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    Managing condensation with fluid control film apparatus
    2.
    发明授权
    Managing condensation with fluid control film apparatus 有权

    公开(公告)号：US11578922B2

    公开(公告)日：2023-02-14

    申请号：US16957624

    申请日：2018-12-21

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： Steven P. Swanson ,  Kurt J. Halverson

    IPC: F28B9/10 ,  F25D21/14 ,  F25D21/04 ,  B01D5/00 ,  G09B23/30 ,  F28B9/08 ,  B08B17/06

    Abstract: A condensation management apparatus comprises a microstructured film arranged to condense water vapor on an underside of a substantially horizontal surface. The film comprises channels disposed at least on a first major surface and configured to support capillary movement of condensate. The channels have a channel axis substantially parallel with a longitudinal axis of the film. A capillary siphon structure of the film comprises a fold in the film, a condensate collection region proximate the fold, and a siphon region between the fold and a condensate release location of the film. At least a portion of a second major surface is attached to the underside of the substantially horizontal surface such that longitudinal openings of the channels of the condensate collection region are oriented towards a direction of gravity and the condensate release location is positioned lower along the direction of gravity than the condensate collection region.

    FLUID CONTROL FILMS WITH HYDROPHILIC SURFACES, METHODS OF MAKING SAME, AND PROCESSES FOR CLEANING STRUCTURED SURFACES
    6.
    发明申请
    FLUID CONTROL FILMS WITH HYDROPHILIC SURFACES, METHODS OF MAKING SAME, AND PROCESSES FOR CLEANING STRUCTURED SURFACES 审中-公开
    具有水力表面的流体控制膜，其制造方法和清洁结构表面的方法

    公开(公告)号：US20170045284A1

    公开(公告)日：2017-02-16

    申请号：US15305524

    申请日：2015-04-22

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： Adam J. Meuler ,  Susannah C. Clear ,  Steven P. Swanson ,  Kurt J. Halverson ,  Justin A. Riddle ,  Paul B. Armstrong ,  Caleb T. Nelson ,  Chetan P. Jariwala

    IPC: F25D21/14 ,  B08B3/10 ,  F15D1/00 ,  B08B1/00

    CPC classification number: F25D21/14 ,  B08B1/006 ,  B08B3/10 ,  B32B3/30 ,  B32B7/06 ,  B32B7/12 ,  C08J5/18 ,  F15D1/003 ,  F15D1/0085 ,  Y10T428/2457 ,  Y10T428/24579 ,  Y10T428/24612

    Abstract: A fluid control film is provided that includes fluid control channels extending along a channel longitudinal axis. Each of the fluid control channels has a surface and is configured to allow capillary movement of liquid in the channels. The fluid control film further includes a hydrophilic surface treatment covalently bonded to at least a portion of the surface of the fluid control channels. The fluid control film exhibits a capillary rise percent recovery of at least ten percent. Typically, the hydrophilic surface treatment includes functional groups selected from a non-zwitterionic sulfonate, a non-zwitterionic carboxylate, a zwitterionic sulfonate, a zwitterionic carboxylate, a zwitterionic phosphate, a zwitterionic phosphonic acid, and/or a zwitterionic phosphonate. A process for forming a fluid control film is also provided. Further, a process for cleaning a structured surface is provided, including providing a structured surface and a hydrophilic surface treatment covalently bonded to at least a portion of the structured surface, and soiling the structured surface with a material. The process also includes removing the material by at least one of submerging the structured surface in an aqueous fluid, rinsing the structured surface with an aqueous fluid, condensing an aqueous fluid on the structure surface, or wiping the structured surface with a cleaning implement.

    Abstract translation: 提供流体控制膜，其包括沿着通道纵向轴线延伸的流体控制通道。 每个流体控制通道具有表面并且被构造成允许液体在通道中的毛细管移动。 流体控制膜还包括共价键合到流体控制通道的表面的至少一部分的亲水性表面处理。 流体控制膜表现出至少10％的毛细管上升百分比回收率。 通常，亲水表面处理包括选自非两性离子磺酸盐，非两性离子羧酸盐，两性离子磺酸盐，两性离子羧酸盐，两性离子磷酸盐，两性离子膦酸和/或两性离子膦酸盐的官能团。 还提供了一种用于形成流体控制膜的工艺。 此外，提供了一种用于清洁结构化表面的方法，包括提供结构化表面和共价键合到结构化表面的至少一部分的亲水表面处理，并且用材料污染结构化表面。 该方法还包括通过将结构化表面浸没在水性流体中的至少一种来去除材料，用水性流体冲洗结构化表面，在结构表面上冷凝水性流体，或用清洁工具擦拭结构化表面。

    MANAGING CONDENSATION WITH FLUID CONTROL FILM APPARATUS
    10.
    发明申请
    MANAGING CONDENSATION WITH FLUID CONTROL FILM APPARATUS 审中-公开

    公开(公告)号：US20200326118A1

    公开(公告)日：2020-10-15

    申请号：US16957643

    申请日：2018-12-21

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： Kurt J. Halverson ,  Steven P. Swanson ,  Garth V. Antila ,  Daniel R. Fronek ,  Caleb T. Nelson ,  David F. Slama

    IPC: F25D21/04 ,  B32B3/30 ,  F28F17/00 ,  B08B17/06

    Abstract: A condensation management apparatus comprises a first microstructured film arranged to condense water vapor on a substantially vertical surface of a component. The first film comprises channels disposed on first and second major surfaces of the first film and dimensioned to support capillary movement of condensate. The channels have a channel axis substantially parallel with a longitudinal axis of the first film. The longitudinal axis of the first film is tilted at a tilt angle of at least 4 degrees with respect to an axis normal to a direction of gravity. Openings in the channels are disposed at one or both end edges of the first film. The openings provide condensate release locations of the first film. A second film is disposed over a portion of the first film. The second film attaches the first film to the substantially vertical surface of the component.

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