公开(公告)号：WO2005038081A2

公开(公告)日：2005-04-28

申请号：PCT/US2004/032534

申请日：2004-10-04

Applicant: APPLIED MATERIALS, INC. ,  FODOR, Mark, A. ,  VELASTEGUI, Sophia, M. ,  SEN, Soovo ,  SIVARAMAKRISHNAN, Visweswaren ,  LEE, Peter, Wai-Man ,  SILVETTI, Mario, David

Inventor： FODOR, Mark, A. ,  VELASTEGUI, Sophia, M. ,  SEN, Soovo ,  SIVARAMAKRISHNAN, Visweswaren ,  LEE, Peter, Wai-Man ,  SILVETTI, Mario, David

IPC: C23C16/46

CPC classification number: C23C16/4585 ,  C23C16/46 ,  H01L21/68735

Abstract: A substrate heater assembly for supporting a substrate of a predetermined standardized diameter during processing is provided. In one embodiment, the substrate heater assembly includes a body having an upper surface, a lower surface and an embedded heating element. A substrate support surface is formed in the upper surface of the body and defines a portion of a substrate receiving pocket. An annular wall is oriented perpendicular to the upper surface and has a length of at least one half a thickness of the substrate. The wall bounds an outer perimeter of the substrate receiving pocket and has a diameter less than about 0.5 mm greater than the predetermined substrate diameter.

Abstract translation: 提供了一种用于在处理期间支撑预定标准直径的基板的基板加热器组件。 在一个实施例中，基板加热器组件包括具有上表面，下表面和嵌入式加热元件的主体。 衬底支撑表面形成在主体的上表面中并且限定衬底接收袋的一部分。 环形壁垂直于上表面定向并且具有衬底的至少一半厚度的长度。 该壁限定了基板接收槽的外周边，并且具有小于预定基板直径的直径小于约0.5mm的直径。

公开(公告)号：WO2008094752A1

公开(公告)日：2008-08-07

申请号：PCT/US2008/051055

申请日：2008-01-15

Applicant: APPLIED MATERIALS, INC. ,  FODOR, Mark A. ,  VELASTEGUI, Sophia M. ,  BOK HOEN, Kim ,  DUBOIS, Dale R.

Inventor： FODOR, Mark A. ,  VELASTEGUI, Sophia M. ,  BOK HOEN, Kim ,  DUBOIS, Dale R.

IPC: C23F1/00 ,  H01L21/306

CPC classification number: C23C16/46

Abstract: A heater liner assembly suitable for covering the interior of a plasma processing chamber is provided. In some embodiments, a liner assembly for a processing chamber can include a heating element embedded in a body. A flange extending outward from an outer diameter of the body includes an upper surface having a sealing surface and at least one pad that extends from the upper surface of the flange to an elevation beyond the sealing surface. The pad contributes to control of the temperature of the liner assembly by maintaining the liner assembly spaced apart from the processing chamber.

Abstract translation: 提供了一种适用于覆盖等离子体处理室内部的加热器衬套组件。 在一些实施例中，用于处理室的衬套组件可以包括嵌入在主体中的加热元件。 从主体的外径向外延伸的凸缘包括具有密封表面的上表面和从凸缘的上表面延伸到超过密封表面的高度的至少一个垫。 衬垫有助于通过将衬垫组件与处理室间隔开来控制衬套组件的温度。

公开(公告)号：WO2007142850A3

公开(公告)日：2008-02-21

申请号：PCT/US2007012348

申请日：2007-05-22

Applicant: APPLIED MATERIALS INC ,  SUN DAVID P ,  COFFMAN DANIEL ,  GIANOULAKIS STEVEN E ,  DESAI ABHIJIT ,  VELASTEGUI SOPHIA M

Inventor： SUN DAVID P ,  COFFMAN DANIEL ,  GIANOULAKIS STEVEN E ,  DESAI ABHIJIT ,  VELASTEGUI SOPHIA M

IPC: C23C16/455 ,  C23C16/52

CPC classification number: C23C16/52 ,  C23C16/45557 ,  Y10T137/7761

Abstract: A gas flow comparator comprises a gas control mounted on a gas tube to set a gas flow or pressure of a gas passing thorough the gas tube. A principal flow splitter comprises an inlet port connected to the gas tube. First and second flow restrictors are connected to the principal flow splitter. A pair of secondary flow splitters are each connected to a restrictor outlet of a flow restrictor. A differential pressure gauge is connected to the secondary flow splitters. A pair of nozzle holders are connected to the secondary flow splitters and are capable of being connected to first and second nozzles. In operation, the pressure differential gauge registers a pressure differential proportional to a variation in the passage of gas through the first and second nozzles.

Abstract translation: 气体流量比较器包括安装在气体管上的气体控制器，以设定通过气体管道的气体的气体流量或压力。 主流量分配器包括连接到气体管的入口端口。 第一和第二流量限制器连接到主流量分配器。 一对二次流分流器各自连接到限流器的限流器出口。 差压表连接到二次分流器。 一对喷嘴保持器连接到二次分流器并且能够连接到第一和第二喷嘴。 在操作中，压差表记录与通过第一和第二喷嘴的气体通过的变化成比例的压力差。

公开(公告)号：WO2007142850A2

公开(公告)日：2007-12-13

申请号：PCT/US2007/012348

申请日：2007-05-22

Applicant: APPLIED MATERIALS ,  SUN, David P. ,  COFFMAN, Daniel ,  GIANOULAKIS, Steven E. ,  DESAI, Abhijit ,  VELASTEGUI, Sophia M.

Inventor： SUN, David P. ,  COFFMAN, Daniel ,  GIANOULAKIS, Steven E. ,  DESAI, Abhijit ,  VELASTEGUI, Sophia M.

IPC: C23C16/455 ,  C23C16/52

CPC classification number: C23C16/52 ,  C23C16/45557 ,  Y10T137/7761

Abstract: A gas flow comparator comprises a gas control mounted on a gas tube to set a gas flow or pressure of a gas passing thorough the gas tube. A principal flow splitter comprises an inlet port connected to the gas tube. First and second flow restrictors are connected to the principal flow splitter. A pair of secondary flow splitters are each connected to a restrictor outlet of a flow restrictor. A differential pressure gauge is connected to the secondary flow splitters. A pair of nozzle holders are connected to the secondary flow splitters and are capable of being connected to first and second nozzles. In operation, the pressure differential gauge registers a pressure differential proportional to a variation in the passage of gas through the first and second nozzles.

Abstract translation: 气体流量比较器包括安装在气体管上的气体控制器，以设定通过气体管道的气体的气体流量或压力。 主流量分配器包括连接到气体管的入口端口。 第一和第二流量限制器连接到主流量分配器。 一对二次流分流器各自连接到限流器的限流器出口。 差压表连接到二次分流器。 一对喷嘴保持器连接到二次分流器并且能够连接到第一和第二喷嘴。 在操作中，压差表记录与通过第一和第二喷嘴的气体通过的变化成比例的压力差。

公开(公告)号：WO2005038081A3

公开(公告)日：2005-08-18

申请号：PCT/US2004032534

申请日：2004-10-04

Applicant: APPLIED MATERIALS INC ,  FODOR MARK A ,  VELASTEGUI SOPHIA M ,  SEN SOOVO ,  SIVARAMAKRISHNAN VISWESWAREN ,  LEE PETER WAI-MAN ,  SILVETTI MARIO DAVID

Inventor： FODOR MARK A ,  VELASTEGUI SOPHIA M ,  SEN SOOVO ,  SIVARAMAKRISHNAN VISWESWAREN ,  LEE PETER WAI-MAN ,  SILVETTI MARIO DAVID

IPC: C23C16/458 ,  C23C16/46 ,  H01L21/687 ,  H01L21/00

CPC classification number: C23C16/4585 ,  C23C16/46 ,  H01L21/68735

Abstract: A substrate heater assembly for supporting a substrate of a predetermined standardized diameter during processing is provided. In one embodiment, the substrate heater assembly includes a body having an upper surface, a lower surface and an embedded heating element. A substrate support surface is formed in the upper surface of the body and defines a portion of a substrate receiving pocket. An annular wall is oriented perpendicular to the upper surface and has a length of at least one half a thickness of the substrate. The wall bounds an outer perimeter of the substrate receiving pocket and has a diameter less than about 0.5 mm greater than the predetermined substrate diameter.

Abstract translation: 提供了用于在处理期间支撑预定标准化直径的衬底的衬底加热器组件。 在一个实施例中，衬底加热器组件包括具有上表面，下表面和嵌入式加热元件的主体。 衬底支撑表面形成在主体的上表面中并限定衬底接收袋的一部分。 环形壁垂直于上表面取向并具有至少为基材厚度一半的长度。 该壁界定了基板接收袋的外周边并具有比预定基板直径小大约0.5mm的直径。