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公开(公告)号：KR1020140122505A
公开(公告)日：2014-10-20
申请号：KR1020130039282
申请日：2013-04-10
Applicant: 한국광기술원
Abstract: 본 발명은 스트러 바를 사용한 후 안정적인 회수가 가능한 개량형 비커를 제공하는 것을 목적으로 한다. 이를 위해 본 발명은 비커 몸체; 상기 비커 몸체의 저면으로부터 상방향으로 일정 길이 돌출시켜 형성한 한 쌍의 지그; 및 상기 비커 몸체의 저면과 지그 사이에 설치되고, 내부에 스트러 바가 수납되는 수납 공간을 형성한 덮개를 포함한다. 따라서 세정 작업이 완료된 비커로부터 스트러 바를 안정적으로 회수할 수 있는 장점이 있다.
Abstract translation: 本发明的目的是提供一种改进的烧杯，其可以在使用搅拌棒之后稳定地回收搅拌棒。 为此目的，本发明包括：烧杯体; 一对从烧杯体的底部向上突出一定距离的夹具; 以及安装在烧杯的主体的底部和夹具之间并具有用于容纳搅拌棒的容纳空间的盖。 因此，可以从已经完成洗涤操作的烧杯稳定地回收搅拌棒。
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公开(公告)号：KR1020130122872A
公开(公告)日：2013-11-11
申请号：KR1020120045989
申请日：2012-05-01
Applicant: 한국광기술원
IPC: H01L21/60
Abstract: The present invention relates to a metal plating device. The plating device comprises a receiving part which receives a plating solution to be plated on an electrode formed on a wafer; a support member which supports the wafer with the electrode and is filled in the receiving part; a guide member which includes an insulation part laid on the wafer and a conduction part applying an electric current by being in contact with the electrode; a metal plate which is put in the receiving part and is separated from the support member; a power supply part which supplies a current to the guide member and the metal plate; and a jig one end of which is connected to the support member, and the other end of which is in contact with the conduction part.
Abstract translation: 本发明涉及一种金属电镀装置。 电镀装置包括：接收部，其接收要形成在晶片上的电极上的电镀液; 支撑构件，其用电极支撑晶片并填充在接收部分中; 引导构件，其包括布置在晶片上的绝缘部分和通过与电极接触而施加电流的导电部分; 金属板，其被放置在接收部分中并与支撑构件分离; 电源部，其向所述引导部件和所述金属板供给电流; 以及夹具，其一端连接到支撑构件，并且其另一端与导电部分接触。
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公开(公告)号：KR101079637B1
公开(公告)日：2011-11-03
申请号：KR1020100074114
申请日：2010-07-30
Applicant: 한국광기술원
IPC: G03H1/26
Abstract: PURPOSE: A 3D image display apparatus is provided to generate a hologram interference pattern by adjusting electric potential difference applied to a unit cell. CONSTITUTION: A hologram pattern generating unit(1) generates a hologram interference pattern. The hologram pattern generating unit displays a hologram image signal as a 3D stereoscopic image. A control unit(2) controls the electric potential difference which is applied to the hologram pattern generating unit. A reference beam irradiating unit(3) projects a reference beam from the hologram pattern generating unit.
Abstract translation: 目的：提供3D图像显示装置，通过调整施加到单元的电位差来产生全息图干涉图案。 构成：全息图图案生成单元（1）产生全息图干涉图案。 全息图图案生成单元将全息图像信号显示为3D立体图像。 控制单元（2）控制施加到全息图模式生成单元的电位差。 参考光束照射单元（3）从全息图模式生成单元投影参考光束。
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公开(公告)号：KR1020100097388A
公开(公告)日：2010-09-03
申请号：KR1020090016303
申请日：2009-02-26
Applicant: 한국광기술원
Abstract: PURPOSE: A wafer centering jig, a semiconductor manufacturing apparatus having the same, and a wafer centering method are provided to easily implement the centering of a wafer loaded by configuring a method of easily attaching a semiconductor wafer centering jig to the wafer. CONSTITUTION: A chamber(100) offers the space for depositing a wafer(W) on a thin film. The chamber comprises a transparent window(110) of the hemi sphere so that a user can see the deposition process with the naked eye. A wafer chuck(200) sucks and supports the wafer. The wafer chuck is formed on the upper side of the center of a wafer stage(210) in circular shape.
Abstract translation: 目的：提供一种晶片定心夹具，具有该晶片定心夹具的半导体制造装置和晶片定心方法，以便通过配置将半导体晶片定心夹具附接到晶片的方法来容易地实现加载的晶片的定心。 构成：室（100）提供了在薄膜上沉积晶片（W）的空间。 该室包括半球的透明窗（110），使得使用者可以用肉眼看到沉积过程。 晶片卡盘（200）吸附并支撑晶片。 晶片卡盘形成为圆形状的晶圆台（210）的中心的上侧。
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公开(公告)号：KR101418870B1
公开(公告)日：2014-07-17
申请号：KR1020120063405
申请日：2012-06-13
Applicant: 한국광기술원
Abstract: 본 발명은 복합굴절율을 갖는 렌즈 가공방법에 관한 것이다. 주재료가 유리로 이루어지는 원소재를 가열하여 상기 원소재의 외면으로부터 소정 깊이까지 액체와 고체가 공존하는 상태로 상을 변화시키는 단계; 상 변화된 상기 원소재의 외면에 불순물을 첨가하여 상기 원소재의 굴절율과 다른 굴절율을 갖는 이종 굴절율층을 형성하는 단계; 상기 불순물이 첨가된 원소재를 냉각시키는 단계;를 포함하는 것을 특징으로 한다.
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Patent Agency Ranking
公开(公告)号：KR101283384B1
公开(公告)日：2013-07-08
申请号：KR1020120046170
申请日：2012-05-02
Applicant: 한국광기술원
IPC: F21V23/04 , F21V33/00 , F21Y101/02
CPC classification number: F21V23/0457 , F21S2/005 , F21Y2101/00
Abstract: PURPOSE: A replacement time display device of a light-emitting diode (LED) lamp is provided to easily confirm a replacement period by displaying a replacement time of a lamp. CONSTITUTION: A printed circuit board forms a power terminal (130) in both ends. The printed circuit board is installed in an inner side of a case (110,120). An LED lamp includes an LED module. The LED module installs a plurality of LED chips. A replacement time display unit displays an electric signal.
Abstract translation: 目的：提供发光二极管（LED）灯的更换时间显示装置，通过显示灯的更换时间来容易地确认更换周期。 构成：印刷电路板在两端形成电源端子（130）。 印刷电路板安装在壳体（110,120）的内侧。 LED灯包括LED模块。 LED模块安装多个LED芯片。 更换时间显示单元显示电信号。
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公开(公告)号：KR101408691B1
公开(公告)日：2014-06-17
申请号：KR1020130039279
申请日：2013-04-10
Applicant: 한국광기술원
IPC: G05D23/19
Abstract: The present invention has a purpose for providing an apparatus for controlling the temperature of a vacuum deposition apparatus, capable of preventing thermal damage to a deposition objective by maintaining a predetermined temperature regardless of the temperature change inside a chamber using a thermo element. To achieve this, with regard to a vacuum deposition apparatus including a holder which is installed in a vacuum chamber to be rotatable, the present invention includes a temperature control means installed in the holder and controlling the temperature of the deposition objective to maintain the predetermined temperature of the deposition objective fixed in the holder during a deposition process. Therefore, the present invention can prevent thermal damage to the deposition objective by maintaining the predetermined temperature regardless of the temperature change inside the vacuum chamber and can maintain the optimal status of the deposition objective by directly controlling the temperature of the deposition objective.
Abstract translation: 本发明的目的是提供一种用于控制真空沉积设备的温度的装置，其能够通过保持预定温度来防止对使用热电元件的室内的温度变化的任何温度变化来对沉积物体的热损伤。 为了实现这一点，对于包括安装在可旋转的真空室中的保持器的真空沉积设备，本发明包括安装在保持器中并控制沉积物体的温度以保持预定温度的温度控制装置 的沉积物体在沉积过程中固定在保持器中。 因此，本发明可以通过保持预定温度而不管真空室内的温度变化来防止对沉积物体的热损伤，并且可以通过直接控制沉积物体的温度来保持沉积物体的最佳状态。
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公开(公告)号：KR101384995B1
公开(公告)日：2014-04-14
申请号：KR1020130039285
申请日：2013-04-10
Applicant: 한국광기술원
Abstract: The present invention aims to provide a safety beaker that enables users to safely use the beaker without removing a stirrer bar after mixing contents using the stirrer bar, and to stably recover the stirrer bar after usage. To achieve said purpose, the safety beaker according to the present invention comprises a beaker body; and a blocking unit having a diameter smaller than a diameter of the beaker body by being located on a random location on the beaker body, and protruding from the beaker body to an inner radial direction in a predetermined length; and the blocking unit is integrated to the beaker body. Accordingly, a solution can be safely transferred after mixing the solution using the stirrer bar without removing the stirrer bar, and the stirrer bar can be safely recovered from the beaker after cleaning.
Abstract translation: 本发明的目的是提供一种安全烧杯，其使用者可以在使用搅拌棒混合内容物之后不用移除搅拌棒来安全地使用烧杯，并且在使用后稳定地回收搅拌棒。 为了实现上述目的，根据本发明的安全烧杯包括烧杯体; 以及阻挡单元，其通过位于所述烧杯体上的随机位置上而具有比所述烧杯体直径小的直径，并且从所述烧杯体向预定长度的内径方向突出; 并且阻挡单元被集成到烧杯体。 因此，可以在使用搅拌棒混合溶液之后可以安全地转移溶液，而不需要移除搅拌棒，并且可以在清洁之后从烧杯中安全地回收搅拌棒。
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公开(公告)号：KR1020130139708A
公开(公告)日：2013-12-23
申请号：KR1020120063405
申请日：2012-06-13
Applicant: 한국광기술원
Abstract: The present invention relates to a method for manufacturing lens with a multi-refractive index. The method comprises the steps of: heating raw materials which are formed of glass as a main material and changing a phase in a state in which liquid and solid coexist from the outer surface of the raw material in a predetermined depth; adding impurities to the outer surface of the phase-changed raw material and forming a heterorefractive index which has a refractive index different from the refractive index of the raw material; and cooling the raw material to which the impurities are added. [Reference numerals] (AA) Heating;(S0) Step of preparing raw materials;(S1) Step of changing a phase;(S2) Step of forming a heterorefractive layer by adding impurities;(S3) Step of pressing and annealing;(S4) Step of cooling
Abstract translation: 本发明涉及一种制造具有多重折射率的透镜的方法。 该方法包括以下步骤：将由玻璃形成的原料作为主要材料加热，并将液体和固体以预定深度从原料外表面共存的状态改变; 向相变原料的外表面添加杂质，形成折射率不同于原料的折射率的杂折射率; 并冷却加入杂质的原料。 （AA）加热;（S0）制备原料的步骤;（S1）相变步骤;（S2）添加杂质形成杂多层的步骤;（S3）压制退火工序; S4）冷却步骤
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公开(公告)号：KR1020130122870A
公开(公告)日：2013-11-11
申请号：KR1020120045986
申请日：2012-05-01
Applicant: 한국광기술원
IPC: H01L21/027
CPC classification number: H01L21/0272 , G03F7/2022 , H01L21/0274
Abstract: The present invention relates to a method for forming a photoresist pattern capable of facilitating a liftoff and a method for forming an electrode using the same. The method for forming the photoresist pattern includes a step for a photoresist layer with a negative reaction on the upper surface of a wafer in an exposure process; a first exposure process step for exposing a patterned photomask formed on the upper part of the photoresist pattern for a first time; a second exposure process step for removing the photomask and exposing the photoresist pattern for a second time longer than the first time. The photoresist pattern a residue par where the photoresist remains and a removal part where the photoresist is removed. The width of the upper side of the removal part is smaller than the width of the lower side of the removal part where the photoresist touches the water.
Abstract translation: 本发明涉及一种形成能够促进剥离的光致抗蚀剂图案的方法和使用其形成电极的方法。 用于形成光致抗蚀剂图案的方法包括在曝光过程中在晶片的上表面上具有负反应的光致抗蚀剂层的步骤; 第一曝光处理步骤，用于第一次曝光在光致抗蚀剂图案的上部形成的图案化光掩模; 第二曝光处理步骤，用于去除所述光掩模并使所述光致抗蚀剂图案暴露于所述第一时间之后的第二时间。 光致抗蚀剂图案残留有光致抗蚀剂残留物，其中光致抗蚀剂被除去的去除部分。 去除部分的上侧的宽度小于光致抗蚀剂接触水的去除部分的下侧的宽度。
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