公开(公告)号：KR100513966B1

公开(公告)日：2005-09-13

申请号：KR1020020080671

申请日：2002-12-17

Applicant: 학교법인 포항공과대학교

Inventor： 이승섭 ,  홍종간

IPC: H01L21/027

Abstract: 본 발명은 유리기판 상에 MEMS 공정기술을 이용하여 고효율의 보일링 표면 및 그 제작방법을 개시한 것으로, 유리기판 위에 제 1 금속 박막을 소정 두께로 증착하는 공정과, 증착된 제 1 금속 박막을 포토-리소그라피 공정을 통해 열선과 패드를 형성하는 공정과, 열선 위에 제 1 음성 감광재를 소정 두께로 도포하고 노광하여 제 1 캐비티 구조물을 형성하는 공정과, 제 1 캐비티 구조물 위에 제 2 금속 박막을 소정 두께로 증착하는 공정과, 제 2 금속 박막 위에 제 2 음성 감광재를 소정 두께로 도포하고 패터닝하여 제 2 캐비티 구조물을 형성하는 공정과, 드러난 제 2 금속 박막을 식각하는 공정과, 제 2 금속 박막의 식각을 통해 드러난 부분을 통해 제 1 음성 감광재를 현상하여 제거하는 공정을 포함하는 것을 특징으로 한다.

公开(公告)号：KR100473815B1

公开(公告)日：2005-03-14

申请号：KR1020037002116

申请日：2001-06-14

Applicant: 학교법인 포항공과대학교

Inventor： 남홍길 ,  이승섭 ,  윤재영 ,  문상준

IPC: C12Q1/68

Abstract: 대전 분자의 공간 위치를 전자적으로 제어하는 방법 및, 장치가 개시된다. 개시된 방법은 반응 유니트내에서 대전 분자의 공간 위치를 제어하는 것에 관한 것인데, 복수개의 전극들이 배치되고, 전극 배치의 기하는 원형, 사각형 또는 다이아몬드 형상과 같은 폐쇄 시스템이다. 이러한 제어는 대전 분자의 이송뿐만 아니라 대전 분자의 개별적인 종들의 선택적인 분리로 확장된다. 본 발명은 핵산 혼성화, 핵산 증폭, 샘플 준비, 항체/항원 반응, 임상학적 진단 및, 생물 폴리머의 합성과 같은 분자 생물학 반응에서 유용하다.

公开(公告)号：KR100441893B1

公开(公告)日：2004-07-27

申请号：KR1020020045954

申请日：2002-08-03

Applicant: 학교법인 포항공과대학교

Inventor： 이승섭 ,  문상준 ,  남홍길 ,  윤재영

IPC: C12M1/40

Abstract: PURPOSE: Provided is a nucleic acid separation device using MEMS(micro electro mechanical system). Also, provided are a nucleic acid separation method and a manufacture method of the nucleic acid separation device. Therefore, pure nucleic acid is effectively separated and purified from a sample. CONSTITUTION: An extreme super mini nucleic acid separation device comprises a heating and sensing part placed on the base plate to generate and sense heat; an electrode part placed on the heating and sensing part to generate electric field; a solid phase filtering part placed on the electrode part to bind nucleic acid; a reaction vessel surrounding the solid filtering part and forming a space for the reaction; and an inlet and an outlet of a sample connected to the reaction vessel.

Abstract translation: 目的：提供一种使用MEMS（微机电系统）的核酸分离装置。 此外，提供了核酸分离装置的核酸分离方法和制造方法。 因此，纯化的核酸可以有效地从样品中分离和纯化。 构成：极端超小型核酸分离装置包括放置在底板上的加热和感测部分，以产生和感测热量; 放置在加热和感测部件上以产生电场的电极部件; 放置在电极部分上以结合核酸的固相过滤部分; 围绕固体过滤部件并形成反应空间的反应容器; 以及连接到反应容器的样品的入口和出口。

公开(公告)号：KR1020030097008A

公开(公告)日：2003-12-31

申请号：KR1020020034129

申请日：2002-06-18

Applicant: 학교법인 포항공과대학교

Inventor： 이승섭 ,  오현석 ,  이광철 ,  이상훈

IPC: B25J15/06

Abstract: PURPOSE: A micro-gripper using an electrostatic force is provided to reduce the size and manufacturing costs of the micro-gripper. CONSTITUTION: A micro-gripper(100) using an electrostatic force is composed of outer and inner electrodes(115,116) mounted at a board(105) and fixing an object by electrostatic force, at least one elastic support unit(221) connected to the board and supporting the inner electrode, and a micro-actuator(225) formed at the board. The micro-actuator moves the inner electrode away from the object, and puts the object on the desired position.

Abstract translation: 目的：提供使用静电力的微型夹具，以减小微型夹具的尺寸和制造成本。 构成：使用静电力的微型抓持器（100）由安装在板（105）上的外部和内部电极（115,116）以及通过静电力固定物体组成，至少一个弹性支撑单元（221）连接到 板和支撑内电极，以及形成在电路板上的微致动器（225）。 微型致动器将内部电极远离物体移动，并将物体放置在所需位置。

公开(公告)号：KR1020030056591A

公开(公告)日：2003-07-04

申请号：KR1020010086855

申请日：2001-12-28

Applicant: 학교법인 포항공과대학교 ,  엘지전자 주식회사

Inventor： 이승섭 ,  이광철

IPC: G02F1/1335

Abstract: PURPOSE: A method for manufacturing a light guide panel mold of an LCD(Liquid Crystal Display) backlight unit is provided to produce a mold for a light guide panel of excellent surface roughness by using X-ray exposure and to make the mass production of light guide panels. CONSTITUTION: A method for manufacturing a light guide panel mold of an LCD comprises the steps of bonding an X-ray photoresist panel(13) on the upper portion of a substrate(11), forming a mask pattern with an X-ray absorbing material, exposing the X-ray photoresist in slope angles of different directions two times, forming a light guide structure on the substrate by developing the exposed X-ray photoresist, forming a thick metal layer on the substrate, and removing the light guide structure patter and substrate.

Abstract translation: 目的：提供一种用于制造LCD（液晶显示器）背光单元的导光板模具的方法，以通过使用X射线曝光来制造具有优异表面粗糙度的导光板的模具，并使大量生产光 导板。 构成：用于制造LCD的导光板模具的方法包括以下步骤：在基板（11）的上部上粘合X射线光致抗蚀剂板（13），用X射线吸收材料形成掩模图案 ，将X射线光致抗蚀剂以不同方向的倾斜角度曝光两次，通过显影曝光的X射线光致抗蚀剂在基板上形成导光结构，在基板上形成厚的金属层，并且去除导光结构图案， 基质。

公开(公告)号：KR1020030028129A

公开(公告)日：2003-04-08

申请号：KR1020010060127

申请日：2001-09-27

Applicant: 학교법인 포항공과대학교

Inventor： 이승섭 ,  이성근 ,  이석우

IPC: B29D11/00

CPC classification number: B29D11/0074 ,  B29C33/42 ,  B29C45/2602 ,  G03F7/2039 ,  G03F7/70691

Abstract: PURPOSE: Method for making micro prism array molding is provided to offer a mold which may make an optical prism having a predetermined pattern using a synchrotron radiant light(or X-ray). CONSTITUTION: Method for making micro prism array molding which may conduct injection molding of optical prism array by using LIGA(in German, Lithoraphic, Galvanoformung, Abformung) process comprises an inclined exposure step of conducting inclined exposure in several times using X-ray(7) mask; a PMMA(polymethylmethacrylate)(2) making step of making a PMMA having a desired prism array by developing an exposed test piece; and an obtaining step of a nickel molding for plating nickel on the prepared PMMA and then melting the PMMA to eliminate a silicon substrate(4) so that a nickel molding having prism array is obtained.

Abstract translation: 目的：提供用于制造微棱镜阵列成型的方法，以提供可以使用同步辐射光（或X射线）制造具有预定图案的光学棱镜的模具。 构成：使用LIGA（德语，Lithoraphic，Galvanoformung，Abformung）工艺制造可以进行光学棱镜阵列的注射成型的微棱镜阵列成型方法包括使用X射线（7次）进行多次倾斜曝光的倾斜曝光步骤 ）面具; PMMA（聚甲基丙烯酸甲酯）（2）通过显影暴露的试验片来制造具有所需棱镜阵列的PMMA的步骤; 以及用于在所制备的PMMA上镀镍的镍成型体的获得步骤，然后熔融PMMA以消除硅衬底（4），从而获得具有棱镜阵列的镍成型体。

公开(公告)号：KR1020030006896A

公开(公告)日：2003-01-23

申请号：KR1020010071691

申请日：2001-11-19

Applicant: 학교법인 포항공과대학교

Inventor： 이승섭 ,  이성근 ,  이광철

IPC: G03C5/16

CPC classification number: G03F7/00 ,  G03F7/0005 ,  G03F7/38 ,  Y10S430/146 ,  Y10S430/168

Abstract: PURPOSE: A method for preparing the structure by using a light source of high energy is provided, to allow a micro lens to be produced massively without using a mask in the exposure process. CONSTITUTION: The method comprises the steps of exposing a photosensitive material(116) with an X-ray by using a mask defining the pattern of a structure; and heating the photosensitive material to melting the surface of the exposed photosensitive material(118) selectively, thereby preparing a structure having a certain pattern. Preferably the X-ray is an X-ray of synchrotron radiation. Also the method comprises the steps of adjusting the laser source to a photosensitive material of the zone to be formed into a structure and exposing it; and heating the photosensitive material to melting the surface of the exposed photosensitive material selectively, thereby preparing a structure having a certain pattern. The laser exposure is carried out at an energy level of 2.4-180 mJ/pulse and at a frequency of 10 Hz for 3-180 min.

Abstract translation: 目的：提供一种通过使用高能量光源制备该结构的方法，以允许在曝光过程中不使用掩模大量地生产微透镜。 构成：该方法包括以下步骤：通过使用限定结构图案的掩模，用X射线曝光感光材料（116）; 并且选择性地加热感光材料以熔化曝光的感光材料（118）的表面，由此制备具有某种图案的结构。 优选地，X射线是同步加速器辐射的X射线。 此外，该方法包括以下步骤：将激光源调整到要形成结构并将其曝光的区域的感光材料; 并且选择性地加热感光材料以熔化曝光的感光材料的表面，由此制备具有某种图案的结构。 激光曝光在2.4-180mJ /脉冲的能量水平和10Hz的频率下进行3-180分钟。

公开(公告)号：KR100318545B1

公开(公告)日：2001-12-24

申请号：KR1019990059170

申请日：1999-12-20

Applicant: 학교법인 포항공과대학교

Inventor： 이승섭 ,  오동영 ,  이상훈

IPC: G02F1/1335

Abstract: 본발명은액정소자의백 라이트유닛금형제조방법을개시한다. 본발명은기판위에금속층을증착하는단계와, 금속층위에 PMMA를도포하는단계와, PMMA의표면을경면으로가공(polishing)하는단계와, PMMA 표면에전기도금을위한전도층을증착하는단계와, 전도층위에감광막을도포하는단계와, 감광막에 X-선마스크형상을갖는자외선(UV) 마스크로노광및 현상하여감광막을패터닝하는단계와, 패터닝된감광막위에 X-선흡수층을전기도금공정으로도금하여 X-선마스크를형성하는단계와, 불필요한감광막을제거하는단계와, X-선마스크가형성된기판을좌우방향으로각각 PMMA에경사진입사각으로노광한후 현상하여삼각산맥형상을형성하는단계와, 삼각산맥형상의 PMMA 위에전기도금을위한전도층을증착하는단계와, 용기용매로 PMMA를녹이는단계를포함한다. 본발명에따르면, 방사광가속기의 X-선을이용하는 LIGA 공정을이용하여표면조도가뛰어나고, 기존기계절삭가공방법보다손쉽게액정소자의백 라이트유닛의사출성형에필요한금형을제작하는효과를얻을수 있다.

公开(公告)号：KR1020010091195A

公开(公告)日：2001-10-23

申请号：KR1020000012629

申请日：2000-03-14

Applicant: 학교법인 포항공과대학교

Inventor： 김지우 ,  이승섭 ,  권오대

IPC: H01L21/18

Abstract: PURPOSE: A structure and a method of manufacturing a turnable wavelength selector are provided to form a turnable wavelength selector by using a DFB(Distributed FeedBack) theory and a MEMS(Micro-Electro Mechanical System) technique in a semiconductor laser. CONSTITUTION: A turnable wavelength selector is formed with a grating(2), an anchor(6,8), and an SDA(Scratch Drive Actuator)(4). The grating(2) as a waveguide is formed by an optical fiber. An incident microwave or light wave passes through the waveguide. The incident microwave or the incident light wave is reflected or transmitted partially by the grating(2). A wavelength of a wave passing the waveguide is determined according to a period of the grating(2). Only center wavelength is passes through in a wavelength band. A desired wavelength is obtained if one part of the grating(2) is fixed and the other is shifted by the SDA(4).

Abstract translation: 目的：提供一种制造可转换波长选择器的结构和方法，以通过在半导体激光器中使用DFB（分布式反馈）理论和MEMS（微机电系统）技术形成可转换波长选择器。 构成：可旋转的波长选择器由光栅（2），锚（6,8）和SDA（划痕驱动致动器）（4）形成。 作为波导的光栅（2）由光纤形成。 入射的微波或光波通过波导。 入射微波或入射光波被光栅（2）部分反射或透射。 根据光栅（2）的周期来确定通过波导的波的波长。 只有中心波长在波长带中通过。 如果光栅（2）的一部分是固定的并且另一部分被SDA（4）偏移，则获得期望的波长。

公开(公告)号：KR1020010064825A

公开(公告)日：2001-07-11

申请号：KR1019990059170

申请日：1999-12-20

Applicant: 학교법인 포항공과대학교

Inventor： 이승섭 ,  오동영 ,  이상훈

IPC: G02F1/1335

CPC classification number: G02F1/133524 ,  G02B6/0065 ,  G02F1/1303

Abstract: PURPOSE: A method for fabricating a back light unit metallic mold of a liquid crystal display is provided to mold the back light unit of the LCD with an X-ray lithography technology using a synchrotron radiation of a radiation accelerator and an ELECTRO-forming process. CONSTITUTION: A titanium(2) is deposited on a silicon substrate(1) using a thermal evaporator. After spin-coating a liquid phase PMMA on the silicon substrate, it is annealed at 180 deg.C for one hour. A PMMA plate of 1mm thickness is bonded with the liquid phase PMMA on the silicon substrate and then 1 kg weight is applied for three hours. The 1mm PMMA plate is lapped and polished to have 100 micrometer thickness. And, Cr and Au used as a conductive layer are deposited on the surface of a PMMA(3). And, a photo resist is spin-coated and is annealed on a hot plate. After exposing a UV ray, the photo resist is developed. Then, an X-ray absorb layer is obtained by an ELECTRO-forming. The unnecessary photo resist is removed. An X-ray from the radiation accelerator is exposed to the PMMA. Then, a titanium(10) for nickel plating is deposited on the PMMA pattern, and a nickel metallic mold is obtained by removing the silicon substrate by dissolving the PMMA with an organic solvent.

Abstract translation: 目的：提供一种用于制造液晶显示器的背光单元金属模的方法，用X射线光刻技术，使用辐射加速器的同步加速器辐射和ELECTRO形成工艺来模制LCD的背光单元。 构成：使用热蒸发器将钛（2）沉积在硅衬底（1）上。 在硅衬底上旋涂液相PMMA后，在180℃退火1小时。 将1mm厚度的PMMA板与硅衬底上的液相PMMA结合，然后施加1kg重量3小时。 将1mm的PMMA板研磨并抛光至100微米厚。 并且，用作导电层的Cr和Au沉积在PMMA（3）的表面上。 并且，将光致抗蚀剂旋涂并在热板上进行退火。 曝光紫外线后，显影光刻胶。 然后，通过电成型获得X射线吸收层。 去除不必要的光刻胶。 来自辐射促进器的X射线暴露于PMMA。 然后，在PMMA图案上沉积镍电镀用钛（10），通过用有机溶剂溶解PMMA，除去硅基板而得到镍金属模具。