METHOD OF USING A MASK TO PROVIDE A PATTERNED SUBSTRATE
    2.
    发明申请
    METHOD OF USING A MASK TO PROVIDE A PATTERNED SUBSTRATE 审中-公开
    使用掩模来提供图案化的衬底的方法

    公开(公告)号:WO2011090641A3

    公开(公告)日:2011-09-22

    申请号:PCT/US2010061195

    申请日:2010-12-20

    Abstract: A method of producing substrates having a patterned mask layer with fine features such as repeating stripes. The method including the steps of forming a substrate having a transfer layer with a predetermined pattern on a first major surface of the substrate; providing the substrate having the transfer layer on the first major surface; providing a structured tool having a body and a plurality of contact portions, the contact portions having a Young's Modulus between about 0.5Gpa to about 30 Gpa; heating either the structured tool or the substrate; contacting the transfer layer with the structured tool; cooling the transfer layer; and withdrawing the structured tool from the transfer layer such that portions of the transfer layer separate with the structured tool leaving openings in the transfer layer that extend all the way through the transfer layer to the substrate forming the transfer layer with the predetermined pattern.

    Abstract translation: 一种制造具有图案掩模层的基片的方法,该掩模层具有诸如重复条纹之类的精细特征。 该方法包括以下步骤:在基板的第一主表面上形成具有预定图案的转印层的基板; 提供在第一主表面上具有转印层的基片; 提供具有主体和多个接触部分的结构化工具,所述接触部分具有介于约0.5Gpa至约30Gpa之间的杨氏模量; 加热结构化工具或基底; 使转印层与结构化工具接触; 冷却转印层; 以及从所述转印层中取出所述结构化工具,使得与所述结构化工具分离的所述转印层的部分留下在所述转印层中一直延伸穿过所述转印层的开口到形成具有所述预定图案的所述转印层的所述基材。

    METHOD OF USING A MASK TO PROVIDE A PATTERNED SUBSTRATE
    3.
    发明申请
    METHOD OF USING A MASK TO PROVIDE A PATTERNED SUBSTRATE 审中-公开
    使用掩模提供图案基板的方法

    公开(公告)号:WO2011090641A2

    公开(公告)日:2011-07-28

    申请号:PCT/US2010/061195

    申请日:2010-12-20

    Abstract: A method of producing substrates having a patterned mask layer with fine features such as repeating stripes. The method including the steps of forming a substrate having a transfer layer with a predetermined pattern on a first major surface of the substrate; providing the substrate having the transfer layer on the first major surface; providing a structured tool having a body and a plurality of contact portions, the contact portions having a Young's Modulus between about 0.5Gpa to about 30 Gpa; heating either the structured tool or the substrate; contacting the transfer layer with the structured tool; cooling the transfer layer; and withdrawing the structured tool from the transfer layer such that portions of the transfer layer separate with the structured tool leaving openings in the transfer layer that extend all the way through the transfer layer to the substrate forming the transfer layer with the predetermined pattern.

    Abstract translation: 一种制造具有图案化掩模层的基板的方法,其具有诸如重复条纹的精细特征。 该方法包括以下步骤:在衬底的第一主表面上形成具有预定图案的转印层的衬底; 在第一主表面上提供具有转移层的基板; 提供具有主体和多个接触部分的结构化工具,所述接触部分具有约0.5Gpa至约30Gpa的杨氏模量; 加热结构化工具或衬底; 使转移层与结构化工具接触; 冷却转印层; 并且从转移层中取出结构化工具,使得转移层的部分与结构化工具分离,在转移层中留下一直延伸通过转移层的开口,形成具有预定图案的转移层。

    METHODS FOR MAKING ELECTRONIC DEVICES
    5.
    发明申请
    METHODS FOR MAKING ELECTRONIC DEVICES 审中-公开
    制造电子设备的方法

    公开(公告)号:WO2009079249A1

    公开(公告)日:2009-06-25

    申请号:PCT/US2008/085806

    申请日:2008-12-08

    CPC classification number: G02F1/13439

    Abstract: The present disclosure describes methods for making an electronic device. Methods for making electronic devices include providing a first electrode, an electro-responsive layer, and a second electrode. A first conductive nanostructured grid is deposited on a surface of the first electrode. The electro-responsive layer is facing the first conductive nanostructured grid. The electro-responsive layer is positioned between the first electrode and the second electrode. An electronic device having a first nanostructured grid deposited on a first electrode is described.

    Abstract translation: 本公开描述了用于制造电子设备的方法。 制造电子器件的方法包括提供第一电极,电响应层和第二电极。 第一导电纳米结构栅格沉积在第一电极的表面上。 电响应层面向第一导电纳米结构网格。 电响应层位于第一电极和第二电极之间。 描述了具有沉积在第一电极上的第一纳米结构栅格的电子器件。

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