公开(公告)号：KR100464873B1

公开(公告)日：2005-01-05

申请号：KR1020020071805

申请日：2002-11-19

Applicant: 재단법인서울대학교산학협력재단

Inventor： 이종협 ,  이재호

IPC: C01B33/143

Abstract: PURPOSE: Provided is a method for preparing mesoporous silica having a heterogeneous pore structure which uses a cheap silica precursor such as sodium meta silicate compound and provides the mesoporous silica not causing material transmission resistance. CONSTITUTION: The method comprises steps of (a) hydrating silica precursor in an alkaline solution; (b) dissolving a surfactant in an acid solution to form micelle; (c) reacting the product of step (a) with the product of step (b) and aging a reaction product; and (d) drying and firing the product of the step (d) at a temperature of 400 deg.C for 5 hrs to eliminate the surfactant.

Abstract translation: 目的：提供一种制备具有非均相孔结构的介孔二氧化硅的方法，该介孔二氧化硅使用廉价的二氧化硅前体如偏硅酸钠化合物，并提供不导致材料传输阻力的介孔二氧化硅。 组成：该方法包括以下步骤：（a）在碱性溶液中水合二氧化硅前体; （b）将表面活性剂溶解在酸溶液中以形成胶束; （c）使步骤（a）的产物与步骤（b）的产物反应并老化反应产物; （d）将步骤（d）的产物在400℃的温度下干燥并焙烧5小时以除去表面活性剂。

公开(公告)号：KR1020040043516A

公开(公告)日：2004-05-24

申请号：KR1020020071805

申请日：2002-11-19

Applicant: 재단법인서울대학교산학협력재단

Inventor： 이종협 ,  이재호

IPC: C01B33/143

CPC classification number: C01B33/124 ,  C01P2006/17

Abstract: PURPOSE: Provided is a method for preparing mesoporous silica having a heterogeneous pore structure which uses a cheap silica precursor such as sodium meta silicate compound and provides the mesoporous silica not causing material transmission resistance. CONSTITUTION: The method comprises steps of (a) hydrating silica precursor in an alkaline solution; (b) dissolving a surfactant in an acid solution to form micelle; (c) reacting the product of step (a) with the product of step (b) and aging a reaction product; and (d) drying and firing the product of the step (d) at a temperature of 400 deg.C for 5 hrs to eliminate the surfactant.

Abstract translation: 目的：提供一种制备具有异质孔结构的介孔二氧化硅的方法，其使用廉价的二氧化硅前体如偏硅酸钠化合物，并提供不引起材料透过性的介孔二氧化硅。 方法：该方法包括以下步骤：（a）在碱性溶液中水合二氧化硅前体; （b）将表面活性剂溶解在酸溶液中以形成胶束; （c）使步骤（a）的产物与步骤（b）的产物反应并使反应产物老化; 和（d）在400℃的温度下干燥和烧制步骤（d）的产物5小时以除去表面活性剂。