公开(公告)号：EP2748841A4

公开(公告)日：2015-10-14

申请号：EP12825846

申请日：2012-08-22

Applicant: 1366 TECHNOLOGIES INC

Inventor： STERN ERIC ,  WEST BRADLEY M ,  CRISCIONE JASON

IPC: H01L21/302 ,  C09K13/08 ,  H01L31/0236

CPC classification number: H01L31/02366 ,  C09K13/08 ,  H01L31/02363 ,  Y02E10/50

Abstract: Acid etch compositions for etching multicrystalline silicon substrates are disclosed which may include hydrofluoric acid, an oxidizer, an acid diluent, and soluble silicon. The soluble silicon may be hexafluorosilicic acid or ammonium fluorosilicate. Silicon substrates patterned with organic resist may be used with the acid etch compositions for selective silicon patterning for solar cell applications.