公开(公告)号：KR1020100087740A

公开(公告)日：2010-08-05

申请号：KR1020107012837

申请日：2008-11-18

Applicant: 재단법인서울대학교산학협력재단

Inventor： 홍승훈 ,  김태경

IPC: B82B3/00 ,  G01B21/30 ,  G01B7/34

CPC classification number: B81C1/00206 ,  B81B2201/12 ,  B81C1/0038 ,  G01Q70/18

Abstract: PURPOSE: An adsorption method of a nanostructure and an absorbate using a solid thin film mask is provided to evaporate the nanostructure and the absorbate to the tip of a probe microscope without transforming the tip. CONSTITUTION: An adsorption method of a nanostructure and an absorbate using a solid thin film mask comprises the following steps: evaporating the thin solid film mask(100) on the entire surface of a probe microscope tip(T)(a); rubbing the end of the tip to the solid surface to remove only the thin solid film mask(b); evaporating a linker molecular-film(30) on the entire surface of the tip(c); dipping the probe microscope tip into a nanostructure solution(d); and removing the thin solid film mask(e).

Abstract translation: 目的：提供使用固体薄膜掩模的纳米结构和吸收剂的吸附方法，以将纳米结构和吸收物蒸发到探针显微镜的尖端而不改变尖端。 构成：使用固体薄膜掩模的纳米结构和吸收材料的吸附方法包括以下步骤：在探针显微镜尖端（T）（a）的整个表面上蒸发薄的固体膜掩模（100）; 将尖端的末端摩擦到固体表面以仅去除薄的固体膜掩模（b）; 在尖端（c）的整个表面上蒸发接头分子膜（30）; 将探针显微镜尖端浸入纳米结构溶液（d）; 并除去薄的固体膜掩模（e）。

公开(公告)号：KR1020090015779A

公开(公告)日：2009-02-12

申请号：KR1020070127849

申请日：2007-12-10

Applicant: 재단법인서울대학교산학협력재단

Inventor： 홍승훈 ,  김태경

IPC: B82B3/00 ,  B82B1/00 ,  B82Y40/00

CPC classification number: G01Q70/18

Abstract: An adsorption method of adsorbate and nanostructures using a thin solid film mask is provided to prevent deformation of property of tip and to absorb all adsorbed materials to end part of the tip using sputtering or evaporator without limit of adsorbate and nanostructures. An adsorption method of adsorbate and nanostructures using a thin solid film mask comprises steps of: evaporating a thin solid film mask(100) at a surface of a probe microscope tip(T); frictionizing end part of the probe microscope tip in which the thin solid film mask is evaporated to the solid surface; removing only the thin solid film mask evaporated in the end part of the probe microscope tip of the evaporated thin solid film mask; evaporating a linker molecule film(30) to an entire surface of the probe microscope tip in which the thin solid film mask is removed; dipping probe microscope tip in which the linker molecule film is evaporated in nanostructures solution; absorbing the nanostructures(N) to the linker molecule; and removing the thin solid film mask evaporated in the probe microscope tip.

Abstract translation: 提供使用薄的固体膜掩模的吸附物和纳米结构的吸附方法，以防止尖端的变形，并且使用溅射或蒸发器吸收所有吸附的材料到端部的末端，而不受吸附物和纳米结构的限制。 使用薄固体膜掩模的吸附物和纳米结构的吸附方法包括以下步骤：在探针显微镜尖端（T）的表面上蒸发薄的固体膜掩模（100）; 摩擦化探针显微镜尖端的端部，其中薄的固体膜掩模被蒸发到固体表面; 去除仅在蒸发的薄固体膜掩模的探针显微镜尖端的端部蒸发的薄固体膜掩模; 将接头分子膜（30）蒸发到除去薄固体膜掩模的探针显微镜尖端的整个表面; 浸渍探针显微镜尖端，其中连接分子膜在纳米结构溶液中蒸发; 吸收纳米结构（N）到接头分子; 并且在探针显微镜尖端中除去薄的固体膜掩模。