公开(公告)号：US20210347135A1

公开(公告)日：2021-11-11

申请号：US17250995

申请日：2019-11-08

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Henrik B. van Lengerich ,  Karl K. Stensvad ,  Edwin L. Kusilek ,  Mathew S. Stay ,  Caleb T. Nelson ,  Christopher S. Lyons ,  Moses M. David ,  Jeffrey L. Solomon ,  Martin B. Wolk ,  Nicholas C. Erickson ,  James Zhu ,  James M. Nelson

IPC: B29D11/00 ,  B82Y40/00 ,  B82Y20/00 ,  G02B5/02

Abstract: Materials and methods useful in forming nano-scale features on substrates, and articles such as optical films incorporating such nano-scale patterned substrates.