigler ,  John Harrell ,  Zhenqiu Liu ,  Qunwei Wu

IPC: C25B9/02

CPC classification number: C25D17/001 ,  C25D5/003 ,  C25D7/123 ,  C25D17/005 ,  C25D17/06 ,  C25D21/10 ,  C25D21/12 ,  H01L21/67023 ,  H01L21/67126

Abstract: A method and apparatus for retaining a workpiece against a workpiece holder are described. A flexible member can be used to provide a substantially uniform force to securely retain the workpiece, which can allow the workpiece to be consistently positioned in a process module. In one detailed embodiment, a barrier to fluid entry is formed between the workpiece and a ring for retaining the workpiece against a workpiece holder. This provides a reliable seal during fluid processing to prevent fluid from reaching the underside of a workpiece. In various embodiments, the workpiece holder can be used to align a workpiece in a process module or to hold one or more workpieces in a configuration that allows for higher throughput.

Abstract translation: 描述了将工件保持在工件保持器上的方法和装置。 可以使用柔性构件来提供基本上均匀的力以牢固地保持工件，这可以使工件一致地定位在工艺模块中。 在一个详细的实施例中，在工件和用于将工件保持在工件保持器上的环之间形成流体进入的障碍物。 这在流体处理期间提供了可靠的密封，以防止流体到达工件的下侧。 在各种实施例中，工件保持器可用于对准工件在工艺模块中或将一个或多个工件保持在允许更高生产量的构造中。

公开(公告)号：US07445697B2

公开(公告)日：2008-11-04

申请号：US10971530

申请日：2004-10-22

Applicant: Arthur Keigler ,  John Harrell ,  Zhenqiu Liu ,  Qunwei Wu

Inventor： Arthur Keigler ,  John Harrell ,  Zhenqiu Liu ,  Qunwei Wu

IPC: C25D17/06 ,  B05C13/02

CPC classification number: C25D17/001 ,  C25D5/003 ,  C25D7/123 ,  C25D17/005 ,  C25D17/06 ,  C25D21/10 ,  C25D21/12 ,  H01L21/67023 ,  H01L21/67126

Abstract: A method and apparatus for retaining a workpiece against a workpiece holder are described. A flexible member can be used to provide a substantially uniform force to securely retain the workpiece, which can allow the workpiece to be consistently positioned in a process module. In one detailed embodiment, a barrier to fluid entry is formed between the workpiece and a ring for retaining the workpiece against a workpiece holder. This provides a reliable seal during fluid processing to prevent fluid from reaching the underside of a workpiece. In various embodiments, the workpiece holder can be used to align a workpiece in a process module or to hold one or more workpieces in a configuration that allows for higher throughput.

Abstract translation: 描述了将工件保持在工件保持器上的方法和装置。 可以使用柔性构件来提供基本上均匀的力以牢固地保持工件，这可以使工件一致地定位在工艺模块中。 在一个详细的实施例中，在工件和用于将工件保持在工件保持器上的环之间形成流体进入的障碍物。 这在流体处理期间提供了可靠的密封，以防止流体到达工件的下侧。 在各种实施例中，工件保持器可用于对准工件在工艺模块中或将一个或多个工件保持在允许更高生产量的构造中。

公开(公告)号：US20120103799A1

公开(公告)日：2012-05-03

申请号：US13275158

申请日：2011-10-17

Applicant: Arthur Keigler ,  John Harrell ,  Zhenqiu Liu ,  Qunwei Wu

Inventor： Arthur Keigler ,  John Harrell ,  Zhenqiu Liu ,  Qunwei Wu

IPC: C25D17/00

CPC classification number: C25D17/001 ,  C25D5/003 ,  C25D7/123 ,  C25D17/005 ,  C25D17/06 ,  C25D21/10 ,  C25D21/12 ,  H01L21/67023 ,  H01L21/67126

Abstract: A workpiece holder for fluid processing a workpiece including a transportable frame, a flexible member connected to the frame and defining at least one retaining feature, and a ring comprising at least one engagement feature engageable with the at least one retaining feature of the flexible member, wherein the flexible member is flexed to provide a force to the at least one engagement feature to cause the ring to form a barrier to fluid entry with the workpiece.

Abstract translation: 一种用于流体处理工件的工件保持器，包括可运输框架，连接到框架并限定至少一个保持特征的柔性构件，以及包括可与柔性构件的至少一个保持结构接合的至少一个接合特征的环， 其中所述柔性构件弯曲以向所述至少一个接合特征提供力，以使所述环形成与所述工件的流体入口的阻挡。

公开(公告)号：US20060110536A1

公开(公告)日：2006-05-25

申请号：US11265543

申请日：2005-11-02

Applicant: Arthur Keigler ,  Qunwei Wu ,  Zhenqiu Liu ,  John Harrell

Inventor： Arthur Keigler ,  Qunwei Wu ,  Zhenqiu Liu ,  John Harrell

IPC: B05D5/00 ,  B05D1/18 ,  B05D3/00

CPC classification number: H01L21/67126 ,  C25D5/003 ,  C25D7/123 ,  C25D17/001 ,  C25D21/12 ,  H01L21/67023

Abstract: A method and apparatus for fluid sealing a workpiece retained by a workpiece holder are described. A pressure differential can be formed across a fluid seal to counteract fluid attempting to penetrate the fluid seal, which can contaminate the underside of the workpiece. The apparatus can include a ring forming a barrier to fluid entry with the workpiece and a source providing pressure to form the pressure differential. The pressure or the pressure differential can counteract hydroscopic fluid pressure or hydrostatic fluid pressure that is acting to force fluid through the barrier between the ring and the workpiece.

Abstract translation: 描述了用于流体密封由工件保持器保持的工件的方法和装置。 可以跨流体密封件形成压力差，以抵消试图渗透流体密封件的流体，这可能污染工件的下侧。 该装置可以包括形成与流体进入工件的阻挡物的环和提供压力以形成压力差的源。 压力或压力差可抵消吸入液体压力或静压流体压力，其作用是迫使流体通过环和工件之间的阻挡层。

公开(公告)号：US20050283993A1

公开(公告)日：2005-12-29

申请号：US11155008

申请日：2005-06-16

Applicant: Qunwei Wu ,  Arthur Keigler ,  Zhenqiu Liu ,  John Harrell ,  Steve Bowler

Inventor： Qunwei Wu ,  Arthur Keigler ,  Zhenqiu Liu ,  John Harrell ,  Steve Bowler

IPC: B08B3/00 ,  B08B3/10 ,  B08B3/12 ,  B08B11/02 ,  F26B3/00 ,  F26B21/06 ,  H01L21/00 ,  H01L21/02

CPC classification number: H01L21/67034 ,  B08B3/102 ,  B08B11/02 ,  H01L21/02068 ,  H01L21/67028

Abstract: A method and apparatus for fluid processing a workpiece are described. A gas can be used to agitate a fluid to improve cleaning and/or rinsing of a workpiece surface. The gas can reduce surface tension of the fluid to promote improved contact of the fluid with a surface of the workpiece. The surface of the workpiece can be dried by flowing gas along a portion of the workpiece surface during or after draining of the fluid.

Abstract translation: 描述了用于流体处理工件的方法和装置。 可以使用气体来搅拌流体以改善工件表面的清洁和/或漂洗。 气体可以降低流体的表面张力，以促进流体与工件表面的接触。 在流体排放期间或之后，工件的表面可以通过沿工件表面的一部分流动气体来干燥。

公开(公告)号：US08168057B2

公开(公告)日：2012-05-01

申请号：US12790264

申请日：2010-05-28

Applicant: Arthur Keigler ,  Qunwei Wu ,  Zhenqiu Liu ,  John Harrell

Inventor： Arthur Keigler ,  Qunwei Wu ,  Zhenqiu Liu ,  John Harrell

IPC: C25D5/02

CPC classification number: H01L21/67126 ,  C25D5/003 ,  C25D7/123 ,  C25D17/001 ,  C25D21/12 ,  H01L21/67023

Abstract: A method of fluid sealing a workpiece is provided. The method includes providing a force to cause a ring to form a barrier to fluid entry with the workpiece and preventing fluid from crossing the barrier to fluid entry by forming a pressure differential across the barrier.

Abstract translation: 提供了流体密封工件的方法。 该方法包括提供一个力，以使环形成与流体进入工件的阻挡层，并且通过在该屏障上形成一个压差来防止流体穿过该屏障穿过该流体入口。

公开(公告)号：US20110139627A1

公开(公告)日：2011-06-16

申请号：US12963991

申请日：2010-12-09

Applicant: Arthur Keigler ,  John Harrell ,  Zhenqiu Liu ,  Qunwei Wu

Inventor： Arthur Keigler ,  John Harrell ,  Zhenqiu Liu ,  Qunwei Wu

IPC: C25D7/12

CPC classification number: C25D17/001 ,  C25D5/003 ,  C25D7/123 ,  C25D17/005 ,  C25D17/06 ,  C25D21/10 ,  C25D21/12 ,  H01L21/67023 ,  H01L21/67126

Abstract: A method of fluid processing a semiconductor workpiece, including disposing a workpiece holder with a housing capable of containing a fluid, the workpiece holder retaining the workpiece, providing an agitation system connected to the housing and comprising a member disposed within the housing adjacent the workpiece holder, and agitating the fluid by moving the member substantially parallel to a surface of the workpiece with a non-uniform oscillatory motion, the non-uniform oscillatory motion being a series of substantially continuous geometrically asymmetric oscillations wherein each consecutive oscillation of the series is geometrically asymmetric having at least two substantially continuous opposing strokes wherein reversal positions of each substantially continuous stroke of the substantially continuous asymmetric oscillation are disposed asymmetrically with respect to a center point of each immediately preceding substantially continuous stroke of the oscillation.

Abstract translation: 一种流体处理半导体工件的方法，包括将具有能够容纳流体的壳体布置在工件夹持器上，保持工件的工件保持器，提供连接到壳体的搅拌系统，并且包括设置在壳体内的邻近工件保持器的构件 并且通过以非均匀的振荡运动基本上平行于工件的表面移动构件来搅动流体，该非均匀振荡运动是一系列基本上连续的几何非对称振荡，其中该系列的每个连续振荡是几何不对称的 具有至少两个基本上连续的相对冲程，其中基本上连续的不对称振荡的每个基本上连续行程的反转位置相对于振荡的每个紧接在前的基本上连续的行程的中心点非对称地设置。

公开(公告)号：US20080067074A1

公开(公告)日：2008-03-20

申请号：US11981300

申请日：2007-10-30

Applicant: Qunwei Wu ,  Craig Brodeur ,  John Pillion ,  Jieh Shyu

Inventor： Qunwei Wu ,  Craig Brodeur ,  John Pillion ,  Jieh Shyu

IPC: C25D5/08

CPC classification number: H01M8/04201 ,  B01D61/00 ,  B01J4/04 ,  B01J19/2475 ,  C01B3/503 ,  C01B2203/0405 ,  C01B2203/041 ,  C25B15/08 ,  C25D5/08 ,  C25D17/008 ,  C25D17/10 ,  C25F7/00 ,  F28F13/003 ,  F28F13/02 ,  H01M2/1673 ,  H01M8/04197 ,  H01M8/1004

Abstract: A device and method for increasing the mass transport rate of a chemical or electrochemical process at the solid and fluid interface in a fluid cell. The device includes a membrane in close contact with surface of the work piece, to separate the process cell into two chambers, so that fluid velocity at the work piece is controlled separately from the main cell flow. Thus the diffusion boundary layer is controlled and minimized by the rate that fluid is withdrawn from the work piece chamber.

Abstract translation: 一种用于增加流体池中的固体和流体界面处的化学或电化学过程的质量传输速率的装置和方法。 该装置包括与工件的表面紧密接触的膜，以将处理室分离成两个室，使得工件上的流体速度与主池流动分离地被控制。 因此，扩散边界层通过流体从工件腔室中取出的速度被控制和最小化。

公开(公告)号：US20050167275A1

公开(公告)日：2005-08-04

申请号：US10971726

申请日：2004-10-22

Applicant: Arthur Keigler ,  John Harrell ,  Zhenqiu Liu ,  Qunwei Wu

Inventor： Arthur Keigler ,  John Harrell ,  Zhenqiu Liu ,  Qunwei Wu

IPC: B23K15/00 ,  C25D5/18 ,  C25D5/22 ,  C25D7/12 ,  C25D17/00 ,  C25D21/10 ,  C25D21/12 ,  H01L21/00

CPC classification number: C25D17/001 ,  C25D5/003 ,  C25D7/123 ,  C25D17/005 ,  C25D17/06 ,  C25D21/10 ,  C25D21/12 ,  H01L21/67023 ,  H01L21/67126

Abstract: A method and apparatus for fluid processing a workpiece are described. The system can include a process module and a system of one or more fluid processing elements to control the fluid flow and/or the electric field distribution during the fluid processing of the workpiece. A member can be used to agitate the fluid during deposition of a film (e.g., using an oscillatory motion). A plate can be used to shape an electric field incident on a surface of a workpiece. By controlling the fluid flow and the electric field distribution, improved deposition of the film on the workpiece surface can result. Furthermore, a vertical configuration and/or a modular architecture can be employed to improve throughput, increase productivity, and reduce cost.

Abstract translation: 描述了用于流体处理工件的方法和装置。 该系统可以包括处理模块和一个或多个流体处理元件的系统，以在工件的流体处理期间控制流体流动和/或电场分布。 可以使用成员在膜的沉积期间搅拌流体（例如，使用振荡运动）。 可以使用板来形成入射在工件表面上的电场。 通过控制流体流动和电场分布，可以改善薄膜在工件表面上的沉积。 此外，可以采用垂直配置和/或模块化架构来提高吞吐量，提高生产率并降低成本。