公开(公告)号：WO1997043689A1

公开(公告)日：1997-11-20

申请号：PCT/JP1997001618

申请日：1997-05-14

Applicant: SEIKO EPSON CORPORATION ,  YUDASAKA, Ichio ,  SHIMODA, Tatsuya ,  KANBE, Sadao ,  MIYAZAWA, Wakao

Inventor： SEIKO EPSON CORPORATION

IPC: G02F01/136

CPC classification number: G02F1/136227 ,  H01L27/12 ,  H01L27/1285 ,  H01L27/1292 ,  H01L29/66757 ,  H01L29/66765 ,  Y10T428/1064 ,  Y10T428/31663

Abstract: Liquid is applied and subjected to a heat treatment to form one thin film among an insulating thin film, a silicon thin film and a conductive thin film constituting a TFT. A substrate is spin-coated with the liquid which contains a thin film component and is supplied from the coating liquid storing part (105) of a spin-coater (102). The substrate to which the coating liquid is applied is subjected to a heat treatment by a heat treatment unit (103) to form a coating film on the substrate. If, further, the coating film is subjected to laser annealing, etc., one of the film qualities, crystallinity, denseness and adhesion is improved. If the coating liquid or resist is applied by an ink-jet method, the utilization efficiency of coating liquid can be improved and, further, a patterned coating film can be formed. A thin film device which is low in cost and has a high throughput can be obtained. By manufacturing TFTs with a manufacturing apparatus having the high utilization efficiency of the coating liquid, the initial investment and the cost of a liquid crystal display are significantly reduced.

Abstract translation: 施加液体并进行热处理以在构成TFT的绝缘薄膜，硅薄膜和导电薄膜中形成一个薄膜。 用包含薄膜成分的液体旋涂基材，并从旋转涂布机（102）的涂液储存部（105）供给基材。 涂布涂布液的基板通过热处理单元（103）进行热处理，以在基板上形成涂膜。 此外，如果涂膜经受激光退火等，则膜质量，结晶度，致密性和粘附性之一得到改善。 如果通过喷墨法涂布涂布液或抗蚀剂，则可以提高涂布液的利用效率，并且还可以形成图案化的涂膜。 可以获得成本低且吞吐量高的薄膜器件。 通过制造具有涂布液利用率高的制造装置的TFT，液晶显示器的初始投入和成本显着降低。

公开(公告)号：WO1998015973A1

公开(公告)日：1998-04-16

申请号：PCT/JP1997003626

申请日：1997-10-08

Applicant: SEIKO EPSON CORPORATION ,  INOUE, Satoshi ,  YUDASAKA, Ichio

Inventor： SEIKO EPSON CORPORATION

IPC: H01L21/336

CPC classification number: H01L27/124 ,  G02F1/13454 ,  H01L23/3672 ,  H01L29/41725 ,  H01L29/41733 ,  H01L29/42384 ,  H01L29/78696 ,  H01L2924/0002 ,  H01L2924/00

Abstract: In a TFT which is provided with a channel area opposed to gate electrodes with a gate insulating film inbetween, a source-drain area connected to the channel area, a source-drain wiring layer which is electrically connected to the source-drain area, and a gate wiring layer which is electrically connected to the gate electrodes on the surface side of a substrate, at least one component composed of a conductive or semiconductor film is provided with an expanded section for radiating heat which is formed by expanding the component itself for improving the heat radiating efficiency of the component.

Abstract translation: 在设置有与栅电极相对的沟道区域的TFT中，栅极绝缘膜位于其间，连接到沟道区的源极 - 漏极区域，与源极 - 漏极区域电连接的源极 - 漏极布线层以及 与基板的表面侧的栅电极电连接的栅极布线层，由导电性或半导体膜构成的至少一个部件设置有用于散热的扩张部，该扩散部通过使部件本身膨胀而形成，以提高 组件的散热效率。

公开(公告)号：WO9948339A8

公开(公告)日：1999-12-23

申请号：PCT/JP9901327

申请日：1999-03-17

Applicant: SEIKO EPSON CORP ,  SEKI SYUNICHI ,  KIGUCHI HIROSHI ,  YUDASAKA ICHIO ,  MIYAJIMA HIROO

Inventor： SEKI SYUNICHI ,  KIGUCHI HIROSHI ,  YUDASAKA ICHIO ,  MIYAJIMA HIROO

IPC: G02B5/20 ,  G09F9/00 ,  G09F9/30 ,  G09F9/33 ,  H01L27/32 ,  H01L33/26 ,  H01L33/42 ,  H01L33/48 ,  H01L51/00 ,  H01L51/40 ,  H01L51/50 ,  H01L51/52 ,  H01L51/56 ,  H05B33/10 ,  H05B33/12 ,  H05B33/14 ,  H05B33/22 ,  H01L27/15 ,  H01L29/78

CPC classification number: H05B33/22 ,  G02B5/201 ,  H01L27/322 ,  H01L27/3246 ,  H01L51/0005 ,  H01L51/0014 ,  H01L51/5284 ,  H01L2251/558 ,  H05B33/10 ,  Y10T428/24802

Abstract: A display, such as an EL device having little variation in film thickness between pixels, and a color filter are disclosed. Arranged on a substrate are pixels formed by an ink-jet method in regions to be coated and partitioned by banks so formed as to satisfy the formulae a>d/4, d/2 t0, c>(1/2)x(d/b) where a is the width of the banks, c is the height of the banks, b is the width of the regions to be coated, d is the diameter of droplets of a liquid material for forming a thin film, and t0 is the thickness of the thin film. A method of modifying the surface is a method comprising forming banks of an organic martial on an inorganic bank forming surface, and performing a plasma processing under an excessive fluorine condition, or a method comprising performing oxygen gas plasma processing of a substrate having banks formed of an organic material, and then performing fluorine-based gas plasma processing.

Abstract translation: 公开了诸如像素之间的薄膜厚度变化很小的EL器件和滤色器的显示器。 在衬底上排列由喷墨方法形成的像素在要被涂布的区域中，并且被形成为满足公式a> d / 4，d / 2 t0，c>（ 1/2）×（d / b）其中a是堤的宽度，c是堤的高度，b是待涂覆区域的宽度，d是用于形成的液体材料的液滴的直径 薄膜，t0是薄膜的厚度。 对表面进行改性的方法包括：在无机堤形成表面上形成有机物的堤岸，并且在过量的氟条件下进行等离子体处理的方法;或者对具有由 有机材料，然后进行基于氟的气体等离子体处理。