公开(公告)号：KR100762291B1

公开(公告)日：2007-10-01

申请号：KR1020060044681

申请日：2006-05-18

Applicant: 한국표준과학연구원

Inventor： 정세채 ,  남정림

IPC: H01L21/78

CPC classification number: G03F7/2053 ,  G03F7/0387

Abstract: A microfabrication method for a polymer film is provided to add a small amount of a multiphoton absorptive compound for reducing a critical value of the process, so that the damages of the polymer film and a lower substrate can be reduced. A microfabrication method for a polymer film comprises following processes. A polymer film(15) is formed by adding a multiphoton absorptive compound(17). A microfabrication method is performed to the polymer film by using a laser beam(100). A process critical value of the polymer film about the laser beam is regulated by a density of multiphoton absorptive compound.

Abstract translation: 提供聚合物薄膜的微细加工方法以添加少量用于降低该工艺的临界值的多光子吸收化合物，从而可以降低聚合物膜和下基板的损伤。 聚合物膜的微细加工方法包括以下工序。 通过添加多光子吸收化合物（17）形成聚合物膜（15）。 通过使用激光束（100）对聚合物膜进行微细加工。 关于激光束的聚合物膜的过程临界值由多光子吸收化合物的密度调节。