公开(公告)号：KR1020110075699A

公开(公告)日：2011-07-06

申请号：KR1020090132220

申请日：2009-12-28

Applicant: 자동차부품연구원

Inventor： 이명호 ,  송종호 ,  정우영 ,  한형욱

IPC: C23C14/56 ,  C23C14/58 ,  C23C14/34

Abstract: PURPOSE: An apparatus for preparing a high-strength and low-friction thin film using a continuous deposition process is provided to continuously perform laser plasma sputtering vacuum deposition and laser glazing processes. CONSTITUTION: An apparatus for preparing a high-strength and low-friction thin film using a continuous deposition process comprises a sputtering vacuum chamber(10), a high-pressure chamber(30), a pressure adjusting chamber(20), gate valves(40), and a specimen transfer device(50). A first coating is performed in the sputtering vacuum chamber through pulse laser plasma deposition. A second coating is performed in the high-pressure chamber through laser glazing. The pressure adjusting chamber reduces the pressure difference between the laser sputtering process and the laser glazing process. The gate valves are located between the chambers. The specimen transfer device transfers a specimen between the chambers.

Abstract translation: 目的：提供一种使用连续沉积工艺制备高强度和低摩擦薄膜的设备，以连续执行激光等离子体溅射真空沉积和激光玻璃工艺。 构成：使用连续沉积工艺制备高强度和低摩擦薄膜的设备包括溅射真空室（10），高压室（30），压力调节室（20），闸阀（ 40）和样本转移装置（50）。 通过脉冲激光等离子体沉积在溅射真空室中进行第一涂层。 通过激光玻璃在高压室中进行第二次涂覆。 压力调节室降低了激光溅射工艺和激光玻璃制造工艺之间的压力差。 闸阀位于室之间。 样品转移装置在室之间传送试样。