Abstract:
PURPOSE: A plasma monitoring device and a method thereof are provided to monitor a state of plasma of high temperature which uses large area plasma and high power. CONSTITUTION: A plasma monitoring device comprises an optical detecting unit(210), a matrix converting unit(230), a signal converting unit(250) and a diagnosing unit(270). The optical detecting unit is located outside a plasma area and detects light from plasma. The optical detecting unit comprises one or more optical detectors outputting an emission light signal. The matrix converting unit changes the detected emission light signals into a weight matrix. The signal converting unit calculates the weight matrix and outputs a state of the plasma as a location signal. The diagnosing unit forms a tomo graph with the location signals from the signal converting unit. The optical detectors are arranged outside the plasma area in a row.