Abstract:
A method for improving the heat stability of a film of poly-p-xylylene or a derivative thereof as represented by the general formula (1), which comprises forming a film through chemical deposition from a raw material prepared by mixing a (2.2)-paracyclophane represented by the general formula (2) with an amino-(2.2)-paracyclophane represented by the general formula (3) and by which the heat resistance of the film can be improved without impairing the deposition properties or the economic efficiency; and poly-p-xylylene derivatives improved in heat resistance: (1) [wherein X1 and X2 are each hydrogen, lower alkyl, or halogeno, and they may be the same or different from each other; and n is a degree of polymerization], (2) [wherein X1 and X2 are each the same as defined for the general formula (1)], and (3) [wherein X3 is hydrogen or lower alkyl; and Y1 and Y2 are each hydrogen or amino, with the proviso that both of Y1 and Y2 must be not hydrogen].