公开(公告)号：KR1020080008728A

公开(公告)日：2008-01-24

申请号：KR1020060068321

申请日：2006-07-21

Applicant: 삼성전자주식회사

Inventor： 성시준 ,  윤현석 ,  정환경 ,  한정윤

IPC: H01L21/306 ,  H01L21/3063

CPC classification number: H01L21/6708 ,  G02F1/1303

Abstract: A method for manufacturing a flat panel display and an apparatus for shaving an outer surface thereof are provided to etch selectively the required areas of a glass substrate while maintaining characteristics such as high productivity and uniform distribution. An apparatus for shaving an outer surface includes a chamber(280), a cassette(220), a plate(260), a supplier(230), and a storing tank(240). The chamber is used for executing the shaving of an outer surface therein. The cassette is used for moving a glass substrate. The plate installed in the chamber in a vertical direction includes nozzles for spraying etch liquid toward the outer surface of the glass substrate. The nozzles of the plate are used for etching one face of the glass substrate opposite to the plate. The supplier connected to the plate supplies the etch liquid. The storing tank installed in the chamber stores the etch liquid and supplies the etch liquid to the supplier.

Abstract translation: 提供一种用于制造平板显示器的方法和用于剃刮其外表面的设备，用于在保持诸如高生产率和均匀分布的特性的同时选择性地蚀刻玻璃基板的所需区域。 用于剃刮外表面的设备包括室（280），盒（220），板（260），供应器（230）和存储罐（240）。 该室用于在其中执行外表面的剃刮。 盒用于移动玻璃基板。 在垂直方向上安装在室中的板包括用于向玻璃基板的外表面喷射蚀刻液体的喷嘴。 板的喷嘴用于蚀刻与板相对的玻璃基板的一个面。 连接到板的供应商提供蚀刻液体。 安装在室中的储存罐存储蚀刻液体并将蚀刻液体供应给供应商。

公开(公告)号：KR1020080008729A

公开(公告)日：2008-01-24

申请号：KR1020060068322

申请日：2006-07-21

Applicant: 삼성전자주식회사

Inventor： 성시준 ,  윤현석 ,  정환경 ,  한정윤

IPC: H01L21/306 ,  H01L21/3063

CPC classification number: H01L21/6708 ,  G02F1/1303

Abstract: A method for manufacturing a flat panel display and an apparatus for shaving an outer surface thereof are provided to reduce mechanical stress on glass substrates during etching by naturally slipping etch liquid on the glass substrates. An apparatus for shaving outer surface includes a chamber(210), a cassette(230), a cassette controller(240), a nozzle unit(250), and a supply tank(260). The chamber is used for executing the shaving of an outer surface. The cassette is used for moving a glass substrate. The cassette controller tilts the glass substrate mounted on the cassette with respect to a horizontal plane by adjusting the position and angle of the cassette. The nozzle unit installed at an upper portion of the chamber includes nozzles for spraying the etch liquid. The supply tank supplies the etch liquid to the nozzle unit. The cassette controller adjusts the position and angle of the cassette so as to correspond to the glass substrate and nozzles one by one.

Abstract translation: 提供一种用于制造平板显示器的方法和用于剃刮其外表面的设备，以通过在玻璃基板上自然滑动蚀刻液体来减少在蚀刻期间对玻璃基板的机械应力。 用于剃刮外表面的设备包括室（210），盒（230），盒控制器（240），喷嘴单元（250）和供应罐（260）。 该室用于执行外表面的剃刮。 盒用于移动玻璃基板。 盒式磁带控制器通过调节盒的位置和角度来倾斜安装在盒子上的玻璃基板相对于水平面。 安装在室的上部的喷嘴单元包括用于喷射蚀刻液体的喷嘴。 供应罐将蚀刻液体供应到喷嘴单元。 盒式磁带控制器调整盒的位置和角度，以便逐个对应于玻璃基板和喷嘴。

公开(公告)号：KR1020080027567A

公开(公告)日：2008-03-28

申请号：KR1020060092763

申请日：2006-09-25

Applicant: 삼성전자주식회사

Inventor： 성시준 ,  윤현석 ,  정환경 ,  한정윤

IPC: H01L21/306

CPC classification number: H01L21/6708 ,  G02F1/1303

Abstract: An etching apparatus of a substrate is provided to prevent damage of a thin film transistor and maintain the strength thereof by simultaneously etching one side of a first display panel or second display panel. An etch array substrate includes a pad(72) with a display panel attached to one side of the pad, and a support plate(70) provided on both sides of the pad. One side of the display panel is etched by an etchant(92), and the etched array substrate and the etchant are received in a container(90). The display panel has a thin film transistor substrate(50) and a color filter substrate(40), and the pad is attached to any one of the thin film transistor substrate and the color filter substrate.

Abstract translation: 提供了一种基板的蚀刻装置，以防止薄膜晶体管的损坏并通过同时蚀刻第一显示面板或第二显示面板的一侧来保持其强度。 蚀刻阵列衬底包括具有附接到衬垫的一侧的显示面板的衬垫（72）和设置在衬垫两侧的支撑板（70）。 通过蚀刻剂（92）蚀刻显示面板的一侧，并且蚀刻的阵列基板和蚀刻剂被容纳在容器（90）中。 显示面板具有薄膜晶体管基板（50）和滤色器基板（40），并且该焊盘安装在薄膜晶体管基板和滤色器基板中的任一个上。

公开(公告)号：KR1020020028699A

公开(公告)日：2002-04-17

申请号：KR1020000059825

申请日：2000-10-11

Applicant: 삼성전자주식회사

Inventor： 최한규 ,  한정윤 ,  박선종

IPC: H01L21/02

Abstract: PURPOSE: An apparatus for cleaning a semiconductor device is provided to improve productivity and yield of the semiconductor device, by uniformly maintaining the density of cleaning solution in a cleaning bath at all times. CONSTITUTION: The semiconductor device to clean and the cleaning solution are contained in the cleaning bath(10). A compound supply source supplies a compound to the cleaning bath. An electrical conductivity measuring unit(60) measures the electrical conductivity of the cleaning solution in the cleaning bath, and supplies an electrical conductivity data signal corresponding to the measured electrical conductivity. A controller(70) controls the quantity of the compound supplied from the compound supply source to the cleaning bath in response to the electrical conductivity data signal.

Abstract translation: 目的：提供一种用于清洁半导体器件的设备，用于通过在清洁浴中始终均匀地保持清洁溶液的密度来提高半导体器件的生产率和产量。 构成：将清洁的半导体器件和清洁溶液包含在清洗槽（10）中。 复合供应源将化合物提供给清洗浴。 电导率测量单元（60）测量清洗槽中的清洁溶液的电导率，并提供与测量的电导率相对应的电导率数据信号。 控制器（70）响应于电导率数据信号控制从复合供应源供应到清洗槽的化合物的量。