Abstract:
The present invention relates to a surface-modified active carbon comprising tetrabutoxysilane combined with the surface of an active carbon, wherein a -Si-O-CH3 functional group and a -Si-OH functional group are included on the surface of the active carbon. According to the present invetion, decomposition efficiency is improved since prolonged residence is possible in a pollutant environment using the active carbon surface-modified with the tetrabutoxysilane, and a microorganism actively copes with an environment in a low concentration and high concentration base-based organic solvent, thereby showing a decomposition activity.
Abstract:
본 발명은 활성탄의 표면에 결합되어 있는 테트라뷰톡시실란을 포함하는 표면 개질 활성탄에 관한 것으로서, 상기 활성탄의 표면에는 -Si-O-CH 3 및 -Si-OH 작용기를 포함하는 것을 특징으로 하고, 본 발명에 따르면, 테트라뷰톡시실란으로 표면 개질된 활성탄을 이용해 오염물질 환경에서 장기간 체류가 가능하여 분해효율을 향상시키고, 저농도 및 고농도 염기계 유기용매 환경에서 미생물이 환경에 능동적으로 대처하여 분해 활성을 나타낼 수 있게 하는 효과가 있다.
Abstract:
PURPOSE: A method of removing contaminant is provided to use magnetic-cored Dendrimer with various functional groups, absorb and remove effectively not only a heavy metal but also hydrophilic or hydrophobic contaminants, and is used as a chelating agent for obtaining hydrophilic or hydrophobic absorbents, heavy metals and precious metals, and is applied for wastewater treatment plant, soil contaminant processing facilities, nuclear waste processing facilities, facilities for water waste from waste disposal sites and mines. CONSTITUTION: Magnetic-cored Dendrimer comprises any repetitive molecular structure in(1)-(4) structural formulas. In(1)-(4) structural formulas, MNP is a magnetic nano particle and an anion nano particle. A method of manufacturing magnetic-cored Dendrimer with a repetitive molecular structure of structural formulas(1) follows chemical equation 1. A method of manufacturing magnetic-cored Dendrimer with the repetitive molecular structure of structural formula(2) follows chemical equation 2. A method of manufacturing magnetic-cored Dendrimer with the repetitive molecular structure of structural formulas(3),(4) follows chemical equation 3, 4 respectively. A method of removing contaminants to use magnetic-cored Dendrimer comprises the following steps: a step to absorb contaminants by using magnetic-coed Dendrimer, a step to remove magnetic-cored Dendrimer with contaminants by using a magnet. A contaminant is cadmium. Cadmium is in solution more than pH 4. Magnetic-cored Dendrimer with contaminants is treated less than pH 4, to remove the contaminants from magnetic-cored Dendrimer, and is also re-used for removing contaminants.