公开(公告)号：KR1020000024528A

公开(公告)日：2000-05-06

申请号：KR1020000007922

申请日：2000-02-18

Applicant: 강정구

Inventor： 엄환섭 ,  강정구

IPC: H01L21/205

Abstract: PURPOSE: A glow discharge system producing a plasma of a low gas temperature by using RF(radio frequency) as a providing power in atmospheric pressure is provided to reduce a temperature of a discharge gas simultaneously with generating atmospheric pressure discharge in a weak electric field. CONSTITUTION: A device generates a room temperature plasma of 100-250°C. A glow discharge system is constructed by using an electrical RF discharge system under atmospheric pressure. The device controls arc generation by inserting a dielectric substance between electrodes when the plasma is maintained in atmospheric pressure. The device controls a poisonous gas of industrial factory in a room temperature by using RF discharge system. The device is used to deposit a material by using RF discharge system. A plasma is generated by using RF discharge system. The device is used to a chemical response using an active particle generated in a plasma state.

Abstract translation: 目的：提供通过使用RF（射频）作为大气压力的功率来产生低气体温度的等离子体的辉光放电系统，以在弱电场中产生大气压力放电的同时降低放电气体的温度。 构成：器件产生100-250°C的室温等离子体。 通过在大气压下使用电RF放电系统构成辉光放电系统。 当等离子体保持在大气压下时，该装置通过在电极之间插入电介质来控制电弧产生。 该设备通过使用射频放电系统在室温下控制工业厂房的有毒气体。 该设备用于通过使用RF放电系统沉积材料。 使用RF放电系统产生等离子体。 该装置用于使用在等离子体状态下产生的活性粒子的化学反应。