公开(公告)号：KR1020090007168A

公开(公告)日：2009-01-16

申请号：KR1020070070867

申请日：2007-07-13

Applicant: 한국과학기술연구원

Inventor： 김주선 ,  이해원 ,  이종호 ,  최선희 ,  조태신 ,  오건석

IPC: C23C14/00 ,  C23C14/58

Abstract: A manufacturing method of a porous thin film is provided to enable the porous thin film to be applied to an SOFC(Solid Oxide Fuel Cell) operated at high temperatures, and to obtain excellent adhesion with a substrate by manufacturing a porous thin film having a porous structure even at high temperatures, and the porous thin film manufactured by the same is provided. A manufacturing method of a porous thin film comprises: depositing reactive gas together with a thin film material using a thin film deposition process to form a thin film; removing the reactive gas from the thin film through heat treatment; and crystallizing the thin film to obtain a porous thin film. The thin film deposition process is one selected from sputtering, vapor deposition, ion plating, and PLD(Pulsed Laser Deposition) methods.

Abstract translation: 提供一种多孔薄膜的制造方法，以使多孔薄膜能够应用于在高温下操作的SOFC（固体氧化物燃料电池），并且通过制造具有多孔薄膜的多孔薄膜来获得与基材的优异粘附性 结构即使在高温下也是这样，并且提供了由其制造的多孔薄膜。 多孔薄膜的制造方法包括：使用薄膜沉积工艺将薄膜材料与薄膜材料一起沉积以形成薄膜; 通过热处理从薄膜中除去反应气体; 并使该薄膜结晶，得到多孔薄膜。 薄膜沉积工艺是从溅射，气相沉积，离子镀和PLD（脉冲激光沉积）方法中选择的。