公开(公告)号：KR1020050101335A

公开(公告)日：2005-10-21

申请号：KR1020057014873

申请日：2004-02-13

Applicant: 제테틱 인스티튜트

Inventor： 힐헨리알렌

IPC: G01B9/02 ,  G02B21/00

CPC classification number: G02B21/0056 ,  G01B9/04 ,  G02B21/0024 ,  G02B21/04

Abstract: An array of conjugated quadratures of fields is measured interferometrically by a confocal interferometer and detector system wherein each conjugated quadratures comprises a difference of conjugated quadratures of fields of beams scattered/reflected or transmitted by a pair of spots in or on a substrate. The array of conjugated quadratures is measured jointly, i. e., simultaneously, and the components of each conjugated quadratures may be measured jointly. Each pair of spots generally has a relative displacement on the order of the three or more times the size of the spots in a direction nominally tangent to the surface of the substrate. The relative phases of the beams subsequently scattered/reflected or transmitted by the pair of spots on/in a substrate may be adjusted as a set by control of a single system parameter so that the conjugated quadratures of the array of conjugated quadratures are nominally zero, i.e., information may be obtained about the substrate with the interferometer and detector system operating in a dark field mode. Operation in a dark field mode leads to both reduced systematic and statistical errors in the information and increased throughput. The information may include the transverse derivative of a profile of one or more surfaces of a substrate; onedimensional, two-dimensional, and three- dimensional transverse differential images of a substrate; critical dimensions of features or artifacts on or in a substrate, and the size and location of sub-wavelength defects in or on a substrate.

Abstract translation: 场共轭正交阵列由共焦干涉仪和检测器系统进行干涉测量，其中每个共轭正交包括由衬底中或衬底上的一对斑点散射/反射或透射的光束的场的共轭正交的差异。 共轭正交阵列共同测量，i。 即，同时地，可以共同测量每个共轭正交的分量。 每对点通常在与基板表面正切的方向上的点的尺寸的三次或更多次的量级上具有相对位移。 可以通过单个系统参数的控制将随后由衬底上/上的一对点散射/反射或发射的光束的相对相位调整为一组，使得共轭正交阵列的共轭正交值名义上为零， 即，可以利用干涉仪和检测器系统在暗场模式下操作来获得关于衬底的信息。 在暗场模式下的操作可以减少信息中的系统和统计误差，并提高吞吐量。 信息可以包括衬底的一个或多个表面的轮廓的横向导数; 衬底的二维，二维和三维横向差分图像; 衬底上或衬底中的特征或伪影的关键尺寸，以及衬底中或衬底上的亚波长缺陷的尺寸和位置。

公开(公告)号：KR1020050114615A

公开(公告)日：2005-12-06

申请号：KR1020057014384

申请日：2004-02-04

Applicant: 제테틱 인스티튜트

Inventor： 힐헨리알렌

IPC: G01B9/02 ,  G02B21/00

CPC classification number: G02B21/0056 ,  G02B21/0024 ,  G02B21/14 ,  G02B27/1086 ,  G02B27/147

Abstract: An interferometric microscope for making interferometric measurements of locations within an object that is in a medium, there being a mismatch between indices of refraction of said object and said medium, the microscope including a source for generating an input beam; an interferometer which is configured to receive the input beam and generate therefrom a measurement beam, to focus the measurement beam onto a selected spot in the object and produce for that selected spot a return measurement beam, and to combine the return measurement beam and a reference beam to produce an interference beam; and a detector system which is positioned to receive the interference beam, wherein the return measurement beam travels along a path from the object to the detector system and wherein the interferometer includes a compensating layer of material positioned in the path of the return measurement beam, the compensating layer producing a mismatch in the index of refraction along the path of the return measurement beam that compensates for the mismatch between the indices of refraction of the object and the medium.

Abstract translation: 一种干涉测量显微镜，用于对位于介质中的物体内的位置进行干涉测量，所述物体和所述介质的折射率不匹配，所述显微镜包括用于产生输入光束的光源; 干涉仪，其被配置为接收输入光束并从中产生测量光束，以将测量光束聚焦到物体中的选定光点上，并为该选定光点产生返回测量光束，并将返回测量光束和参考光 光束产生干涉光束; 以及检测器系统，其被定位成接收所述干涉光束，其中所述返回测量光束沿着从所述物体到所述检测器系统的路径传播，并且其中所述干涉仪包括位于所述返回测量光束的路径中的材料的补偿层， 补偿层产生沿着返回测量光束的路径的折射率的不匹配，其补偿对象和介质的折射率之间的失配。

公开(公告)号：KR1020050114611A

公开(公告)日：2005-12-06

申请号：KR1020057013857

申请日：2004-01-27

Applicant: 제테틱 인스티튜트

Inventor： 힐헨리알렌

IPC: G01B9/02

CPC classification number: G01B9/02007 ,  A45D2008/006 ,  G01B9/02002 ,  G01B9/0201 ,  G01B9/02014 ,  G01B9/02022 ,  G01B9/02042 ,  G01B9/02079 ,  G01B9/04 ,  G01B2290/70 ,  G02B21/0056 ,  G02B21/14 ,  G02B27/017 ,  G02B27/108 ,  G02B27/126 ,  G02B27/143 ,  G02B27/144 ,  G02B27/145

Abstract: An interferometery system (110) for making interferometric measurements of an object, the system including: a beam generation module (124) which during operation delivers an output beam that includes a first beam at a first frequency and a second beam at a second frequency that is different from the first frequency, the first and second beams within the output beam being coextensive, the beam generation module including a beam conditioner (122) which during operation introduces a sequence of different shifts in a selected parameter of each of the first and second beams, the selected parameter selected from a group consisting of phase and frequency; a detector assembly having a detector element (170); and an interferometer constructed to receive the output beam at least a part of which represents a first measurement beam at the first frequency and a second measurement beam at the second frequency, the interferometer further constructed to image both the first and second measurement beams onto a selected spot on the object (160) to produce therefrom corresponding first and second return measurement beams, and to then simultaneously image the first and second return measurement beams onto said detector element (170).

Abstract translation: 一种用于对物体进行干涉测量的干涉仪系统（110），所述系统包括：光束产生模块（124），其在操作期间传送包括第一频率的第一光束和第二频率的第二光束的输出光束， 与第一频率不同的是，输出光束内的第一和第二光束是共同延伸的，光束产生模块包括光束调节器（122），其在操作期间引入第一和第二光束中每一个的选定参数中的不同偏移序列 所述参数选自由相位和频率组成的组; 具有检测器元件（170）的检测器组件; 以及干涉仪，其被构造为接收输出光束，所述输出光束的至少一部分表示第一频率处的第一测量光束和在第二频率处的第二测量光束，所述干涉仪还被构造成将所述第一和第二测量光束成像到所选择的 （160）上产生相应的第一和第二返回测量光束，然后将第一和第二返回测量光束同时成像到所述检测器元件（170）上。

公开(公告)号：KR1020050098940A

公开(公告)日：2005-10-12

申请号：KR1020057015052

申请日：2004-02-19

Applicant: 제테틱 인스티튜트

Inventor： 힐헨리알렌

IPC: G01B9/02

CPC classification number: G01B9/04 ,  G02B21/0024 ,  G02B21/0056 ,  G02B27/108 ,  G02B27/143 ,  G02B27/144 ,  G02B27/145

Abstract: A differential interferometric confocal microscope for measuring an object, the microscope including: a source- side pinhole array; a detector-side pinhole array; and an interferometer that images the array of pinholes of the source-side pinhole array onto a first array of spots located in front of an object plane located near where the object is positioned and onto a second array of spots behind the object plane, wherein the first and second arrays of spots are displaced relative to each other in a direction that is normal to the object plane, the interferometer also (1) imaging the first arrays of spots onto a first image plane tha tis behind the detector-side phinhole array, (2) imaging the first array of spots onto a plane defined by the detector-side pihole array, (3) imaging the second array of spots onto a second image plane that is in front of the detector-side pinhole array, and (4) imaging the second array of spots onto the plane defined by the detector-side pinhole array, wherein each spot of the imaged first array of spots in the first image plane is aligned with a corresponding different spot of the imaged second array of spots in the second image plane and a corresponding different pinhole of the detector-side pinhole array, and wherein each spot of the image first array of spots in the plane defined by the detector-side array coincides with a corresponding different spot of the imaged second array of spots in the plane defined by the detector-side array and coincides with a corresponding different pinhole of the detector-side pinhole array.

Abstract translation: 用于测量物体的差分干涉式共聚焦显微镜，显微镜包括：源极针孔阵列; 检测器侧针孔阵列; 以及干涉仪，其将源侧针孔阵列的针孔阵列成像到位于物体平面附近的物体平面前方的位于第一阵列的位置上，并且位于物平面后面的第二阵列上，其中， 第一和第二阵列阵列在垂直于物平面的方向上相对于彼此移位，干涉仪还（1）将第一阵列阵列成像到检测器侧孔阵列后面的第一图像平面上， （2）将第一阵列的斑点成像到由检测器侧针孔阵列限定的平面上，（3）将第二阵列阵列成像到位于检测器侧针孔阵列前面的第二图像平面上，和（4 ）将第二阵列的斑点成像到由检测器侧针孔阵列限定的平面上，其中第一图像平面中成像的第一阵列阵列的每个点与成像的第二阵列的相对应的不同点对齐 他的第二图像平面和检测器侧针孔阵列的相应不同的针孔，并且其中由检测器侧阵列限定的平面中的图像的第一阵列点的每个点与被成像的第二阵列的相应的不同点重合 由检测器侧阵列限定的平面中的点并且与检测器侧针孔阵列的相应不同的针孔重合。

公开(公告)号：KR1020050098268A

公开(公告)日：2005-10-11

申请号：KR1020057013856

申请日：2004-01-27

Applicant: 제테틱 인스티튜트

Inventor： 힐헨리알렌

IPC: G01B9/02

CPC classification number: G01B9/04 ,  A45D2008/006 ,  G02B21/0056 ,  G02B21/006 ,  G02B27/108 ,  G02B27/143

Abstract: A method of using an interferometric confocal microscope to measure features of a trench or via in a. substrate, wherein the interferometric confocal microscope produces a measurement beam, the method involving: focusing the measurement beam at a selected location at or near the bottom of the trench or via to excite one or more guided-wave modes within the trench or via; measuring properties of a return measurement beam that is produced when the measurement beam is focused at the selected location, wherein the return measurement beam includes a component corresponding to a radiated field from the one or more guided-wave modes that are excited within the trench; and determining the features of the trench or via from the measured properties of the return measurement beam.

Abstract translation: 一种使用干涉式共焦显微镜来测量沟槽或通孔中的特征的方法。 衬底，其中所述干涉式共焦显微镜产生测量光束，所述方法包括：将所述测量光束聚焦在所述沟槽或通孔的底部处或其附近的选定位置处，以激发所述沟槽或通孔内的一个或多个导波模式; 当所述测量光束聚焦在所选择的位置时产生的返回测量光束的测量特性，其中所述返回测量光束包括对应于在所述沟槽内激发的所述一个或多个导波模式的辐射场的分量; 以及从测量的测量光束的测量特性确定沟槽或通孔的特征。

公开(公告)号：KR1020060011938A

公开(公告)日：2006-02-06

申请号：KR1020057013865

申请日：2004-01-27

Applicant: 제테틱 인스티튜트

Inventor： 힐헨리알렌

IPC: G02B21/14 ,  G01B9/02 ,  G02B21/18

CPC classification number: G01B9/02007 ,  A45D2008/006 ,  G01B9/02002 ,  G01B9/0201 ,  G01B9/02014 ,  G01B9/02022 ,  G01B9/02042 ,  G01B9/02079 ,  G01B9/04 ,  G01B2290/70 ,  G02B21/0056 ,  G02B21/14 ,  G02B27/017 ,  G02B27/108 ,  G02B27/126 ,  G02B27/143 ,  G02B27/144 ,  G02B27/145

Abstract: A confocal interferometry system (110) for making measurements of an object (60), the system including an array of pinholes (12) to receive a source beam (24) and act as an array of beamsplitters to separate the source beam into a reference beam and measurement beam.

Abstract translation: 一种用于对物体（60）进行测量的共焦干涉测量系统（110），所述系统包括针孔阵列（12）以接收源光束（24），并且用作分束器阵列以将源光束分离成参考 光束和测量光束。

公开(公告)号：KR1020050119680A

公开(公告)日：2005-12-21

申请号：KR1020057018801

申请日：2004-04-01

Applicant: 제테틱 인스티튜트

Inventor： 힐헨리알렌

IPC: G01B9/02

CPC classification number: G02B21/0056 ,  G01B9/02007 ,  G01B9/02019 ,  G01B9/02029 ,  G01B9/0203 ,  G01B9/02042 ,  G01B9/02069 ,  G01B9/02079 ,  G01J1/58 ,  G01N21/211 ,  G02B17/0808 ,  G03F7/70625

Abstract: An interferometry system for making interferometric measurements of an object (60), the system including a source assembly (18) that generates an input beam; a detector assembly (70) that includes a detector element; and an interferometer that includes a source imaging system (10) that images the input beam onto a spot on or in the object and an object imaging system (110) that images the spot onto the detector element as an interference beam, the object imaging system combining light coming from the spot (26A, 26B) with a reference beam (32A, 32B) to produce the interference beam (34), wherein the source imaging system is characterized by a first aperture stop (12) that defines a first aperture and includes a first phase shifter that introduces a first phase shift in light passing through a first region of the first aperture relative to light passing through a second region of the first aperture, and wherein the object imaging system is characterized by a second aperture stop (12) that defines a second aperture and includes a second phase shifter that introduces a second phase shift in light passing through a first region of the second aperture relative to light passing through a second region of the second aperture.

Abstract translation: 一种用于对物体（60）进行干涉测量的干涉测量系统，所述系统包括产生输入光束的光源组件（18）; 检测器组件（70），其包括检测器元件; 以及干涉仪，其包括将所述输入光束成像到所述物体上或所述物体上的点上的源成像系统（10）和将所述光点作为干涉光束成像到所述检测器元件上的物体成像系统（110），所述物体成像系统 将来自光斑（26A，26B）的光与参考光束（32A，32B）组合以产生干涉光束（34），其中源成像系统的特征在于限定第一孔径的第一孔径光阑（12） 包括第一移相器，其相对于穿过第一孔的第二区域的光，引入通过第一孔的第一区域的光中的第一相移，并且其中物体成像系统的特征在于第二孔径光阑（12 ），其限定第二孔径并且包括第二移相器，其在通过所述第二孔的第一区域的光中引入相对于穿过所述第二孔的第二区域的光的第二相移 第二个光圈。

公开(公告)号：KR1020050108422A

公开(公告)日：2005-11-16

申请号：KR1020057018803

申请日：2004-04-01

Applicant: 제테틱 인스티튜트

Inventor： 힐헨리알렌

IPC: G02B17/00 ,  G02B3/00 ,  G02B3/08

CPC classification number: G02B21/0056 ,  G02B21/0024

Abstract: A method of fabricating a catadioptric lens system, the method involving: fabricating a single catadioptric lens element having a bottom surface and an upper surface, the upper surface having a convex portion and a concave portion, both the convex and concave portions sharing a common axis of symmetry; cutting apart the catadioptric lens element to form 2n pie-shaped segments, wherein n is an integer; and reassembling the 2n pie-shaped segments to form the catadioptric lens system with n of the 2n pie-shaped segments being located above a common plane and the rest of the 2n pie-shaped elements being below the common plane.

Abstract translation: 一种制造反射折射透镜系统的方法，所述方法包括：制造具有底表面和上表面的单个反射折射透镜元件，所述上表面具有凸部和凹部，所述凸部和凹部均具有公共轴线 的对称性 切割反射折射透镜元件以形成2n个饼形片段，其中n为整数; 并且重新组装2n个饼状部分以形成反射折射透镜系统，其中2n个饼状部分中的n个位于公共平面之上，其余的2n个饼状部分位于公共平面之下。

公开(公告)号：KR1020050098952A

公开(公告)日：2005-10-12

申请号：KR1020057015238

申请日：2004-02-19

Applicant: 제테틱 인스티튜트

Inventor： 힐헨리알렌

IPC: G01B9/02

CPC classification number: G01B9/04 ,  G02B21/0024 ,  G02B21/0056 ,  G02B27/108 ,  G02B27/143 ,  G02B27/144 ,  G02B27/145

Abstract: A differential interferometric confocal microscope for measuring an object, the microscope including a source- side pinhole array; a detector-side pinhole array; and an interferometer that images the array of pinholes of the source-side pinhole array onto a first array of spots located in front of an object plane located near where the object is positioned and onto a second array of spots behind the object plane, wherein the first and second arrays of spots are displaced form each othe in both a direction normal to the object plane and a direction parallel to the object plane, the interferometer also imaging the first arrays of spots onto a first image plane that is behind the detector-side pinhole array and imaging the seonc array of spots onto a second image plane that is in front of the detector-side pinhole array wherein each spot of the imaged first array of spots is aligned with a corresponding different spot of the imaged second array of spots and a corresponding different pinhole of the detector-side pinhole array.

Abstract translation: 用于测量物体的差分干涉式共焦显微镜，显微镜包括源极针孔阵列; 检测器侧针孔阵列; 以及干涉仪，其将源侧针孔阵列的针孔阵列成像到位于物体平面附近的物体平面前方的位于第一阵列的位置上，并且位于物平面后面的第二阵列上，其中， 第一和第二阵列阵列在垂直于物平面的方向和平行于物平面的方向上均移位，干涉仪还将第一阵列阵列成像到检测器侧后面的第一图像平面上 针孔阵列并将斑点阵列成像到位于检测器侧针孔阵列前面的第二图像平面上，其中成像的第一阵列阵列的每个点与成像的第二阵列阵列的相应不同点对准，以及 检测器侧针孔阵列的相应不同针孔。