公开(公告)号：WO2009152885A8

公开(公告)日：2010-05-20

申请号：PCT/EP2009001581

申请日：2009-03-06

Applicant: ZEISS CARL SMT AG ,  ASML NETHERLANDS BV ,  EHM DIRK HEINRICH ,  STORM ARNOLDUS JAN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  CZAP ALMUT ,  NAGEL MONA ,  VAN DER DONCK JACQUES COR JOHA ,  STORTELDER JETSKE ,  SANDTKE MARIJN ,  CABALLERO MARIA ISABEL CATALIN ,  SCACCABAROZZI LUIGI

Inventor： EHM DIRK HEINRICH ,  STORM ARNOLDUS JAN ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  CZAP ALMUT ,  NAGEL MONA ,  VAN DER DONCK JACQUES COR JOHAN ,  STORTELDER JETSKE ,  SANDTKE MARIJN ,  CABALLERO MARIA ISABEL CATALINA ,  SCACCABAROZZI LUIGI

IPC: G03F7/20 ,  G21K1/00

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70975 ,  G03F7/70983 ,  G21K1/062

Abstract: An optical assembly serves the purpose of being mounted in a projection exposure apparatus (101) for EUV microlithography and comprises at least one vacuum chamber (70, 71, 68a), at least one optical element (6, 7; 65, 66; 63) arranged in the vacuum chamber (70, 71, 68a), the optical element (6, 7; 65, 66; 63) having an optical surface (18) which may be impinged upon by a useful beam bundle (3) of the projection exposure apparatus (101), and a cleaning device (72) for cleaning the optical surface (18). The cleaning device (72) is configured to perform particle cleaning of the optical surface (18) at a gas pressure within the vacuum chamber (70,71, 68a) which is higher than a vacuum pressure (p0) for performing an exposure operation with the projection exposure apparatus (101). The result is an optical assembly capable of providing optical elements having an optical surface which may be impinged upon by a useful beam bundle which can be cleaned reliably from foreign particles.

Abstract translation: 光学组件用于安装在用于EUV微光刻的投影曝光设备（101）中，并且包括至少一个真空室（70,71,68a），至少一个光学元件（6,7; 65,66,63 ），所述光学元件（6,7; 65,66,63）具有光学表面（18），所述光学表面可被所述真空室（70,71,68a）的有用光束束（3）撞击 投影曝光装置（101）和用于清洁光学表面（18）的清洁装置（72）。 清洁装置（72）构造成在真空室（70,71,68a）内的气体压力下进行光学表面（18）的粒子清洁，该气体压力高于用于进行曝光操作的真空压力（p0） 投影曝光装置（101）。 其结果是能够提供光学元件的光学组件，该光学元件具有光学表面，该光学表面可以被可以被外界颗粒可靠地清洁的有用束束撞击。

公开(公告)号：WO2009152885A1

公开(公告)日：2009-12-23

申请号：PCT/EP2009/001581

申请日：2009-03-06

Applicant: CARL ZEISS SMT AG ,  ASML NETHERLANDS B.V. ,  EHM, Dirk, Heinrich ,  STORM, Arnoldus Jan ,  MOORS, Johannes Hubertus Josephina ,  CZAP, Almut ,  NAGEL, Mona ,  VAN DER DONCK, Jacques, Cor, Johan ,  STORTELDER, Jetske ,  SANDTKE, Marijn ,  CABALLERO, Maria, Isabel, Catalina ,  SCACCABAROZZI, Luigi ,  SCHMIDT, Stefan ,  KRAUS, Dieter ,  WIESNER, Stefan ,  KÖHLER, Stefan ,  CHUNG, Hin Yiu Anthony

Inventor： EHM, Dirk, Heinrich ,  STORM, Arnoldus Jan ,  MOORS, Johannes Hubertus Josephina ,  CZAP, Almut ,  NAGEL, Mona ,  VAN DER DONCK, Jacques, Cor, Johan ,  STORTELDER, Jetske ,  SANDTKE, Marijn ,  CABALLERO, Maria, Isabel, Catalina ,  SCACCABAROZZI, Luigi ,  SCHMIDT, Stefan ,  KRAUS, Dieter ,  WIESNER, Stefan ,  KÖHLER, Stefan ,  CHUNG, Hin Yiu Anthony

IPC: G03F7/20 ,  G21K1/00

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70975 ,  G03F7/70983 ,  G21K1/062

Abstract: An optical assembly serves the purpose of being mounted in a projection exposure apparatus (101) for EUV microlithography and comprises at least one vacuum chamber (70, 71, 68a), at least one optical element (6, 7; 65, 66; 63) arranged in the vacuum chamber (70, 71, 68a), the optical element (6, 7; 65, 66; 63) having an optical surface (18) which may be impinged upon by a useful beam bundle (3) of the projection exposure apparatus (101), and a cleaning device (72) for cleaning the optical surface (18). The cleaning device (72) is configured to perform particle cleaning of the optical surface (18) at a gas pressure within the vacuum chamber (70,71, 68a) which is higher than a vacuum pressure (p0) for performing an exposure operation with the projection exposure apparatus (101). The result is an optical assembly capable of providing optical elements having an optical surface which may be impinged upon by a useful beam bundle which can be cleaned reliably from foreign particles.

Abstract translation: 光学组件用于安装在用于EUV微光刻的投影曝光设备（101）中，并且包括至少一个真空室（70,71,68a），至少一个光学元件（6,7; 65,66,63 ），所述光学元件（6,7; 65,66,63）具有光学表面（18），所述光学表面可被所述真空室（70,71,68a）的有用光束束（3）撞击 投影曝光装置（101）和用于清洁光学表面（18）的清洁装置（72）。 清洁装置（72）构造成在真空室（70,71,68a）内的气体压力下进行光学表面（18）的粒子清洁，该气体压力高于用于进行曝光操作的真空压力（p0） 投影曝光装置（101）。 其结果是能够提供光学元件的光学组件，该光学元件具有光学表面，该光学表面可以被可以被外界颗粒可靠地清洁的有用束束撞击。

公开(公告)号：WO2008078993A2

公开(公告)日：2008-07-03

申请号：PCT/NL2007/050661

申请日：2007-12-18

Applicant: ASML NETHERLANDS B.V. ,  CARL ZEISS SMT AG ,  STORM, Arnoldus Jan ,  MOORS, Johannes Hubertus Josephina ,  WOLSCHRIJN, Bastiaan Theodoor ,  EHM, Dirk Heinrich

Inventor： STORM, Arnoldus Jan ,  MOORS, Johannes Hubertus Josephina ,  WOLSCHRIJN, Bastiaan Theodoor ,  EHM, Dirk Heinrich

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70058 ,  G03F7/70916

Abstract: A lithographic apparatus that includes an illumination system configured to condition a radiation beam. The illumination system includes a plurality of optical components. The apparatus also includes a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus further includes a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The projection system includes a plurality of optical components. The apparatus also includes a contamination measurement unit for measuring contamination of a surface of at least one of the optical components. The contamination measurement unit is provided with a radiation sensor constructed and arranged to measure an optical characteristic of radiation received from the surface.

Abstract translation: 一种光刻设备，包括配置成调节辐射束的照明系统。 照明系统包括多个光学部件。 该装置还包括构造成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 该装置还包括被构造成保持基板的基板台，以及配置成将图案化的辐射束投影到基板的目标部分上的投影系统。 投影系统包括多个光学部件。 该装置还包括用于测量至少一个光学部件的表面的污染物的污染测量单元。 污染测量单元设置有辐射传感器，其被构造和布置成测量从表面接收的辐射的光学特性。

公开(公告)号：WO2004078640A1

公开(公告)日：2004-09-16

申请号：PCT/NL2004/000166

申请日：2004-03-05

Applicant: TECHNISCHE UNIVERSITEIT DELFT ,  STORM, Arnoldus, Jan ,  ZANDBERGEN, Hendrik, Willem

Inventor： STORM, Arnoldus, Jan ,  ZANDBERGEN, Hendrik, Willem

IPC: B81B1/00

CPC classification number: G01N33/48721 ,  B81B1/004 ,  B81B2203/0127 ,  B81C1/00087 ,  B81C2201/0143 ,  H01J37/31

Abstract: The invention relates to a method for manufacturing nanometer-scale apertures, wherein, in an object, in a conventional manner, at least one aperture is provided with a nanometer-scale surface area, after which, by means of an electron beam, energy is supplied to at least the edge of said at least one aperture, such that the surface area of the respective aperture is adjusted, wherein the surface area of the aperture is controlled during adjustment and the supply of energy is regulated on the basis of the surface area change.

Abstract translation: 本发明涉及一种制造纳米尺度孔径的方法，其中在一个目的中，以常规方式，至少一个开口具有纳米级的表面积，之后借助于电子束，能量是 供应到所述至少一个孔的至少边缘，使得调节相应孔的表面积，其中在调节期间控制孔的表面积，并且基于表面积调节能量供应 更改。

公开(公告)号：WO2008078993A3

公开(公告)日：2008-08-21

申请号：PCT/NL2007050661

申请日：2007-12-18

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SMT AG ,  STORM ARNOLDUS JAN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  WOLSCHRIJN BASTIAAN THEODOOR ,  EHM DIRK HEINRICH

Inventor： STORM ARNOLDUS JAN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  WOLSCHRIJN BASTIAAN THEODOOR ,  EHM DIRK HEINRICH

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70058 ,  G03F7/70916

Abstract: A lithographic apparatus that includes an illumination system configured to condition a radiation beam. The illumination system includes a plurality of optical components. The apparatus also includes a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus further includes a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The projection system includes a plurality of optical components. The apparatus also includes a contamination measurement unit for measuring contamination of a surface of at least one of the optical components. The contamination measurement unit is provided with a radiation sensor constructed and arranged to measure an optical characteristic of radiation received from the surface.

Abstract translation: 一种光刻设备，包括配置成调节辐射束的照明系统。 照明系统包括多个光学部件。 该装置还包括构造成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 该装置还包括被构造成保持基板的基板台，以及配置成将图案化的辐射束投影到基板的目标部分上的投影系统。 投影系统包括多个光学部件。 该装置还包括用于测量至少一个光学部件的表面的污染物的污染测量单元。 污染测量单元设置有辐射传感器，其被构造和布置成测量从表面接收的辐射的光学特性。