公开(公告)号：KR101146632B1

公开(公告)日：2012-05-16

申请号：KR1020100124952

申请日：2010-12-08

Applicant: 충남대학교산학협력단

Inventor： 김종현 ,  장태석

IPC: H01J37/30 ,  G02F1/1337

Abstract: PURPOSE: An electron beam radiating apparatus and an orientation method of a liquid crystal by the same are provided to form a uniform alignment layer by restricting radiating angle and precisely controlling the radiating angle. CONSTITUTION: A substrate holder fixes a substrate. An electron beam source radiates an electron beam to be tilt to a normal direction of the substrate. A plurality of holes which are parallel to radiation angle of the electron beam is formed on a mask. The diameter of the hole is 0.1 to 10mm. The distance between the holes is 0.1 to 5mm. The mask is additionally installed on the substrate. The mask moves to all directions. The thickness of the mask is 0.5 to 30mm. All areas of the substrate are uniformly aligned by moving the mask to all directions.

Abstract translation: 目的：提供电子束辐射装置及其液晶的取向方法，通过限制辐射角度和精确控制辐射角度形成均匀的取向层。 构成：衬底支架固定衬底。 电子束源辐射电子束以向基板的法线方向倾斜。 在掩模上形成平行于电子束的辐射角的多个孔。 孔的直径为0.1〜10mm。 孔间距离为0.1〜5mm。 掩模另外安装在基板上。 面罩移动到所有方向。 面膜的厚度为0.5〜30mm。 通过将掩模移动到所有方向，衬底的所有区域均匀排列。