公开(公告)号：WO2019197649A1

公开(公告)日：2019-10-17

申请号：PCT/EP2019/059500

申请日：2019-04-12

Applicant: ABB SCHWEIZ AG

Inventor： PANOUSIS, Emmanouil ,  KASSUBEK, Frank ,  VOTTELER, Torsten ,  ORITZ, Gabriel ,  BIANDA, Enea ,  CARSTENSEN, Jan ,  VASILADIOTIS, Michail ,  GARYFALLOS, Angelos

IPC: C02F1/72 ,  B01F5/04 ,  B63J4/00

Abstract: A ballast water treatment apparatus (100) and a ballast water treatment system (1) having a ballast water treatment apparatus (100) are provided. The ballast water treatment apparatus (100) includes a ballast water transport line (10) configured to transport ballast water between a first location (A) and a second location (B), the transported ballast water being passed through at least one injector (20), and a plasma generation device (30) configured to be fed with a feed gas optionally comprising oxygen, and configured to generate a feed gas plasma (35) by a streamer type discharge in a discharge area (36) to provide a treated gas at a treated- gas outlet (37). The injector (20) comprises a liquid passage (21) having an area (22) constructed such as to increase a velocity of the passed-through water in a region (26) of increased velocity, and an injector gas inlet (25) provided in the region (26) of increased velocity. The treated-gas outlet (37) is in gaseous connection with the injector gas inlet (25).

公开(公告)号：WO2020120741A1

公开(公告)日：2020-06-18

申请号：PCT/EP2019/085087

申请日：2019-12-13

Applicant: ABB SCHWEIZ AG

Inventor： KASSUBEK, Frank ,  CARSTENSEN, Jan ,  RODRIGUEZ-VILCHES, Seila ,  VOTTELER, Torsten ,  BIANDA, Enea

IPC: C02F1/46 ,  C02F1/48 ,  C02F103/00

Abstract: A Dielectric Barrier Discharge system controller for controlling a fluid treatment by a Dielectric Barrier Discharge system is provided. Therein, the strength of an effect caused by a discharge created by the Dielectric Barrier Discharge system is monitored, and the generation of high-voltage pulses by the high-voltage pulse generator (110) is controlled. The controlling of the generation of the high-voltage pulses is adapted based on the received sensor data.

公开(公告)号：EP3894359A1

公开(公告)日：2021-10-20

申请号：EP19816798.3

申请日：2019-12-13

Applicant: ABB Schweiz AG

Inventor： KASSUBEK, Frank ,  CARSTENSEN, Jan ,  RODRIGUEZ-VILCHES, Seila ,  VOTTELER, Torsten ,  BIANDA, Enea

IPC: C02F1/46 ,  C02F1/48 ,  C02F103/00

公开(公告)号：EP3049779B1

公开(公告)日：2017-11-15

申请号：EP14771928.0

申请日：2014-09-24

Applicant: ABB Schweiz AG

Inventor： SUNDARAMOORTHY, Vinoth ,  BIANDA, Enea ,  BLOCH, Richard ,  NISTOR, Iulian ,  KNAPP, Gerold

IPC: G01K7/01

CPC classification number: G01K7/01

公开(公告)号：EP3774669A1

公开(公告)日：2021-02-17

申请号：EP19717882.5

申请日：2019-04-12

Applicant: ABB Schweiz AG

Inventor： PANOUSIS, Emmanouil ,  KASSUBEK, Frank ,  VOTTELER, Torsten ,  ORTIZ, Gabriel ,  BIANDA, Enea ,  CARSTENSEN, Jan ,  VASILADIOTIS, Michail ,  GARYFALLOS, Angelos

IPC: C02F1/72 ,  B01F5/04 ,  B63J4/00