公开(公告)号：WO2006104921A3

公开(公告)日：2006-10-05

申请号：PCT/US2006/010870

申请日：2006-03-24

Applicant: TOKYO ELECTRON LIMITED ,  FAGUET, Jacques ,  CERIO, Frank, M., Jr. ,  MATSUDA, Tsukasa ,  YAMAMOTO, Kaoru

Inventor： FAGUET, Jacques ,  CERIO, Frank, M., Jr. ,  MATSUDA, Tsukasa ,  YAMAMOTO, Kaoru

IPC: H01L21/00 ,  H01L21/31 ,  H01L21/322

Abstract: A plasma enhanced atomic layer deposition (PEALD) method and system, the system including a process chamber and a substrate holder provided within the processing chamber and configured to support a substrate on which a predetermined film will be formed. A first process material supply system is configured to supply a first process material to the process chamber, and a second process material supply system configured to supply a second process material to the process chamber in order to provide a reduction reaction with the first process material to form the predetermined film on the substrate. Also included is a power source configured to couple electromagnetic power to the process chamber to generate a plasma within the process chamber to facilitate the reduction reaction, and a chamber component exposed to the plasma and made from a film compatible material that is compatible with the predetermined film deposited on the substrate.

公开(公告)号：WO2006101857A2

公开(公告)日：2006-09-28

申请号：PCT/US2006/009190

申请日：2006-03-15

Applicant: TOKYO ELECTRON LIMITED ,  ISHIZAKA, Tadahiro ,  YAMAMOTO, Kaoru

Inventor： ISHIZAKA, Tadahiro ,  YAMAMOTO, Kaoru

IPC: H01L21/44

CPC classification number: H01L21/28562 ,  C23C16/4554 ,  C23C16/45544 ,  C23C16/5096 ,  H01J2237/022 ,  H01L21/76843 ,  H01L21/76862

Abstract: A method for depositing a film on a substrate using a plasma enhanced atomic layer deposition (PEALD) process includes disposing the substrate in a process chamber configured to facilitate the PEALD process. A first process material is introduced within the process chamber, and a second process material is introduced within the process chamber. Electromagnetic power of more than 600W is coupled to the process chamber during introduction of the second process material in order to generate a plasma that accelerates a reduction reaction between the first and second process materials at a surface of the substrate. The film is formed on the substrate by alternatingly introducing the first process material and the second process material.

Abstract translation: 使用等离子体增强原子层沉积（PEALD）工艺在衬底上沉积膜的方法包括将衬底设置在配置为便于PEALD工艺的处理室中。 在处理室内引入第一处理材料，并且在处理室内引入第二处理材料。 超过600W的电磁功率在引入第二工艺材料期间耦合到处理室，以便产生加速基材表面处的第一和第二工艺材料之间的还原反应的等离子体。 通过交替地引入第一处理材料和第二处理材料，在基板上形成膜。

公开(公告)号：WO1993022359A1

公开(公告)日：1993-11-11

申请号：PCT/EP1993000979

申请日：1993-04-22

Applicant: HOECHST AKTIENGESELLSCHAFT ,  REUSCHEL, Gerhard ,  SABEL, Hans Dieter ,  FLEISCHER, Dietrich ,  YAMAMOTO, Kaoru ,  MAEDA, Nagayoshi ,  KAMIYA, Makoto ,  MURAO, Toshiro

Inventor： HOECHST AKTIENGESELLSCHAFT

IPC: C08G02/28

CPC classification number: C08G2/28

Abstract: A process for producing a polyoxymethylene copolymer by copolymerizing trioxane as a main monomer with a cyclic ether or a cyclic formal as a comonomer by using a cationically active catalyst, wherein an alkali metal fluoride is contacted with the copolymer after the completion of the copolymerization to thereby deactivate the polymerization catalyst. The treatment is effected at a pH-value of >/= 7.0, producing a polyoxymethylene copolymer having an improved heat stability.___________________________________________

Abstract translation: 通过使用阳离子活性催化剂将作为主要单体的三恶烷作为共聚单体与环状醚或环状缩甲醛共聚制备聚甲醛共聚物的方法，其中在共聚完成后使碱金属氟化物与共聚物接触，从而 使聚合催化剂失活。 处理在pH => 7.0时进行，产生具有改善的热稳定性的聚甲醛共聚物。____________________________________________

公开(公告)号：WO1994000517A1

公开(公告)日：1994-01-06

申请号：PCT/JP1993000901

申请日：1993-06-30

Applicant: POLYPLASTICS CO., LTD. ,  SUGIYAMA, Noriyuki ,  MIYAJI, Hiroyuki ,  KAMIYA, Makoto ,  CHISOKU, Arisa ,  YAMAMOTO, Kaoru

Inventor： POLYPLASTICS CO., LTD.

IPC: C08L59/02

CPC classification number: C08L59/02 ,  C08L59/00 ,  C08L61/28 ,  C08L71/00 ,  C08L75/04 ,  C08L61/20 ,  C08L2666/22

Abstract: A polyoxymethylene composition which is improved in thermal stability, little stains the mold even in continuous long-term molding work, and is extremely reduced in the emission of a formaldehyde smell. The composition comprises polyoxymethylene, 0.01-5 wt. % of an antioxidant and 0.01-10 wt.% of a melamine-formaldehyde polycondensate, each based on the polyoxymethylene. The polycondensate to be used is one which is prepared by the reaction of mainly melamine and formaldehyde and contains on average 2.0-10 mol of melamine units per mole, and wherein 3 mol of the amino groups contained in 1 mol of melamine have on average at least 3.0 mol of hydrogen.

Abstract translation: 即使在连续的长期成型加工中，热稳定性提高，模具也几乎没有染色，并且甲醛气味的排放极度降低的聚甲醛组合物。 该组合物包括聚甲醛，0.01-5wt。 ％的抗氧化剂和0.01-10重量％的三聚氰胺 - 甲醛缩聚物，各自基于聚甲醛。 要使用的缩聚物是通过主要是三聚氰胺和甲醛的反应制备的，并且每摩尔含有平均为2.0-10摩尔的三聚氰胺单位，其中3摩尔含有1摩尔三聚氰胺的氨基平均在 至少3.0摩尔的氢。

公开(公告)号：WO1996013535A1

公开(公告)日：1996-05-09

申请号：PCT/JP1995002138

申请日：1995-10-19

Applicant: POLYPLASTICS CO., LTD. ,  KANAI, Hiroyuki ,  SERIZAWA, Hajime ,  OHNISHI, Katsuhei ,  MASUDA, Eiji ,  YAMAMOTO, Kaoru

Inventor： POLYPLASTICS CO., LTD.

IPC: C08G02/30

CPC classification number: C08F290/142 ,  C08F283/06 ,  C08G2/30

Abstract: A modified polyacetal obtained by heating 100 pts.wt. of a polyacetal component (A) together with 0.1 - 30 pts.wt. of a polymerizable compound (B) having a modifying group such as an epoxy, carboxyl or acid anhydride group to thereby introduce the modifying group into the polyacetal. The component (A) includes a polyacetal (A1) selected from among polyoxymethylene homopolymer and copolymers and a polymerizable polyacetal (A2) having functional groups containing a polymerizable unsaturated bond. The efficiency of introduction of the modifying group can be improved by adding 0.01 - 2.5 pts.wt. of a free-radical initiator to 100 pts.wt. in total of the components (A) and (B) and mixing in a state in which the polyacetal is molten. This process ensures simple and efficient introduction of the modifying group into the polyacetal component and improves the affinity of the polyacetal.

Abstract translation: 通过加热100重量份得到的改性聚缩醛 的聚缩醛组分（A）和0.1-30重量份 具有环氧基，羧基或酸酐基等改性基的可聚合化合物（B），从而将改性基团引入到聚缩醛中。 组分（A）包括选自聚甲醛均聚物和共聚物的聚缩醛（A1）和具有含有可聚合不饱和键的官能团的聚合性聚缩醛（A2）。 改性基团的引入效率可以通过加入0.01-2.5重量份来改善。 的自由基引发剂至100重量份 （A）和（B）的组合物，并在聚缩醛熔融的状态下进行混合。 该方法确保将改性基团简单且有效地引入聚缩醛组分中并提高聚缩醛的亲和力。

公开(公告)号：WO2006104863A3

公开(公告)日：2006-10-05

申请号：PCT/US2006/010682

申请日：2006-03-22

Applicant: TOKYO ELECTRON LIMITED ,  ISHIZAKA, Tadahiro ,  MATSUDA, Tsukasa ,  CERIO, Jr., FrankM. ,  YAMAMOTO, Kaoru

Inventor： ISHIZAKA, Tadahiro ,  MATSUDA, Tsukasa ,  CERIO, Jr., FrankM. ,  YAMAMOTO, Kaoru

IPC: C23F1/00 ,  C23C16/00 ,  H01J9/00

Abstract: A plasma enhanced atomic layer deposition (PEALD) system includes a first chamber component coupled to a second chamber component to provide a processing chamber defining an isolated processing space within the processing chamber. A substrate holder is provided within the processing chamber and configured to support a substrate, a first process material supply system is configured to supply a first process material to the processing chamber and a second process material supply system is configured to supply a second process material to the processing chamber. A power source is configured to couple electromagnetic power to the processing chamber, and a sealing assembly interposed between the first and second chamber components. The sealing assembly includes a plurality of sealing members configured to reduce the amount of external contaminants permeating through an interface of the first and second components into the isolated processing space of the processing chamber, wherein the film is formed on the substrate by altematingly introducing the first process material and the second process material.

公开(公告)号：WO2006104863A2

公开(公告)日：2006-10-05

申请号：PCT/US2006010682

申请日：2006-03-22

Applicant: TOKYO ELECTRON LTD ,  ISHIZAKA TADAHIRO ,  MATSUDA TSUKASA ,  CERIO JR FRANKM ,  YAMAMOTO KAORU

Inventor： ISHIZAKA TADAHIRO ,  MATSUDA TSUKASA ,  CERIO JR FRANKM ,  YAMAMOTO KAORU

IPC: C23C16/00

CPC classification number: C23C16/4409 ,  C23C16/4404 ,  C23C16/4412 ,  C23C16/45542 ,  C23C16/45544 ,  C23C16/5096

Abstract: A plasma enhanced atomic layer deposition (PEALD) system includes a first chamber component coupled to a second chamber component to provide a processing chamber defining an isolated processing space within the processing chamber. A substrate holder is provided within the processing chamber and configured to support a substrate, a first process material supply system is configured to supply a first process material to the processing chamber and a second process material supply system is configured to supply a second process material to the processing chamber. A power source is configured to couple electromagnetic power to the processing chamber, and a sealing assembly interposed between the first and second chamber components. The sealing assembly includes a plurality of sealing members configured to reduce the amount of external contaminants permeating through an interface of the first and second components into the isolated processing space of the processing chamber, wherein the film is formed on the substrate by altematingly introducing the first process material and the second process material.

Abstract translation: 等离子体增强原子层沉积（PEALD）系统包括耦合到第二室部件的第一室部件，以提供限定处理室内的隔离处理空间的处理室。 衬底保持器设置在处理室内并且被配置为支撑衬底，第一处理材料供应系统被配置为将第一处理材料供应到处理室，第二处理材料供应系统被配置为将第二处理材料供应到 处理室。 电源被配置为将电磁功率耦合到处理室，以及插入在第一和第二室部件之间的密封组件。 密封组件包括多个密封构件，其被配置为将渗透通过第一和第二部件的界面的外部污染物的量减少到处理室的隔离处理空间中，其中通过替代地将第一 工艺材料和第二工艺材料。

公开(公告)号：WO1992003487A1

公开(公告)日：1992-03-05

申请号：PCT/JP1991001089

申请日：1991-08-15

Applicant: POLYPLASTICS CO., LTD. ,  YAMAMOTO, Kaoru ,  SIWAKU, Toshio

Inventor： POLYPLASTICS CO., LTD.

IPC: C08G02/28

CPC classification number: C08G2/28 ,  C08G2/36

Abstract: A cyclic polyoxymethylene with a number-average molecular weight of 500 to 5,000 is produced by treating an alkali-decomposable linear polyoxymethylene homopolymer in an organic liquid medium containing a cationically active catalyst in solid form at 10 to 150 DEG C for 1 to 500 min to effect cyclization. The reaction mixture obtained by the cyclization is treated with an alkaline medium to remove unreacted linear polyoxymethylene homopolymer by hydrolysis, thus isolating cyclic polyoxymethylene. The product has a narrow molecular weight distribution and is useful as a resin modifier.

Abstract translation: 数均分子量为500〜5000的环状聚甲醛是通过在含有阳离子活性催化剂的固体形式的有机液体介质中，在10〜150℃下处理1〜500分钟的碱分解性线性聚甲醛均聚物1〜500分钟， 效果环化。 通过环化得到的反应混合物用碱性介质处理以通过水解除去未反应的线性聚甲醛均聚物，从而分离环状聚甲醛。 该产品具有窄的分子量分布，可用作树脂改性剂。

公开(公告)号：WO2006104864A3

公开(公告)日：2007-08-09

申请号：PCT/US2006010685

申请日：2006-03-22

Applicant: TOKYO ELECTRON LTD ,  ISHIZAKA TADAHIRO ,  YAMAMOTO KAORU

Inventor： ISHIZAKA TADAHIRO ,  YAMAMOTO KAORU

IPC: C23C16/00

CPC classification number: C23C16/4409 ,  C23C16/4404 ,  C23C16/4412 ,  C23C16/45542 ,  C23C16/45544 ,  C23C16/5096

Abstract: A plasma enhanced atomic layer deposition (PEALD) system includes a processing chamber defining an isolated processing space within the processing chamber, and a substrate holder provided within the processing chamber and configured to support a substrate. A first process material supply system is configured to supply a first process material to the processing chamber, a second process material supply system is configured to supply a second process material to the processing chamber and a power source is configured to couple electromagnetic power to the processing chamber. A contaminant shield is positioned along a periphery of the substrate holder and configured to impede external contaminants that permeate the chamber from traveling to a region of the substrate holder, wherein the film is formed on the substrate by altematingly introducing the first process material and the second process material.

Abstract translation: 等离子体增强原子层沉积（PEALD）系统包括限定处理室内的隔离处理空间的处理室和设置在处理室内并被配置为支撑衬底的衬底保持器。 第一处理材料供应系统被配置为将第一处理材料供应到处理室，第二处理材料供应系统被配置为将第二处理材料供应到处理室，并且电源被配置为将电磁功率耦合到处理 室。 污染物屏蔽沿着衬底保持器的周边定位，并且构造成阻止渗透室的外部污染物移动到衬底保持器的区域，其中膜通过替代地引入第一工艺材料而形成在衬底上，而第二工艺材料 工艺材料。

公开(公告)号：WO2006101857A3

公开(公告)日：2007-07-26

申请号：PCT/US2006009190

申请日：2006-03-15

Applicant: TOKYO ELECTRON LTD ,  ISHIZAKA TADAHIRO ,  YAMAMOTO KAORU

Inventor： ISHIZAKA TADAHIRO ,  YAMAMOTO KAORU

IPC: H01L21/44

CPC classification number: H01L21/28562 ,  C23C16/4554 ,  C23C16/45544 ,  C23C16/5096 ,  H01J2237/022 ,  H01L21/76843 ,  H01L21/76862

Abstract: A method for depositing a film on a substrate using a plasma enhanced atomic layer deposition (PEALD) process includes disposing the substrate in a process chamber configured to facilitate the PEALD process. A first process material is introduced within the process chamber, and a second process material is introduced within the process chamber. Electromagnetic power of more than 600W is coupled to the process chamber during introduction of the second process material in order to generate a plasma that accelerates a reduction reaction between the first and second process materials at a surface of the substrate. The film is formed on the substrate by alternatingly introducing the first process material and the second process material.

Abstract translation: 使用等离子体增强原子层沉积（PEALD）工艺在衬底上沉积膜的方法包括将衬底设置在配置为便于PEALD工艺的处理室中。 在处理室内引入第一处理材料，并且在处理室内引入第二处理材料。 超过600W的电磁功率在引入第二工艺材料期间耦合到处理室，以便产生加速基材表面处的第一和第二工艺材料之间的还原反应的等离子体。 通过交替地引入第一处理材料和第二处理材料，在基板上形成膜。