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公开(公告)号:US20210347135A1
公开(公告)日:2021-11-11
申请号:US17250995
申请日:2019-11-08
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor: Henrik B. van Lengerich , Karl K. Stensvad , Edwin L. Kusilek , Mathew S. Stay , Caleb T. Nelson , Christopher S. Lyons , Moses M. David , Jeffrey L. Solomon , Martin B. Wolk , Nicholas C. Erickson , James Zhu , James M. Nelson
Abstract: Materials and methods useful in forming nano-scale features on substrates, and articles such as optical films incorporating such nano-scale patterned substrates.