公开(公告)号：WO2013006750A3

公开(公告)日：2013-01-10

申请号：PCT/US2012/045662

申请日：2012-07-06

Applicant: CORNING INCORPORATED ,  CAVUOTI, Jeanne S ,  CLARK, Donald A ,  GARNER, Sean M ,  GLAESEMANN, Gregory S ,  HOU, Jun ,  KIM, Jum Sik ,  ONO, Toshihiko ,  STERNQUIST, Daniel A.

Inventor： CAVUOTI, Jeanne S ,  CLARK, Donald A ,  GARNER, Sean M ,  GLAESEMANN, Gregory S ,  HOU, Jun ,  KIM, Jum Sik ,  ONO, Toshihiko ,  STERNQUIST, Daniel A.

IPC: G02F1/13 ,  C03C15/02

Abstract: Disclosed are controlled chemical etching processes used to modify the geometry of surface flaws in thin glass substrates and glass substrate assemblies formed therefrom, and in particular glass substrates suitable for the manufacture of active matrix displays that are essentially free of alkali metal oxides such as Na 2 O, K 2 O and Li 2 O.

公开(公告)号：WO2010117673A1

公开(公告)日：2010-10-14

申请号：PCT/US2010/028798

申请日：2010-03-26

Applicant: CORNING INCORPORATED ,  CARLSON, Krista L. ,  HART, Shandon D. ,  NGUYEN, Kelvin ,  SABIA, Robert ,  STERNQUIST, Daniel A. ,  ZHANG, Lu

Inventor： CARLSON, Krista L. ,  HART, Shandon D. ,  NGUYEN, Kelvin ,  SABIA, Robert ,  STERNQUIST, Daniel A. ,  ZHANG, Lu

IPC: C03C15/00 ,  C09K13/08

CPC classification number: C03C15/00 ,  C03C23/00 ,  C03C2217/77 ,  C09G1/00

Abstract: A glass article having an anti-glare surface. The anti-glare surface has a distinctness-of-reflected image of less than 95, and a haze of less than or equal to 50%. In one embodiment, the glass article further includes a smudge-resistant surface disposed on the anti-glare surface. Methods of making the glass article and anti-glare surface are also described.

Abstract translation: 具有防眩光表面的玻璃制品。 抗眩光表面具有小于95的明显的反射图像，并且雾度小于或等于50％。 在一个实施例中，玻璃制品还包括设置在防眩光表面上的防污表面。 还描述了制造玻璃制品和防眩光表面的方法。

公开(公告)号：WO2013006750A2

公开(公告)日：2013-01-10

申请号：PCT/US2012045662

申请日：2012-07-06

Applicant: CORNING INC ,  CAVUOTI JEANNE S ,  CLARK DONALD A ,  GARNER SEAN M ,  GLAESEMANN GREGORY S ,  HOU JUN ,  KIM JUM SIK ,  ONO TOSHIHIKO ,  STERNQUIST DANIEL A

Inventor： CAVUOTI JEANNE S ,  CLARK DONALD A ,  GARNER SEAN M ,  GLAESEMANN GREGORY S ,  HOU JUN ,  KIM JUM SIK ,  ONO TOSHIHIKO ,  STERNQUIST DANIEL A

CPC classification number: H01L27/1262 ,  C03C15/02 ,  G02F1/1333 ,  H01L21/02019 ,  H01L33/58 ,  Y10T428/1095

Abstract: Disclosed are controlled chemical etching processes used to modify the geometry of surface flaws in thin glass substrates and glass substrate assemblies formed therefrom, and in particular glass substrates suitable for the manufacture of active matrix displays that are essentially free of alkali metal oxides such as Na2O, K2O and Li2O.

Abstract translation: 公开了用于改变由其形成的薄玻璃基板和玻璃基板组件中的表面缺陷的几何形状的受控化学蚀刻工艺，特别是适用于制造基本上不含碱金属氧化物如Na 2 O， K2O和Li2O。