公开(公告)号：KR1020090072645A

公开(公告)日：2009-07-02

申请号：KR1020070140816

申请日：2007-12-28

Applicant: 한국과학기술연구원 ,  국민대학교산학협력단

Inventor： 김두일 ,  이석헌 ,  오성모 ,  정승훈 ,  조진우 ,  손진식

IPC: C02F1/44 ,  C02F1/32 ,  B01D61/02 ,  C02F103/08

CPC classification number: Y02A20/131 ,  C02F1/444 ,  B01D61/02 ,  C02F1/325 ,  C02F2103/08

Abstract: An apparatus for desalinating seawater by reverse osmosis is provided to minimize a biofouling phenomenon by applying consecutively a chlorinating method and an UV curing method, and to restrict generation of a disinfection byproduct. An apparatus for desalinating seawater by reverse osmosis includes water receiving part(110), a pre-processing part(120), a microbial sterilization part(130) and a reverse osmosis membrane(150). The pre-processing part removes organic compounds, colloid, and microorganisms. The microbial sterilization part sterilizes the microorganisms included in the seawater. The reverse osmosis membrane produces fresh water from the seawater. The microbial sterilization part is comprised of a chlorination processing unit(131) and an ultraviolet processing part(132). The apparatus for desalinating seawater further includes a chemical injection part(140).

Abstract translation: 提供了通过反渗透使海水脱盐的装置，通过连续应用氯化方法和UV固化方法来最小化生物污损现象，并限制消毒副产物的产生。 用于通过反渗透使海水脱盐的装置包括受水部（110），预处理部（120），微生物灭菌部（130）和反渗透膜（150）。 预处理部分除去有机化合物，胶体和微生物。 微生物灭菌部件将包含在海水中的微生物灭菌。 反渗透膜从海水中产生淡水。 微生物灭菌部由氯化处理单元（131）和紫外线处理部（132）构成。 用于海水淡化的设备还包括化学喷射部分（140）。

公开(公告)号：KR100971499B1

公开(公告)日：2010-07-21

申请号：KR1020070140816

申请日：2007-12-28

Applicant: 한국과학기술연구원 ,  국민대학교산학협력단

Inventor： 김두일 ,  이석헌 ,  오성모 ,  정승훈 ,  조진우 ,  손진식

IPC: C02F1/44 ,  C02F1/32 ,  B01D61/02 ,  C02F103/08

CPC classification number: Y02A20/131

Abstract: 본 발명은 염소 처리 방법과 자외선 처리 방법을 순차적으로 적용함으로써 바이오 파울링 현상을 최소화하고 소독부산물의 발생을 억제할 수 있는 역삼투법을 이용한 해수 담수화 처리장치에 관한 것으로서, 본 발명에 따른 역삼투법을 이용한 해수 담수화 처리장치는 해수를 취수하는 취수부와, 취수된 해수에 포함되어 있는 유기물, 콜로이드, 미생물 등을 1차적으로 제거하는 역할을 하는 전처리부와, 상기 전처리부를 거친 해수 내에 포함되어 있는 미생물을 살균하는 역할을 하는 미생물 살균부와, 상기 미생물 살균부를 거친 해수로부터 담수를 생산하는 역할을 하는 역삼투막을 포함하여 이루어지며, 상기 미생물 살균부는 순차적으로 배치되는 염소 소독 처리부와 자외선 처리부로 구성되며, 상기 염소 소독 처리부는 해수에 염소를 투입하여 해수 내의 미생물을 제거하는 역할을 하며, 상기 자외선 처리부는 자외선 램프를 이용하여 해수 내의 미생물을 제거하는 역할을 수행하는 것을 특징으로 한다.
역삼투, 염소, 자외선, 순차소독

公开(公告)号：KR1020030035499A

公开(公告)日：2003-05-09

申请号：KR1020010067599

申请日：2001-10-31

Applicant: 한국과학기술연구원 ,  주식회사 스위치코리아

Inventor： 박민 ,  김준경 ,  이건웅 ,  정승훈

IPC: H05K9/00

CPC classification number: H05K9/0083 ,  H04B1/3888

Abstract: PURPOSE: A method for shielding electromagnetic interference waves by using form-in-place type electrically conductive silicone pastes is provided to be capable of finding a viscosity condition suitable for form-in-place of a paste having a very low volume resistivity. CONSTITUTION: An application-type silicon paste is formed to have the viscosity over 3000 Pa.s at the shear velocity below 0.1/sec and the viscosity over 100 Pa.s at the shear velocity below 100/sec and has a volume resistivity below 0.01 ohm.cm. The application-type silicon paste contains a conductive metal particle over 80 weight% and a silicon component below 20 weight%. The conductive metal particle is adjusted to have a diameter below 7 micrometers, a distribution degree over 4 and a shaping rate over 1.

Abstract translation: 目的：提供一种通过使用现场形式的导电硅胶浆来屏蔽电磁干扰波的方法，以便能够找到适合于具有非常低体积电阻率的糊状物的适当形式的粘度条件。 构成：形成应用型硅浆料，其剪切速度低于0.1 /秒，粘度超过3000Pa·s，粘度超过100Pa·s，剪切速度低于100 /秒，体积电阻率低于0.01 欧·厘米。 应用型硅浆含有超过80重量％的导电金属颗粒和低于20重量％的硅组分。 将导电金属颗粒调节至直径小于7微米，分布度大于4，成型速率高于1。

公开(公告)号：KR100403549B1

公开(公告)日：2003-10-30

申请号：KR1020010067599

申请日：2001-10-31

Applicant: 한국과학기술연구원 ,  주식회사 스위치코리아

Inventor： 박민 ,  김준경 ,  이건웅 ,  정승훈

IPC: H05K9/00

Abstract: PURPOSE: A method for shielding electromagnetic interference waves by using form-in-place type electrically conductive silicone pastes is provided to be capable of finding a viscosity condition suitable for form-in-place of a paste having a very low volume resistivity. CONSTITUTION: An application-type silicon paste is formed to have the viscosity over 3000 Pa.s at the shear velocity below 0.1/sec and the viscosity over 100 Pa.s at the shear velocity below 100/sec and has a volume resistivity below 0.01 ohm.cm. The application-type silicon paste contains a conductive metal particle over 80 weight% and a silicon component below 20 weight%. The conductive metal particle is adjusted to have a diameter below 7 micrometers, a distribution degree over 4 and a shaping rate over 1.

Abstract translation: 目的：提供一种通过使用就地型导电硅酮糊来屏蔽电磁干扰波的方法，其能够找到适合于体积电阻率非常低的糊就地形成的粘度条件。 组成：应用型硅膏的形成在低于0.1 /秒的剪切速度下具有超过3000帕·秒的粘度，并且在低于100 /秒的剪切速度下粘度超过100帕·秒，并且体积电阻率低于0.01 欧·厘米。 应用型硅膏包含超过80重量％的导电金属颗粒和低于20重量％的硅组分。 导电金属颗粒被调整为具有低于7微米的直径，分布度超过4并且成形率超过1。

公开(公告)号：KR1020010079360A

公开(公告)日：2001-08-22

申请号：KR1020010040887

申请日：2001-07-09

Applicant: 한국과학기술연구원 ,  주식회사 스위치코리아

Inventor： 박민 ,  김준경 ,  이건웅 ,  정승훈

IPC: H01B1/04

Abstract: PURPOSE: A conductive silicon paste is provided to realize a conductive paste having a high shielding efficiency, apply the conductive paste to high precision machines and prevent damage of the precision machines due to heat. CONSTITUTION: A conductive metal particle has a number average diameter of less than 7μm and a number average degree of dispersion of more than 4. A silicon component is a room temperature dry lamination type one-part silicon resin. The metal particle may have a number average diameter of less than 5μm and a number average degree of dispersion of more than 5. The conductive metal particle is selected from the group consisting of silver, silver-coated copper, nickel, silver-coated nickel and their mixture. The metal particle is preprocessed with an organic acid and glycerol mixture. The conductive silicon paste is used by generating an induced electron after the metal particle is mechanically crushed. The conductive silicon paste is used for shielding an electromagnetic wave of an electromagnetic appliance.

Abstract translation: 目的：提供导电硅膏，以实现高屏蔽效率的导电膏，将导电浆涂抹于高精度机器上，防止精密机器受热损伤。 构成：导电金属颗粒的数均粒径小于7μm，数均分散度大于4.硅组分是室温干层压型单组分硅树脂。 金属颗粒的数均粒径可以小于5μm，数均分散度大于5.导电金属颗粒选自银，镀银铜，镍，镀银镍和 他们的混合物。 金属颗粒用有机酸和甘油混合物预处理。 在金属颗粒被机械破碎之后，通过产生感应电子来使用导电硅浆。 导电硅浆用于屏蔽电磁设备的电磁波。

公开(公告)号：KR100390638B1

公开(公告)日：2003-07-07

申请号：KR1020010040887

申请日：2001-07-09

Applicant: 한국과학기술연구원 ,  주식회사 스위치코리아

Inventor： 박민 ,  김준경 ,  이건웅 ,  정승훈

IPC: H01B1/04

Abstract: PURPOSE: A conductive silicon paste is provided to realize a conductive paste having a high shielding efficiency, apply the conductive paste to high precision machines and prevent damage of the precision machines due to heat. CONSTITUTION: A conductive metal particle has a number average diameter of less than 7μm and a number average degree of dispersion of more than 4. A silicon component is a room temperature dry lamination type one-part silicon resin. The metal particle may have a number average diameter of less than 5μm and a number average degree of dispersion of more than 5. The conductive metal particle is selected from the group consisting of silver, silver-coated copper, nickel, silver-coated nickel and their mixture. The metal particle is preprocessed with an organic acid and glycerol mixture. The conductive silicon paste is used by generating an induced electron after the metal particle is mechanically crushed. The conductive silicon paste is used for shielding an electromagnetic wave of an electromagnetic appliance.

Abstract translation: 目的：提供一种导电硅胶，以实现具有高屏蔽效率的导电膏，将该导电膏应用于高精度机器并防止由于热量而导致精密机器的损坏。 构成：导电金属颗粒的数均直径小于7μm，数均分散度大于4.硅组分是室温干式层压型单组分硅树脂。 金属颗粒可以具有小于5μm的数均直径和大于5的数均分散度。导电金属颗粒选自银，涂银铜，镍，银 涂镍和它们的混合物。 金属颗粒用有机酸和甘油混合物预处理。 在金属颗粒被机械粉碎后通过产生感应电子来使用导电硅浆。 导电硅胶用于屏蔽电磁器具的电磁波。