公开(公告)号：KR100834729B1

公开(公告)日：2008-06-09

申请号：KR1020060119605

申请日：2006-11-30

Applicant: 포항공과대학교 산학협력단

Inventor： 주원철 ,  김진곤 ,  박민수

IPC: C08J5/22 ,  C08J9/22 ,  C08F212/08 ,  B82B3/00

CPC classification number: G02B1/04 ,  B05D3/0453 ,  B05D5/02 ,  B82Y10/00 ,  B82Y40/00 ,  C03C17/32 ,  C03C2218/328 ,  C08J7/04 ,  C08J7/12 ,  C08J7/123 ,  C08J2429/04 ,  C08J2433/12 ,  C09D5/006 ,  G02B1/111 ,  G03F7/0002 ,  C08L39/08 ,  C08L33/10 ,  C08L53/02 ,  C08L53/00 ,  C08L25/14 ,  C08L25/08

Abstract: Disclosed herein is a method of producing an antireflection thin film using a block copolymer and an antireflection thin film prepared by the method. Specifically, the present invention relates to a method of producing a nanoporous antireflection film by spin-coating using a block copolymer solution and subsequent processing and a preparation by the method. The antireflection film of the present invention is prepared by coating a substrate with a block copolymer and selectively removing at least one block in the coated block copolymer to produce a nanoporous thin film with a pore size of 5 to 100 nm. When the thin film is applied to a substrate, an antireflection substrate which has a very low reflectance within a broad range of wavelength can be prepared.

公开(公告)号：KR1020080049244A

公开(公告)日：2008-06-04

申请号：KR1020060119605

申请日：2006-11-30

Applicant: 포항공과대학교 산학협력단

Inventor： 주원철 ,  김진곤 ,  박민수

IPC: C08J5/22 ,  C08J9/22 ,  C08F212/08 ,  B82B3/00

CPC classification number: G02B1/04 ,  B05D3/0453 ,  B05D5/02 ,  B82Y10/00 ,  B82Y40/00 ,  C03C17/32 ,  C03C2218/328 ,  C08J7/04 ,  C08J7/12 ,  C08J7/123 ,  C08J2429/04 ,  C08J2433/12 ,  C09D5/006 ,  G02B1/111 ,  G03F7/0002 ,  C08L39/08 ,  C08L33/10 ,  C08L53/02 ,  C08L53/00 ,  C08L25/14 ,  C08L25/08

Abstract: A method for preparing a porous thin film, and an antireflective thin film prepared by the method are provided to reduce the reflectivity in a wide wavelength range. A method for preparing a porous thin film comprises the steps of coating a block copolymer, and selectively removing at least one block to prepare an irregular network structured porous thin film having a size of 5-100 nm. Also the method for preparing a porous thin film comprises the steps of coating a block copolymer on a substrate, and selectively removing at least one block of the coated block copolymer. Preferably the block copolymer is selected from a linear block copolymer and a graft block copolymer; and the block copolymer is coated by spin coating, bar coating or roll coating.

Abstract translation: 提供一种制备多孔薄膜的方法和通过该方法制备的抗反射薄膜，以减小宽波长范围内的反射率。 制备多孔薄膜的方法包括以下步骤：涂覆嵌段共聚物，并选择性地除去至少一个嵌段以制备尺寸为5-100nm的不规则网状结构的多孔薄膜。 制备多孔薄膜的方法还包括以下步骤：在基材上涂布嵌段共聚物，并选择性地除去至少一块涂布的嵌段共聚物。 嵌段共聚物优选选自直链嵌段共聚物和接枝嵌段共聚物; 并且通过旋涂，棒涂或辊涂来涂覆嵌段共聚物。