투명 도전막
    2.
    发明公开
    투명 도전막 有权
    透明导电膜

    公开(公告)号:KR1020100022904A

    公开(公告)日:2010-03-03

    申请号:KR1020080114587

    申请日:2008-11-18

    Inventor: 홍승훈 성문규

    CPC classification number: G06F3/0414 G06F3/045 H01B1/04 H01B1/08

    Abstract: PURPOSE: A transparent conductive film including an indium tin oxide material is provided to improve electric conduction and mechanical stability of a touch screen when applied to a touch screen. CONSTITUTION: A transparent conductive film(100) comprises a carbon nanotube network and an indium tin oxide composite. A method for preparing the transparent conductive film comprises the steps of: providing a transparent substrate(102); arranging a metallic carbon nanotube solution on a transparent substrate; forming a metallic carbon nanotube network layer(104) with the metallic carbon nanotube solution; and arranging an indium tin oxide layer(106) on the metallic carbon nanotube network layer.

    Abstract translation: 目的:提供一种包括氧化铟锡材料的透明导电膜,用于在触摸屏上使用时提高触摸屏的导电性和机械稳定性。 构成:透明导电膜(100)包括碳纳米管网络和氧化铟锡复合物。 制备透明导电膜的方法包括以下步骤:提供透明基材(102); 在透明基板上设置金属碳纳米管溶液; 用金属碳纳米管溶液形成金属碳纳米管网络层(104); 以及在所述金属碳纳米管网络层上配置氧化铟锡层(106)。

Patent Agency Ranking