公开(公告)号：US20100060874A1

公开(公告)日：2010-03-11

申请号：US12461798

申请日：2009-08-25

Applicant: Jeongmin Kim ,  Sangwoo Bae ,  Hikuk Lee ,  Sangdon Jang

Inventor： Jeongmin Kim ,  Sangwoo Bae ,  Hikuk Lee ,  Sangdon Jang

IPC: G03B27/54

CPC classification number: G03F7/7085 ,  G03F7/70291 ,  G03F7/70508 ,  G03F7/70558

Abstract: A maskless lithographic apparatus may include a light source providing an exposure beam, a light modulator modulating the exposure beam according to an exposure pattern, an exposure optical system delivering the modulated exposure beam provided by the light modulator onto a substrate in a form of a beam spot array, and a control unit switching off some rows in the beam spot array in order to make exposure energy distribution uniform across the beam spot array. A method for compensating for an alignment error using a maskless lithographic apparatus may include providing an exposure beam, modulating the exposure beam according to an exposure pattern, delivering the modulated exposure beam provided by a light modulator onto a substrate in a form of a beam spot array, and switching off some rows in the beam spot array in order to make exposure energy distribution uniform across the beam spot array.

Abstract translation: 无掩模光刻设备可以包括提供曝光光束的光源，根据曝光图案调制曝光光束的光调制器;曝光光学系统，将由光调制器提供的调制曝光光束以束的形式传送到基板上 点阵列，以及控制单元，关闭束斑阵列中的一些行，以使束光点阵列上的曝光能量分布均匀。 使用无掩模光刻设备来补偿对准误差的方法可包括提供曝光光束，根据曝光图案调制曝光光束，以光束调制器的形式将由光调制器提供的调制曝光光束传送到衬底上 阵列，并关闭光束阵列中的一些行，以使曝光能量分布在束斑阵列上均匀。

公开(公告)号：US20070021511A1

公开(公告)日：2007-01-25

申请号：US10548310

申请日：2003-03-07

Applicant: Su Lee ,  Yun Lee ,  Soo Kim ,  Kyung Kim ,  Chul Cho ,  Chang Kang ,  Tae Kim ,  Sangwoo Bae ,  Moon Park ,  Jung Choi ,  Min Kim ,  Hee Chung ,  Sujong Kim ,  Seongman Kang ,  Weon Choi ,  Jung Kang

Inventor： Su Lee ,  Yun Lee ,  Soo Kim ,  Kyung Kim ,  Chul Cho ,  Chang Kang ,  Tae Kim ,  Sangwoo Bae ,  Moon Park ,  Jung Choi ,  Min Kim ,  Hee Chung ,  Sujong Kim ,  Seongman Kang ,  Weon Choi ,  Jung Kang

IPC: A61K31/16 ,  A61K31/13

CPC classification number: A61K31/164 ,  A61K31/133

Abstract: Provided is a composition for cancer treatment including phytosphingosine or a derivative thereof, or a pharmaceutically acceptable salt thereof as an active ingredient.

Abstract translation: 本发明提供包含植物鞘氨醇或其衍生物或其药学上可接受的盐作为活性成分的癌症治疗用组合物。

公开(公告)号：US20090176888A1

公开(公告)日：2009-07-09

申请号：US12399384

申请日：2009-03-06

Applicant: Su Jae LEE ,  Yun Sil LEE ,  Soo Kwan KIM ,  Kyung Joong KIM ,  Chul Koo CHO ,  Chang Mo KANG ,  Tae Hwan KIM ,  Sangwoo BAE ,  Moon Taek PARK ,  Jung A. CHOI ,  Min Jeong KIM ,  Hee Yong CHUNG ,  Sujong KIM ,  Seongnam KANG ,  Weon Ik CHOI ,  Jung A. KANG

Inventor： Su Jae LEE ,  Yun Sil LEE ,  Soo Kwan KIM ,  Kyung Joong KIM ,  Chul Koo CHO ,  Chang Mo KANG ,  Tae Hwan KIM ,  Sangwoo BAE ,  Moon Taek PARK ,  Jung A. CHOI ,  Min Jeong KIM ,  Hee Yong CHUNG ,  Sujong KIM ,  Seongnam KANG ,  Weon Ik CHOI ,  Jung A. KANG

IPC: A61K31/13

CPC classification number: A61K31/164 ,  A61K31/133

Abstract: Provided is a composition for cancer treatment including phytosphingosine or a derivative thereof, or a pharmaceutically acceptable salt thereof as an active ingredient.

Abstract translation: 本发明提供包含植物鞘氨醇或其衍生物或其药学上可接受的盐作为活性成分的癌症治疗用组合物。