公开(公告)号：WO2003100391A1

公开(公告)日：2003-12-04

申请号：PCT/US2003/016440

申请日：2003-05-23

Applicant: MYKROLIS CORPORATION ,  TISON, Stuart, A. ,  LU, Shiliang

Inventor： TISON, Stuart, A. ,  LU, Shiliang

IPC: G01N21/00

CPC classification number: G01F1/684 ,  G01F1/6842 ,  G01F1/6965 ,  G01F5/00 ,  G01F25/0007 ,  Y10T137/7761

Abstract: A system and method for detecting a fluid flow where a fluid passing through a conduit (310) passes through detection electronics (330, 320, and 340) producing signals indicative of the fluid flow in sensor electronic control means (350).

Abstract translation: 一种用于检测流体流动的系统和方法，其中通过导管（310）的流体通过检测电子装置（330,320和340），产生指示传感器电子控制装置（350）中的流体流动的信号。

公开(公告)号：WO2006017116A3

公开(公告)日：2007-03-01

申请号：PCT/US2005024084

申请日：2005-07-07

Applicant: CELERITY INC ,  TISON STUART A ,  SUKUMARAN SANDEEP ,  BARKER JAMES

Inventor： TISON STUART A ,  SUKUMARAN SANDEEP ,  BARKER JAMES

IPC: G05D7/06

CPC classification number: G01F25/0038 ,  G01F25/0053 ,  G05D7/0635

Abstract: Systems and methods for flow verification and validation of mass flow controllers are disclosed. A mass flow controller may be commanded to a specified flow and flow measurement commenced. During an interval, gas is accumulated in a first volume and measurements taken within this volume. The various measurements taken during the interval may then be used to calculate the flow rate. The flow rate, in turn, may be used to determine the accuracy of the mass flow controller relative to a setpoint.

Abstract translation: 公开了用于流量验证和质量流量控制器验证的系统和方法。 可以命令质量流量控制器进行指定的流量和流量测量。 在间隔期间，气体积聚在第一个体积中，并在该体积内进行测量。 然后可以使用间隔期间进行的各种测量来计算流量。 流量又可用于确定质量流量控制器相对于设定点的精度。

公开(公告)号：WO2003100356A1

公开(公告)日：2003-12-04

申请号：PCT/US2003/016493

申请日：2003-05-23

Applicant: MYKROLIS CORPORATION ,  TISON, Stuart, A. ,  WU, Guanghua ,  GILL, Tracy ,  LOPEZ, Vincent

Inventor： TISON, Stuart, A. ,  WU, Guanghua ,  GILL, Tracy ,  LOPEZ, Vincent

IPC: G01F1/37

CPC classification number: G01F1/42 ,  G01F1/40

Abstract: A flow restrictor (30) for a mass flow metering device formed of a solid material and slots (32) originating from an outer surface towards inward.

Abstract translation: 一种用于由固体材料形成的质量流量计量装置的限流器（30）和从外表面朝向内部的槽（32）。

公开(公告)号：WO2006065528A1

公开(公告)日：2006-06-22

申请号：PCT/US2005/043148

申请日：2005-11-29

Applicant: ENTEGRIS, INC. ,  TISON, Stuart A. ,  LU, Shiliang

Inventor： TISON, Stuart A. ,  LU, Shiliang

IPC: G04F1/00

CPC classification number: G01F7/005

Abstract: One embodiment of the present invention can comprise a primary flow measurement system, a secondary flow measurement system in fluid communication with the primary flow measurement system and a control coupled to the primary flow measurement system and the secondary flow measurement system. The controller can comprise a processor and a memory accessible by the processor. The processor can execute computer instructions stored on the memory to calculate a flow rate using the primary flow measurement system, in a first mode of operation, and calculate the flow rate using the secondary flow measurement system, in a second mode of operation. The computer instructions can be further executable to switch between the first mode of operation and the second mode of operation based on a predefined parameter.

Abstract translation: 本发明的一个实施例可以包括主流量测量系统，与主流量测量系统流体连通的二次流量测量系统以及耦合到初级流量测量系统和二次流量测量系统的控制。 控制器可以包括处理器和由处理器可访问的存储器。 处理器可以执行存储在存储器上的计算机指令，以第一操作模式使用主流量测量系统计算流量，并且在第二操作模式下使用二次流量测量系统计算流量。 计算机指令可以进一步执行，以便基于预定参数在第一操作模式和第二操作模式之间切换。

公开(公告)号：WO2006044724A1

公开(公告)日：2006-04-27

申请号：PCT/US2005/037130

申请日：2005-10-13

Applicant: ENTEGRIS, INC. ,  TINSLEY, Kenneth, E. ,  TISON, Stuart, A.

Inventor： TINSLEY, Kenneth, E. ,  TISON, Stuart, A.

IPC: F24F7/00 ,  F25D17/02 ,  F25D23/12 ,  C23C16/00 ,  C23F1/00

CPC classification number: H01L21/67248

Abstract: Systems and methods for controlling the temperature of a wafer are disclosed. These systems and methods may employ a back side wafer pressure control system (BSWPC) that includes subsystems and a controller operable in tandem to control the temperature of wafers in one or more process chambers. The subsystems may include mechanical components for controlling a flow of gas to the backside of a wafer while the controller may be utilized to control these mechanical components in order to control wafer temperature in a process chamber. Furthermore, embodiments of these systems and methods may also use a chiller in combination with the controller to provide both coarse and fine temperature control.

Abstract translation: 公开了用于控制晶片温度的系统和方法。 这些系统和方法可以采用背面晶片压力控制系统（BSWPC），其包括子系统和可串行操作以控制一个或多个处理室中的晶片的温度的控制器。 子系统可以包括用于控制气体流到晶片背面的机械部件，而控制器可用于控制这些机械部件以便控制处理室中的晶片温度。 此外，这些系统和方法的实施例还可以使用与控制器组合的冷却器来提供粗略和精细的温度控制。

公开(公告)号：WO2006017116A2

公开(公告)日：2006-02-16

申请号：PCT/US2005/024084

申请日：2005-07-07

Applicant: MYKROLIS CORPORATION ,  TISON, Stuart, A. ,  SUKUMARAN, Sandeep ,  BARKER, James

Inventor： TISON, Stuart, A. ,  SUKUMARAN, Sandeep ,  BARKER, James

IPC: G05D7/06

CPC classification number: G01F25/0038 ,  G01F25/0053 ,  G05D7/0635

Abstract: Systems and methods for flow verification and validation of mass flow controllers are disclosed. A mass flow controller may be commanded to a specified flow and flow measurement commenced. During an interval, gas is accumulated in a first volume and measurements taken within this volume. The various measurements taken during the interval may then be used to calculate the flow rate. The flow rate, in turn, may be used to determine the accuracy of the mass flow controller relative to a setpoint.

Abstract translation: 公开了用于流量验证和质量流量控制器验证的系统和方法。 可以命令质量流量控制器进行指定的流量和流量测量。 在间隔期间，气体积聚在第一个体积中，并在该体积内进行测量。 然后可以使用间隔期间进行的各种测量来计算流量。 流量又可用于确定质量流量控制器相对于设定点的精度。