公开(公告)号：EP2976292B1

公开(公告)日：2020-05-06

申请号：EP14725821.4

申请日：2014-03-17

Applicant: SI-Ware Systems ,  Sabry, Yasser, M. ,  Khalil, Diaa Abdel Maged ,  Sadek, Mohamed

Inventor： SABRY, Yasser, M. ,  KHALIL, Diaa Abdel, Maged ,  SADEK, Mohamed

IPC: B81B5/00 ,  G02B6/35 ,  G02B6/24 ,  G02B26/02 ,  G02B6/293 ,  G02B26/00 ,  G02B6/36 ,  G01J1/04 ,  G02B1/00 ,  G01B9/02 ,  G02B6/26

公开(公告)号：EP2976292A1

公开(公告)日：2016-01-27

申请号：EP14725821.4

申请日：2014-03-17

Applicant: SI-Ware Systems ,  Sabry, Yasser, M. ,  Khalil, Diaa Abdel Maged ,  Sadek, Mohamed

Inventor： SABRY, Yasser, M. ,  KHALIL, Diaa Abdel, Maged ,  SADEK, Mohamed

IPC: B81B5/00 ,  G02B6/35 ,  G02B6/24 ,  G02B26/02 ,  G02B6/293 ,  G02B26/00 ,  G02B6/36 ,  G01J1/04 ,  G02B1/00 ,  G01B9/02 ,  G02B6/26

Abstract: An integrated apertured micromirror is provided in which the micromirror is monolithically integrated with a micro-optical bench fabricated on a substrate using a lithographic and deep etching technique. The micromirror has an aperture therein and is oriented such that the micromirror is optically coupled to receive an incident beam having an optical axis in a plane of the substrate and to at least partially transmit the incident beam therethrough via the aperture.

公开(公告)号：WO2014153284A9

公开(公告)日：2015-01-08

申请号：PCT/US2014030268

申请日：2014-03-17

Applicant: SI WARE SYSTEMS ,  SABRY YASSER M ,  KHALIL DIAA ABDEL MAGED ,  SADEK MOHAMED

Inventor： SABRY YASSER M ,  KHALIL DIAA ABDEL MAGED ,  SADEK MOHAMED

IPC: B81B5/00 ,  G01B9/02 ,  G01J1/04 ,  G02B1/00 ,  G02B6/24 ,  G02B6/26 ,  G02B6/293 ,  G02B6/35 ,  G02B6/36 ,  G02B26/00 ,  G02B26/02

CPC classification number: G02B26/001 ,  B81B5/00 ,  G01B9/02049 ,  G01J1/0411 ,  G02B1/005 ,  G02B6/24 ,  G02B6/262 ,  G02B6/29368 ,  G02B6/29395 ,  G02B6/3514 ,  G02B6/3518 ,  G02B6/353 ,  G02B6/357 ,  G02B6/3584 ,  G02B6/3616 ,  G02B26/02 ,  G02B26/023

Abstract: An integrated apertured micromirror is provided in which the micromirror is monolithically integrated with a micro-optical bench fabricated on a substrate using a lithographic and deep etching technique. The micromirror has an aperture therein and is oriented such that the micromirror is optically coupled to receive an incident beam having an optical axis in a plane of the substrate and to at least partially transmit the incident beam therethrough via the aperture.

Abstract translation: 提供了一种集成的有孔微镜，其中微镜与使用光刻和深蚀刻技术在基板上制造的微型光学台单片集成。 微镜在其中具有孔，并且被定向成使得微反射镜被光学耦合以接收在衬底的平面中具有光轴的入射光束，并且至少部分地透射经由孔的入射光束。

公开(公告)号：WO2014153284A1

公开(公告)日：2014-09-25

申请号：PCT/US2014/030268

申请日：2014-03-17

Applicant: SI-WARE SYSTEMS ,  SABRY, Yasser, M. ,  KHALIL, Diaa Abdel, Maged ,  SADEK, Mohamed

Inventor： SABRY, Yasser, M. ,  KHALIL, Diaa Abdel, Maged ,  SADEK, Mohamed

IPC: B81B5/00 ,  G02B6/35 ,  G02B6/24 ,  G02B26/02

CPC classification number: G02B26/001 ,  B81B5/00 ,  G01B9/02049 ,  G01J1/0411 ,  G02B1/005 ,  G02B6/24 ,  G02B6/262 ,  G02B6/29368 ,  G02B6/29395 ,  G02B6/3514 ,  G02B6/3518 ,  G02B6/353 ,  G02B6/357 ,  G02B6/3584 ,  G02B6/3616 ,  G02B26/02 ,  G02B26/023

Abstract: An integrated apertured micromirror is provided in which the micromirror is monolithically integrated with a micro-optical bench fabricated on a substrate using a lithographic and deep etching technique. The micromirror has an aperture therein and is oriented such that the micromirror is optically coupled to receive an incident beam having an optical axis in a plane of the substrate and to at least partially transmit the incident beam therethrough via the aperture.

Abstract translation: 提供了一种集成的有孔微镜，其中微镜与使用光刻和深蚀刻技术在基板上制造的微型光学台单片集成。 微镜在其中具有孔，并且被定向成使得微反射镜被光学耦合以接收在衬底的平面中具有光轴的入射光束，并且至少部分地透射经由孔的入射光束。