PROCESSES AND APPARATUSES FOR TREATING HALOGEN-CONTAINING GASES
    1.
    发明申请
    PROCESSES AND APPARATUSES FOR TREATING HALOGEN-CONTAINING GASES 审中-公开
    处理含卤素气体的工艺和设备

    公开(公告)号:WO2004063313A2

    公开(公告)日:2004-07-29

    申请号:PCT/US2004/000688

    申请日:2004-01-12

    IPC: C10L

    CPC classification number: B01D53/68 B01D53/32 B01D53/70 B01D53/79 B01D2259/818

    Abstract: There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F 2 that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water. According to another embodiment, a vaporized portion of a liquid reducing agent is mixed with the halogen-containing gas to produce a reaction mixture and a non-thermal plasma is generated in the reaction gas mixture to reduce the halogen-containing gas.

    Abstract translation: 公开了用于处理诸如F 2的含卤素气体的各种工艺,装置和系统,其涉及产生等离子体以便化学还原含卤素气体 纳入更环保可管理的产品中。 根据具体的实施方式,将还原剂与含卤素的气体混合以产生进料气体混合物,并且在液态水存在下在进料气体混合物中产生非热等离子体。 根据另一个实施方案,液体还原剂的蒸发部分与含卤素气体混合以产生反应混合物,并且在反应气体混合物中产生非热等离子体以还原含卤素气体。

    PROCESSES AND APPARATUSES FOR TREATING HALOGEN-CONTAINING GASES
    4.
    发明申请
    PROCESSES AND APPARATUSES FOR TREATING HALOGEN-CONTAINING GASES 审中-公开
    用于处理含氢气体的方法和装置

    公开(公告)号:WO2004063313A3

    公开(公告)日:2004-09-02

    申请号:PCT/US2004000688

    申请日:2004-01-12

    CPC classification number: B01D53/68 B01D53/32 B01D53/70 B01D53/79 B01D2259/818

    Abstract: There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F2 that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water. According to another embodiment, a vaporized portion of a liquid reducing agent is mixed with the halogen-containing gas to produce a reaction mixture and a non-thermal plasma is generated in the reaction gas mixture to reduce the halogen-containing gas.

    Abstract translation: 公开了用于处理诸如F2的含卤素气体的各种方法,装置和系统,其涉及产生等离子体,以便将含卤素气体化学地减少为更环境可控的产品。 根据具体实施方案,将还原剂与含卤素气体混合以产生进料气体混合物,并且在液态水存在下在进料气体混合物中产生非热等离子体。 根据另一个实施方案,将液体还原剂的蒸发部分与含卤素气体混合以产生反应混合物,并且在反应气体混合物中产生非热等离子体以还原含卤素气体。

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