公开(公告)号：WO0057127A9

公开(公告)日：2002-03-28

申请号：PCT/US0007709

申请日：2000-03-22

Applicant: SENSYS INSTR CORP ,  STANKE FRED E ,  WEBER GRABAU MICHAEL ,  RUTH DOUGLAS E ,  TONG EDRIC H ,  CAHILL JAMES M JR ,  CARLISLE CLINTON ,  BURKE ELLIOT ,  PHAM HUNG

Inventor： STANKE FRED E ,  WEBER-GRABAU MICHAEL ,  RUTH DOUGLAS E ,  TONG EDRIC H ,  CAHILL JAMES M JR ,  CARLISLE CLINTON ,  BURKE ELLIOT ,  PHAM HUNG

IPC: B24B49/12 ,  G01B11/06 ,  G01B11/24 ,  G01B11/30 ,  G01N21/21 ,  G01N21/95 ,  H01L21/66 ,  H01L21/67 ,  H01L21/683 ,  C23C16/52 ,  G01N21/88 ,  H01L21/304

CPC classification number: B24B49/12 ,  G01B11/0625 ,  G01B11/30 ,  G01N21/211 ,  G01N21/9501 ,  H01L21/67 ,  H01L22/12

Abstract: This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.

Abstract translation: 本发明是一种用于成像测量的装置，其在特定实施例中可以与处理器站集成，使得计量站离开处理站而不是耦合到处理站。 计量站设置有具有包含测量区域的第一视野的第一成像照相机。 替代实施例包括具有第二视野的第二成像相机。 优选实施例包括宽带紫外光源，但是其他实施例可以具有宽或窄光带宽的可见光或近红外光源。 包括宽带宽源的实施例通常包括光谱仪或成像光谱仪。 具体实施例可以包括弯曲的，反射光学的或由液体润湿的测量区域。 在典型的实施例中，计量站和测量区域被配置为具有相对于彼此的4个移动自由度。